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研究生:吳志榮
研究生(外文):Jhih-rong Wu
論文名稱:聚焦離子束加工玻璃次微米三維結構的探討
論文名稱(外文):The Fabrication of 3D Submicron Glass Structures by FIB
指導教授:趙健祥
指導教授(外文):Chien-hsiang Chao
學位類別:碩士
校院名稱:國立中山大學
系所名稱:機械與機電工程學系研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2006
畢業學年度:94
語文別:中文
論文頁數:81
中文關鍵詞:Pyrex玻璃高深寬比3D次微米結構聚焦離子束
外文關鍵詞:High-aspect-ratioPyrex glassFocused ion beam3-D submicron structures
相關次數:
  • 被引用被引用:4
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本論文主要研究聚焦離子束(focused ion beam, FIB)對派熱克斯玻璃(Pyrex glass)次微米結構的加工特性。由於聚焦離子束具有高的靈敏度和材料蝕刻率,前散射低,可不需蝕刻光罩對侷限區域直接加工等優點。因此本論文研究利用聚焦離子束快速的直接對玻璃加工出3D次微米結構。有效的製作出最小線寬約為0.39µm,最大深寬比約為5的高深寬比(high-aspect-ratio, HRA)玻璃結構。並且探討蝕刻速度、深度、加工時間等實驗結果與其實驗參數彼此間的關係。此外,嘗試在加工時加入輔助氣體氟化氙(xenon difluoride, XeF2),研究探討氟化氙對玻璃加工的影響。
The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high sensitivity, high material removal rates, low forward scattering, and direct fabrication in selective area without any etching mask, etc. In this study, FIB etched Pyrex glass was used for fast fabrication of 3-D submicron structures. A high-aspect-ratio (HRA) glass structure of 5 (1.97µm depth/0.39µm width) was fabricated. The experimental results in terms of limiting beam size, ion dose(ion/cm2), beam current, etc was discussed. Xenon difluoride (XeF2) was applied to enhance the FIB process. Its influence on glass fabrication is studied and characterized.
目 錄
目錄 I
表目錄 III
圖目錄 VI
中文摘要 VIII
英文摘要 IX

第1章 緒論 1
1-1 研究動機與背景 1
1-2 玻璃加工技術 2
1-3 FIB技術的發展 4
1-4 本文架構 7
第2章 FIB原理介紹 9
2-1 FIB 組成 9
2-2 基本原理 14
2-2-1 工作原理 14
2-2-2 成像原理 18
2-2-3 供氣方式 20
2-2-4 掃描參數(Scan parameter) 23
2-3 FIB基本功能 24
第3章 實驗步驟、樣本與儀器介紹 26
3-1 儀器介紹 26
3-2 Pyrex玻璃 30
3-3 實驗步驟 31
3-3-1 樣品準備 31
3-3-2 蝕刻程序 33
第4章 結果與討論 38
4-1 探討FIB不同離子束條件的特性 38
4-2 加工不同深寬比3D玻璃結構並分析其相關特性 41
4-3 探討輔助氣體FIB蝕刻對Pyrex玻璃結構的影響 57
第5章 結論與未來展望 62
5-1 結論 62
5-2 未來展望 63
參考文獻 65
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