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第一章 [1] S.J. Pearton, J. C. Zopler, R. J. Shul and F. Ren,J. Appl. Phys., Vol. 86, No. 1,1 July 1999,1. [2] Yan-Kuin Su, Fuh-Shyang Juang,and Min-Homg Chen, Jpn. J. Appl. Phys. Vol. 42(2003) pp.2257-2259. [3] E. Monroy, E. Munoz, F. J. Sanchez, F. Calle, E. Calleja, B. Beaumout, P. Gibart, J. A. Munoz and F. Cusso Semicond. Sci. Technol. 13 (1998) 1042 [4] G. Parish, S. Keller, P. Kozodoy, J. A. Ibbetson, H. Marchand, P. T. Fini, S. B. Fleischer, S. P. DenBaars, and U. K. Mishra, "High performance (Al,Ga)N-based solar-blind ultraviolet p-i-n detectors on laterally epitaxially overgrown GaN,"Appl. Phys. Lett., vol. 75, pp. 247-249, July 1999 [5] A. Osinsky, S. Gangopadhyay, R. Gaska, B. Williams, M. Asif Khan, D. Kuksenkov, and H. Temkin, Appl. Phys. Lett. 71, 2334, 1997. [6] Q. Chen, J.W. Yang, et al., Appl. Phys. Lett. 70(17), 28 Appril 1997, 2277 [7] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, J. Appl. Phys. 83, 6148 (1998). [8] D. G. Parker and P. G. Say,"Indium tin oxide/GaAs photodiodes for millimetric-wave application,"Eletron. Lett,vol. 22,pp1266-1267,1988. [9] E. Monroy , F. Calle, E. Munoz, and F. Omnes, Phys. Status Solidi A 176, 141 (1999). [10] E. Monroy, F. Calle, E. Munoz, and F. Omnes, Appl. Phys. Lett. 74 , 3401 (1999). [11] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, Appl. Phys. Lett. 70 , 1992 (1997). [12] V. Adivarahan, G. Simin, J. W. Yang, A. Lunev, M. Asif Khan, N. Pala, M. Shur, and R. Gaska, Appl. Phys. Lett. 77, 863 (2000). [13] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, Appl. Phys. Lett. 72 , 542 (1998). [14] D. Walker, E. Monroy, P. Kung, J. Wu, M. Hamilton, F. J. Sanchez, J. Diaz, and M. Razeghi, Appl. Phys. Lett. 74 , 762 (1999). [15] Q. Chen, J. W. Yang, A. Osinsky, S. Gangopadhyay, B. Lim, M. Z. Anwar,and M. Asif Khan, Appl. Phys. Lett. 70 , 2277 (1997). [16] O. Katz, V. Garber, B. Meyler, G. Bahir, and J. Salzman Appl. Phys. Lett. 79, 1417(2001) [17] J.K. Sheu, C.J. Kao, M.L. Lee, W.C. Lai. , et al., Journal of Electronic Material, Vol. 32., No. 5 ,2003, 400. [18] S.J. Chang, M. L.Lee, J. K. Sheu , et al.,IEEE ELECTRON DEVICE LTTERS ,Vol. 24, No.4, APPRIL 2003, 212.
第二章 [1] Semiconductor devices physics and technology 2nd edition, S.M. Sze [2] Semiconductor material and device charaterization, DIETER K. SCHRODER [3] F. A. Padovani and R. Stratton, "Filed and Thermionic-Feild Emission in Schottky Barriers" , Solid-State Electron. 9, 695-707, July 1966; F. A. Padovani, " The Current-Voltage Charateristics of Metal-Semiconductor Contacts " in Semiconductors and semimetals (R. K. Willardson and A. C. Beer, eds.), Academic Press, New York, 7A, 75-146, 1971. [4] Semiconductor material and device charaterization, DIETER K. SCHRODER [5] E. H. Rhoderick and R. H. William, Metal-Semiconductor Contacts, 2nd ed., Clarendon, Oxford, 1988. [6] A. Y. C. Yu, "Electron Tunneling and Contact Resistance of Metal-Silicon Contact Barriers," Solid-state Electron. 13, 23-247, Feb. 1970. [7] F. A. Padovani and R. Stratton, "Filed and Thermionic-Feild Emission in Schottky Barriers," Solid-State Electron. 