|
1.K. Osamura , S. Naka and Y. Murakami, J. Appl. Phys.46, 3432 (1975) 2.D. Brunner ,H. Angerer, E. Bustarret , R. Hopler, R. Dimitrov ,O. Ambacher and M. Stutzmann, J. Appl. Phys. 82, 5090 (1997) 3.Y. J. Koide, H. Itoh, M. R. H. Khan, K. Hiramatu, N. Sawaki and I. Akasaki, J. Appl. Phys. 61, 4540 (1987) 4.K. S. Kim, A. Saxler, P. Kung, R. Razeghi and K. Y. Lim, Appl. Phys. Lett. 71, 800 (1997) 5.Q. Guo, H. Ogawa and A. Yoshida, J. Crystal Growth 146, 462 (1995) 6.L. Liu and J. H. Edgar, Materials Science and Engineering R 37, 61 (2002) 7.M. Leroux, B. Gil, in: J.H. Edgar, S.S. Strite, I. Akasaki, H. Amano (Eds.), INSPEC, The Institution of Electrical Engineers, Stevenage, UK, 1999, p. 45. 8.D.C. Look, J.R. Sizelove, Appl. Phys. Lett. 79, 1133 (2001) 9.U. Kaufmann, P. Schlotter, H. Obloh, K. Kohler, M. Maier, Phys. Rev. B 62 10867 (2000) 10.D. Doppalapudi, T.D. Moustakas, in: H.S. Nalwa (Ed.), Handbook of Thin Film Materials, Vol. 4, 2002, p. 57. 11.S. Porowski, Grzegory, in: J.H. Edgar (Ed.), Properties of Group III Nitrides, INSPEC, The Institution of Electrical Engineers, Stevenage, UK, 1994, p. 76. 12.R.R. Reeber, K. Wang, Mater. Res. Soc. Symp. 622, T6.35.1 (2000) 13.D.I. Florescu, V.M. Asnin, F.H. Pollak, A.M. Jones, J.C. Ramer, M.J. Schurman, I. Ferguson, Appl. Phys. Lett. 77, 1464 (2000) 14.S. Krukowski, M. Leszcynski, S. Porowski, in: J.H. Edgar, S.S. Strite, I. Akasaki, H. Amano (Eds.), INSPEC, The Institution of Electrical Engineers, Stevenage, UK, p. 21 (1999) 15.S.O. Kucheyev, J.E. Bradby, J.S. Williams, C. Jagasish, M. Toth, M.R. Phillips, M.V. Swain, Appl. Phys. Lett. 77, 3373 (2000) 16.I. Yonenaga, T. Hoshi, A. Usui, Jpn. J. Appl. Phys. 39 (Pt 2) L200 (2000) 17.I. Yonenaga, K. Motoki, J. Appl. Phys. 90, 6539 (2001) 18.E. S. Hellman, Z. Liliental-Weber, and D. N. E. Buchanan, MRS. Internet J. Nitride Semic. Res. 2, 30 (1997) 19.P. Waltereit, O. Brandt, A. Trampert, H. T. Grahn, J. Menniger, M. Ramsteiner, M. Reiche and K. H. Ploog, Nature 406, 865 (2000) 20.http://edoc.hu-berlin.de/dissertationen/liu-tian-yu-2004-10-01/PDF/Liu.pdf 21.A. P. de Kroon, G. W. Schäfer, F. A., J. Alloy. Comp. 314, 147 (2001) 22.M. Marezio, Acta. Cryst. 19, 396 (1965) 23.W. Wong-Ng, H. McMurdie, B. Paretzkin, C. Hubbard, A. Dragoo, Powder Diffraction 2, 111 (1987) 24.K. Fischer, Inorg. Chem. 16, 974 (1977) 25.R. Dronskowski, Inorg. Chem. 32, No1. (1993) 26.H. J. Byker, I. Eliezer, N. Eliezer, and R. A. Howald, J. Phys. Chem. 83, 2349 (1979) 27.黃惠君,中山大學材料所,博士論文計劃書,2005 28.Ke Xu, Jun Xu, Peizhen Deng, Rongshng and Zujie Fang Phys. Stat. Sol.(a)176, 589 (1999) 29.J. W. Lee, S. J. Pearton, and C. R. Abernthy, J. Electrochem. Soc. 143, 169 (1996) 30.S. M. Laffey, J. R. Vig and M. A. Hendrickson, U.S. Patent 5605490 (1997) 31.K. Kinoshita, J. W. Sim. and J. P. Ackerman, Mat. Res. Bull.13, 445 (1978) 32.李志宏,清華大學工程與系統科學系,藍寶石晶圓表面超拋光製程之研究,2002
|