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研究生:劉東杭
研究生(外文):Dong-Hang Liu
論文名稱:CMOSMEMS紅外線熱感測器的設計與製造
論文名稱(外文):Design and Fabrication of CMOSMEMS Infrared Thermal Sensors
指導教授:盧向成
指導教授(外文):Shiang-Cheng Lu
學位類別:碩士
校院名稱:國立清華大學
系所名稱:電子工程研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2006
畢業學年度:94
語文別:中文
論文頁數:55
中文關鍵詞:CMOS紅外線次臨界熱感測器
外文關鍵詞:CMOSinfraredsub-thresholdthermal sensor
相關次數:
  • 被引用被引用:1
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  • 收藏至我的研究室書目清單書目收藏:1
本論文是研究CMOSMEMS紅外線熱感測器的製作,製作過程包含了(1)機械結構的設計與模擬,(2)創新的感測方式:利用PMOS電晶體操做在次臨界區的通道電阻,作為感測的機制。(3)後製程實驗的操作,以及電路效能與機電整合的量測。在最出模擬的TCR值為-3.3%與最後量測結果相比,相距甚小,其量測值-3.1%也優於過去文獻中所發表的結果。而懸浮結夠的面積大小,與感測電晶體PMOS的長寬比,在設計當初並沒有考量其最佳化的效果,因此此篇論文也只討論其量測與模擬結果,希望這方面的探討在未來可以詳細的去研究探討。另外,此次的設計中表面吸收紅外線熱輻射的懸浮平板,表面為鋁金屬,雖然可增加熱傳導至感應電晶體的區塊,但是其對紅外線熱輻射的反射率不小,假若有整個晶圓可以利用,在製作時就可以先沉積抗反射膜,增加懸浮平板對紅外線熱輻射的吸收。
In this thesis we describe the design and fabrication of a CMOS MEMS Infrared thermal sensor fabricated in a 0.35-mm CMOS process. A PMOS transistor operated in the sub-threshold region is used for the thermal sensing purpose. The pixel size is 70 mm by 70 mm, and the sensing transistor is placed in a released membrane of 50 mm by 50 mm fabricated by successive dry etching steps. For device characterization, a poly-silicon heater is placed in each pixel to provide a temperature change at 0.072°C/mW. The MOS output resistance changes from 108 MW to 90 MW for a temperature rise of 6°C, averaging a temperature coefficient of resistance at -3.17%/°C. The measured input-referred noise voltage from the pre-amp is 7 mV/ÖHz, equivalent to a noise temperature of 1.3 mK/ÖHz.
摘要 I
目錄 III
圖目錄 V
表目錄 VII
第一章 序論 1
1-1 微機電系統概論 1
1-2 紅外線熱感測簡介 3
1-2-1 熱感測 3
1-2-2 紅外線熱輻射 3
1-3 紅外線熱感測器研究動機與文獻回顧 6
1-3-1 紅外線熱感測器研究動機 6
1-3-2 文獻回顧 8
第二章 CMOSMEMS紅外線熱感測器系統架構 15
2-1 紅外線熱感測系統之概述 15
2-2 感測器設計與模擬 17
2-2-1 紅外線熱感測器暫態分析 23
2-3 CMOS感測電路設計與模擬 29
2-3-1 感測原理 29
2-3-2 感測電路模擬 34
2-4 感測器規格與 Tape-out 晶片圖 37
第三章 後製程步驟與感測器量測結果 41
3-1 後製程實驗 41
3-2 感測器結構量測 45
3-3 感測訊號量測結果 47
第四章 結論 52
4-1 改善與討論 52
參考文獻 53
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