9, 695-707, July 1966; F. A. Padovani,"The Current -Voltage Charateristics of Metal-Semiconductor Contacts,"inSemiconductors and sem imetals (R. K. Willardson and A. C. Beer, eds.),Academic Press, New York, 7A, 75-146, 1971. [8] Kuo-Chin Huang, Wen-How Lan and Kai Feng Huang,Jpn. J. Appl. Phys.,Vol. 43, No.1,2004 ,pp. 82-85. [9] optoelectronics and photonics principles and practices, S.O. Kasap [10] Semiconductor devices physics and technoloy 2nd edition, S.M. Sze [11] S. V. Averine, Y. C. Chan, and Y. L. Lam, "Geometry optimization of interdigitated Schottky-barrier metal-semiconductor-metal photodiode structures,"s. S. E., vol. 45, pp. 441-446, 2001 [12] Burm J, Litvin KI, Schaff WJ, and Eastman LF, "Optimization of high-speed metal-semiconductor-metal photodetectors," IEEE Photon. Technol. Lett., vol. 6, no. 6, pp. 722-724,1994. [13] Semiconductor material and device charaterization, DIETER K. SCHRODER [14] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, J. Appl. Phys. 83, 6148 (1998). [15] Hao JIANG, Naoyuki NAKATA,Guang Yuan ZHAO, and et al., Jpn. J. Appl. Phys.,Vol.40(2001),pp.505-L507 [16] optoelectronics and photonics principles and practices, S.O.Kasap. [17]光電半導體技術手冊 紀國鐘 蘇炎坤 教授 主編 [18] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C.Campbell, J. Appl. Phys. 83, 6148 (1998). [19] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, Appl. Phys. Lett. 72, 542 (1998). [20] O. Katz, G. Bahir,and J. Salzman, Appl. Phys. Lett.,Vol. 84,No.20,17 May 2004, pp.4092-4094. [21] optoelectronics and photonic principle and practices. S. O. Kasap [22] O. Katz, V. Garber, B. Meyler, G. Bahir,and J. Salzman Appl. Phys. Lett. 79, 1417(2001) [23] O.Katz,G.Bahir,and J. Salzman,Appl.Phys.Lett.,Vol.84,No.20,17 May 2004,4092-4094. [24] Semiconductor material and device charaterization, DIETER K. SCHRODER
第三章 [1] D.Walker, X.Zhang, P. Kung, A. Saxler and et al., Appl. Phys. Lett. 68(15), 8 April,1996, 2100-2101. [2] A. Rogalski,Infrared photon detectors(SPIE,Bellingham,WA1995) [3] Jun OHSAWA, Takahiro KOZAWA and er al., Jpn.J.Appl.Phys.,Vol.12(2005), pp8441-8444.
第四章 [1] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C.Campbell, J. Appl. Phys. 83, 6148 (1998). [2] optoelectronics and photonic principle and practices. S. O. Kasap [3] O. Katz, V. Garber, B. Meyler, G. Bahir,and J. Salzman Appl. Phys.Lett. 79, 1417(2001) [4] D. Walker,X. Zhhang,P. Kung,A. Saxler and et al.,Appl. Phys. Lett. 68(15), 8 April 1996, pp2100-2101. [5] Michael A. Reshchikov and Hadis Morkoc, J.Appl. 97, 061301(2005), p47 [6] Solid-state Electronics Vol. 41, No.2, pp.279-281,1997.
第五章 [1] Semiconductor material and device charaterization, DIETER K. SCHRODER.
第六章 [1] J.Z.Li, J.Y.Lin and H.X.Jiang, et al., Appl.Phys.Lett.69(10), 2 September 1996, 1474. [2] A.Y. POLYKOV, N.B.SMIRNOL, A.V.GOVORKOV, et al., Solid-State Electronics, Vol.42 No.4., pp.627-635,1998 [3]R.H.Horng, D.S.Wuu et al., Thin Solid Films 343-344(1999)642-645
附錄一 [1] Hao JIANG, Naoyuki NAKATA and et al.,Jpn. J. Appl. Vol. 40 (2001) pp.L505-L507, part 2. No. 5B, 15 May 2001. [2]Jun OHSANA, Takahiro KOZAWA and et al., Jpn. J. Appl. Phys.,Vol. 44, No. 12 (2005), pp.8441-8444. [3] O. Katz, V. Garber, B. Meyler, G. Bahir,and J. Salzman Appl. Phys. Lett. 79, 1417(2001) [4] J. C. Carrano, T. Li, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, J. Appl. Phys. 83, 6148 (1998). [5] PC Chang, C H Chen and et al.,Semicond. Sci. Technol.19(2004) 1354-1357 [6] D.W. Kim, Y. J. Sung, J.W. Park,and G.Y. Ywom,Thin Solid Films 398-399(2001) 87-92 [7] Christopher M. Pelto, Y. Austin Chang, and et al., Solid-state Electronics 45(2001) 1597-1605. [8] X. A. Cao and S. J. Pearton and et al.,Appl. Phys. Lett., Vol. 75, No. 26, 27 December 1999, pp. 4130-4132. [9] 半導體製程製造技術 第二版 吳昌崙 張景學 編著
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