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1.S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Imprint of sub-25 nm vias and trenches in polymer, Appl. Phys. Lett., Vol. 67, 3114-3116, 1995. 2.X.-J. Shen, Li-Wei Pan, and Liwei Lin, Microplastic embossing process: experimental and theoretical characterizations, Sensors and Actuators A, 428-433, 2002. 3. J. Seekamp , S. Zankovych , A. H, Helfer , P. Maury , C. M. S. Torres , G. Bottger , C. Liguda , M. Eich , B. Heidari , L. Montelius , and J. Ahopelto . Nanoimprinted passive optical devices . Nanotechnology 13 , 581 , 2003 4. H. Cao , J. O. Tegenfeldt , R. H. Austin , and S. Y. Chou . Fabrication of 10 nm enclosed nanofluidic channels . Appl. Phys. Lett. 81 , 3058 , 2002 5. W. Zhang and S. Y. Chou . Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels . Appl. Phys. Lett. 83 , 1632 , 2003 6. K. A. Lister , S. Thoms , D. S. Macintyre , C. D. W. Wilkinson , and J. M. R. Weaver , Direct imprint of sub-10 nm features into metal using diamond and SiC stamped , 2004 7. A. Kumar and G. M. Whitesides , Appl. Phys. Lett. 63 , 2002 , 1993. 8.P Ruchhoeft , M. Colburn , B. Choi , H. Nounu , S. Johnson , T. Bailey , S. Damle , M. Stewart , J. Ekerdt , S. V. Sreenivasan , J.C. Wolfe , And C.G. Willson , ,J. Vac. Sci. Technol. B 17 ,2965 ,1999 9.M. Colburn , S. Johnson , M. Stewart , T. Michaelson , S. V. Sreenivasan , J. G. Ekerdt and C. G. Wollson , , Proc. SPIE 3676(I) , 1999 10.Yoshihiko Hirai, Satoshi Yoshida, and Nobuyuki Takagi, Defect analysis on thermal nanoimprint lithography, J.Vac. Sci. Technol., B.21.6, 2765-2770, 2003. 11.Treloar, L.R.G, The physics of rubber elasticity, Oxford University Press,1958 12.Mooney, M., A Theory of large elastic deformation, J. Applied Physics Vol. 11, 582, 1940. 13.R. S. Rivin, Philos., Large elastic deformation of isotropic materials. VI. Further Results in the Theory of Torsion , Shear and Flexure Ser., A.242, 173, 1949. 14.Ogden, R. W., Large deformation isotropic elasticity on the correlation of theory and experiment for compressible rubberlike solids, Proc. R. Soc. Lond. A. ,vol.328, 567-583, 1972. 15.Maerker, J. M. and W. R. Schowalter, Biaxial extension of an elastic liquid, rheology Acta, vol.13, 627-638, 1974. 16.Yoshihiko Hirai, Masaki Fujiwara, Takahiro Okuno, and Yoshio Tanaka, Study of resist deformation in nanoimprint lithography, J.Vac. Sci. Technol., B19.6, 2811-2815, 2001. 17.C.-R. Lin, R.-H. Chen and C. Hung, The characterization and finite-element analysis of a polymer under hot pressing, Int. J. Adv. Manuf. Technol., vol.20, 230-235, 2002. 18.Yi-Je Juang, L. James Lee, and Kurt W. Koelling, Hot embossing in microfabrication. Part II: Rheological characterization and process analysis, Polym. eng. sci., 551-566, 2002. 19.Yoshihiko Hirai, Takaaki Konishi , Takashi Yoshikawa , and Satoshi Yoshida . Simulation and experimental study of polymer deformation in nanoimprint lithography . J. Vac. Sci. Technol. B 22(6) , 2004 . 20.徐澤志、林俊源和吳重謙,奈米壓印製程參數分析,中國機械工程學會第二十二屆,2005 21.陳仁浩和王培良,塑膠微熱壓成形之研究,國立交通大學機械工程研究所碩士論文,民國八十七年。 22.L.J. Heydrmn, H. Schift, C. David, J. Gobercht, and T. Schweizer, Flow behavior of thin polymer films used for hot embossing lithography, Microelectron. eng. vol.54, 229-245, 2000. 23.Graham L. W. Cross , Barry O’Connell , and John B. Pethica . Mechanical Aspects of Nanoimprint Patterning , 2003 . 24.MARC training guide, MARC analysis research corporation, 21-24, 1999. 25.MARC Analysis Research Corporation, Volume A, Version K7, 1999.
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