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研究生:林嘉瑜
研究生(外文):Lin Chia-Yu
論文名稱:高分子通道式波導之布拉格反射元件製程與研究
論文名稱(外文):Investigation and Fabrication of Polymer Bragg Reflection channel Waveguide Devices
指導教授:張文俊張文俊引用關係
指導教授(外文):Chang Wen-Chung
學位類別:碩士
校院名稱:南台科技大學
系所名稱:電子工程系
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2006
畢業學年度:94
語文別:中文
論文頁數:61
中文關鍵詞:光柵波導軟式印刷
外文關鍵詞:gratingwaveguidePDMSSU8
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本論文提出結合黃光微影以及軟式模仁新穎的製程技術,製程中先以光學全像干涉微影與黃光微影製程製作繞射光柵元件,並且以此繞射光柵元件配合軟性印刷(non-photolithographic)技術之微接觸成形(micro-contact printing )、毛細管成形(micromolding in capillaries)與複製成形(replica molding)技術製作高分子OG繞射光柵模仁,利用高分子OG繞射光柵模仁配合黃光微影製程之厚膜光阻製程與軟性印刷技術,製作高分子布拉格反射波導元件。此法具有容易製作、極低的光耗損和低成本的優點。Bragg反射波導是光波長補/取多工器(Optical Add/Drop Multiplexing;OADM)中最重要主要元件。研究中以原子力顯微鏡、掃描式電子顯微鏡與光學量測等方法觀察與紀錄實驗之結果,並研究探討。其光學傳輸特性可由光頻譜分析儀(OSA)所測量得知。
In this thesis, we proposed a novel process, which incorporates with the photolithography and soft molding techniques. For the Bragg grating fabrication, the stamping transfer technique, incorporated with holographic interference technology, was used to transfer the grating from soft rubber mold to the PDMS polymer mold. Then, we use the PDMS polymer mold to obtain the Bragg reflection waveguide on the OG polymer by using of the photolithography and soft molding techniques. This technique has the advantages such as simple treatment, low loss and fabrication cost. In the meanwhile, a Bragg reflection waveguide is applied for optical add/drop multiplexing (OADM) systems. Optical waveguide and grating were observed throgh SEM and AFM system. The observed results show the good performances of our devices. The optical transmission characteristics were measured in terms of optical spectrum analyzer (OSA).
摘要
英文摘要
誌謝
目次
表目錄
圖目錄
第一章 導論
1.1序論
1.2波導元件發展與研究動機
1.3論文架構
第二章 光波導理論及元件與軟式微影介紹
2.1光波導理論
2.2光波導元件介紹
2.3軟式微影技術
2.3.1 微接觸印刷(microcontact printing,μCP)
2.3.2 毛細管微成形(micromolding in capillaries, MIMIC)
2.3.3 微轉印成形(microtransfer molding, μTM)
2.3.4 複製成形(replica molding, REM)
2.4 PDMS製程條件與特性探討
2.4.1 PDMS特性探討
2.4.2 PDMS製程條件
第三章 OG高分子光柵製作
3.1全像術干涉微影技術
3.2布拉格光柵製作理論
3.3布拉格光柵光學干涉架構
3.4高分子布拉格光柵製程
3.4.1 布拉格光柵黃光微影製程
3.4.2 布拉格光柵之轉印翻模
3.5翻模製程結果
3.5.1 高分子繞射光柵模仁結果比較
第四章 高分子布拉格光柵反射波導
4.1高分子布拉格光柵反射波導元件架構說明
4.2 SU8厚膜光阻特性探討
4.3高分子布拉格光柵反射波導SU8厚膜光阻製程
4.4高分子布拉格光柵反射波導模仁製程
4.5 OG高分子柵輔式波導模仁實驗結果探討
4.5.1 SU-8厚膜光阻與OG高分子繞射光柵基板特性探討
4.5.2 OG高分子柵輔式波導模仁結果探討
4.6高分子布拉格光柵反射波導量測結果
4.6.1 光柵基本原理
4.6.2 高分子布拉格光柵反射波導量測
第五章 結論
參考文獻
作者簡介
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(2)Neyer, T. Knoche, and L. Müller, “Fabrication of low loss polymer waveguides using injection moulding technology,” Electron Lett., Vol. 29, pp. 399-401, 1993.
(3)LaBianca, N., Gelorme, J., Le e, K., Sullican, E., and Shaw, J., ”High aspect ratio optical resist chemistry for MEMS applications,” Proc. 4th Int. Symp. On Magnetic Materials, Processes, and Devices, The Electrochem. Soc., Vol. 18, pp. 368-396, 1995.
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(5)Zhang, J., Tan, K. L., Hong, G. D., Yang, L. J., Gong, H.”Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS,” J. Micromech. Microeng. pp.20-26, 2001.
(6)H. Nishihara, Masamitus Haruna and Toshiaki Suhara, “Optical Integrated Circuites”, McGraw-Hill Company, Inc., 2001.
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(8)黃建誠, ”感光高分子之積體光學波導之研製”, 國立虎尾科技大學光電與材料科技研究所, 2004.
(9)Anadi Mukherjee, Ben Joy Eapen, and Swapan K. Baral, “Very low loss channel waveguides in polymethylmethacrylate “, Appl. Phys. Lett. 65, pp. 3179-3183, 1994.
(10)Chang-Yen, D.A.; Eich, R.K.; Gale, B.K.;”A Monolithic PDMS Waveguide System Fabricated Using Soft-Lithography Techniques”, Lightwave Technology, Journal. Vol. 23, pp. 2088-2093, 2005.
(11)T. C. Sum, A. A. Bettiol, J. A. van Kan, F. Watt, E. Y. B. Pun, and K. K. Tung, “Proton beam writing of low-loss polymer optical waveguides”, Appl. Phys. Lett. Vol. 83, pp. 1707-1713, 2003.
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(14)Daniel B. Wolfe, J. Christopher Love, Byron D. Gates, George M. Whitesides, Richard S. Conroy, and Mara Prentiss, “Fabrication of planar optical waveguides by electrical microcontact printing “, Appl. Phys. Lett. Vol. 84, pp. 1623-1629, 2004.
(15)Younan Xia and George M. Whitesides; “Soft Lithography”, Angew. Chem. Int. Ed. pp. 550-556, 1998.
(16)Nishihara Hiroshi, HarunaMasamitsu, Suhara Toshiaki, “Optical integrated circuits”, New York:McGraw-Hill Book Co.,2001.
(17)Schmahl, G., and D.Rudolph. Holographic diffraction grating, In: Progress in Optics, E. Wolf, ed., North-Holland, Amsterdam, pp.195-199 1976.
(18)Chung-Yen Chao, Cheng-Yen Chen, and Chee-Wee Liu, “Direct writing of silicon gratings with highly coherent ultraviolet laser”, Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National Taiwan University, Taipei.
(19)陳嘉倫,” 以微機電系統技術製作繞射光柵模仁與柵輔式波導模仁” 國立虎尾科技大學光電與材料科技研究所, 2005.
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