臺灣博碩士論文加值系統

本研究分兩階段濺鍍氮化鉻薄膜，在第一階段利用試片與鉻銅靶之間的距離差異濺鍍出銅含量自0.37 at%至14.90 at%的氮化鉻銅薄膜，第二階段則改變銅靶功率獲得銅含量自1.64 at%至21.90 at%的氮化鉻銅薄膜。由表面型貌與截面觀察分析結果可知，當銅含量超過10.88 at%，其柱狀晶結構將會轉變為較細緻的結晶結構，且薄膜表面粗糙度隨著銅含量增加而下降。基本上，鍍膜硬度隨著鍍膜銅含量的增加而下降，而在第二階段鍍製之薄膜銅含量達約21.90 at.% 時，鍍膜硬度反而升高。第一階段製備的氮化鉻銅薄膜以奈米刮痕試驗之結果得知，隨著銅含量的增加，薄膜摩擦係數由0.104開始降至0.060。由HRC壓痕試驗及刮痕試驗結果來評斷氮化鉻銅鍍膜的附著性質發現，在壓痕試驗中雖然附著強度品質較差，刮痕試驗之臨界荷重數值不高，不過刮道之刮痕前端僅產生細小裂痕，且刮痕末端位置並未發現有明顯破裂形貌產生，因此綜觀言之氮化鉻銅薄膜與底材之間仍有良好之附著性。

In this study, there are two methods to deposit the Cr-Cu-N Nanocomposite thin films. The first one is to produce the Cr-Cu-N thin films with different Cu contents due to distance difference between the Cu and Cr targets. The Cu content ranging from 0.37 to 14.90 at.% were achieved. The second method is to change the Cu target power to achieve thin films with Cu contents ranging from 1.64 to 21.90 at.%. It is observed that the columnar structure no longer exists when Cu content exceeds 10.88 at.%. The surface roughness of thin films decreases with increasing Cu content. The nanohardness of the Cr-Cu-N coating decreases with increasing Cu content. However, the nanohardnes increase dramatically when the cu content exceeds 21.90at%. For thin films deposited by the first method, the coefficient of friction of thin films decreases with increasing Cu content which was tested by ananoscratch tests. Based on the scratch and the HRC adhesion strength test results of the Cr-Cu-N coatings, although the critical load and the adhesion strength quality is not very good, the adhesion properties of thin films are still sufficient. Only small chippings are found at the edge of scratch track.

摘要…………………………………………………………………………………….i
誌謝………………………………………………………………………………...…iii
目錄……………………………...……………………………………………………iv
圖目錄………………………………………………………………………………...vi
表目錄…………………………………………………………………………..….....ix
第一章 序論…………………………………………………………………………..1
1-1前言………………………………………………………………………1
1-2研究動機與目的………………………………………………………....1
第二章 文獻回顧………………………………………………………………….….4
2-1氮化鉻薄膜特性…………………………………………….……….…..4
2-2氮化鉻銅奈米複合薄膜(CrCuN)的特性……………………….……….5
2-2-1奈米複合薄膜……………………………………………….……5
2-2-2氮化鉻銅奈米複合薄膜……………………………………….…7
2-3脈衝直流磁控濺鍍法………………………………………………..…11
2-3-1磁控濺鍍法………………………………………………….…..11
2-3-2脈衝電源技術…….……………………………………………..12
2-4電漿診斷………………………………………………………………..13
2-4-1電漿診斷…………………………………………………..…….13
2-4-2發射光譜儀(OES, Optical Emission Spectrometer)…….………13
第三章 實驗步驟………………………………………………………………...….16
3-1實驗流程……………………………….…………………….…………16
3-2實驗方法與步驟………………………………………………………..19
3-2-1試片規格與前處理………………………………………….….19
3-2-2實驗設備………………………………………………………..19
3-2-3實驗步驟…………….………………………………………..…20
3-3鍍膜性質分析……………….………………………………..………...24
3-3-1成份分析.……...…….………………………………….……….24
3-3-2表面與截面分析……………………………………….….…….24
3-3-3 X光繞射分析………………………………………….……..…25
3-3-4硬度試驗……………………………………………….………..26
3-3-5附著性試驗…………………………………………….………..27
3-3-5-1 Rockwe11-C壓痕試驗法…………………………………27
3-3-5-2刮痕試驗法……………………………………………….28
3-3-6奈米刮痕試驗……………………….……………………….….29
3-3-7磨耗試驗………………………………………………...………29
3-3-8激發分光光譜儀………………………….………………..……30
第四章 結果與討論……………………………………………………………..…..32
4-1第一階段基本性質分析與機械性質分析……………………………..32
4-1-1成份分析…………………………………………………..…….32
4-1-2薄膜晶相與微結構分析…………………………………...……34
4-1-3薄膜機械性質分析…………………………………………..….54
4-1-3-1硬度分析…………………………………………….……54
4-1-3-2附著性分析……………………………………………….56
4-1-3-3奈米刮痕試驗分析……………………………………….63
4-2第二階段基本性質分析與機械性質分析……………………………..66
4-2-1電漿觀察分析………………………….………………………..66
4-2-2成份分析……………………………….…………..……………68
4-2-3薄膜晶相與微結構分析……………….……………………..…69
4-2-4薄膜機械性質分析…………………….………………..………79
4-2-4-1硬度分析………………………………………………….79
4-2-4-2附著性分析…………………………………………….…80
4-2-4-3磨耗性質分析………………………………………….....88
第五章 結論…...……….………………………………………………………...….92
參考文獻…….……….…………..……..………………………………………...….94

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