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研究生:鍾大任
研究生(外文):chung ta-jen
論文名稱:氮化銦鎵/氮化鎵多重量子井結構光和結構特性研究
論文名稱(外文):Study of the optical and structure properties in InGaN/GaN multiple quantum wells
指導教授:吳國梅
指導教授(外文):wu gwo-mei
學位類別:碩士
校院名稱:長庚大學
系所名稱:光電工程研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:中文
論文頁數:72
中文關鍵詞:氮化銦鎵氮化銦應力層
外文關鍵詞:InGaNInGaNstrain relief layer
相關次數:
  • 被引用被引用:0
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  • 下載下載:61
  • 收藏至我的研究室書目清單書目收藏:0
以矽原子摻雜barrier和以調變長well層溫度的條件來討論氮化銦鎵/氮化鎵多重量子井(InGaN/GaN multi-quantum wells)的結構特性和光學特性的研究,為了瞭解材料的結構特性,我們以高解析度X光繞射儀進行量測並分析其結果,在光學性質上,我們以光激螢光並且加以溫度的調變做探討
The improvements of quantum efficiency and thermal stability by using Si delta doping in blue InGaN/GaN multiple quantum well (MQW) structures have been investigated. The high-resolution X-ray diffraction (HR-XRD) indicated better interface properties in the MQWs for Si delta doping structures. The Arrhenius plots of the temperature-dependent photoluminescence (PL) spectra were used to reveal the enhancements of the radiative recombination. The activation energy was increased from 115 to 140 meV for the InGaN/GaN MQW sample with Si delta doping. The improvements of the thermal stability and activation energy were attributed to the supply of electrons from the Si delta doping barrier region into the InGaN well layer and the increase in hole capturing by the higher energy barrier in the valence band. Si delta doping process plays a crucial role in carrier recombination to significantly suppress carrier leakage, which not only increases the exciton confinement, but also improves the quantum efficiency.
目錄
指導校授推薦書
口試委員會審定書
授權書
中文摘要 i
英文摘要 ii
致謝 iv
目錄 v
第一章 緒論 1
1.1 前言 1
1.2 背景簡介 3
1.3 研究動機 3
1.4 論文架構 4
第二章 文獻回顧及相關原理 6
2.1 發光二極體的發光原理 6
2.2 氮化鎵發光二極體原理 10
2.3 活化能原理 14
2.4 量子效率 16
2.5氮化銦鎵的材料特性 17
第三章 樣品及量測糸統介紹 26
3.1實驗樣品結構 26
3.2 X-ray繞射分析儀原理及架構 30
3.3光激螢光光譜儀的原理及架構 33
第四章Si-doped barrier40 40
4.1 X-ray 繞射光譜分析圖 40
4.2變溫光激螢光光譜 42

第五章 應力釋放層結構 (SRL) 55
5.1 X-ray 繞射光譜分析圖 55
5.2變溫光激螢光光譜 56
第六章 結論 71
第七章 未來展望 72
文獻探討
[1.1] V. Yu. Davadov, A. A. Klochated and V. V. Emtsev phys. Stat. sol. (b) 230 NO. 2, R4-R6 (2002).
[1.2] V. Yu. Davadov, A. A. Klochated and V. V. Emtsev phys. Stat. sol. (b) 234 NO. 3, 787-795 (2002).
[1.3] Y. Narukawa, Y. Kawakami, M. Funato, Sz. Fujita, Sg. Fujita and S. Nakamura, Phys. Rev. B 55, R1938(1997).
[1.4] Y. Narukawa, Y. Kawakami, M. Funato, Sz. Fujita, Sg. Fujita and S. Nakamura, Appl. Phys. Lett. 70, 981(1997).
[1.5] P. Riblet, H. Hirayama, A. Kinoshita, A. Hirata, T. Sugang and Y. Aoyagi, Appl. Phys. Lett. 75, 2241(1999).
[1.6] T. Wang, H. Saeki, J. Bai, T. Shirahama, M. Lachab and S. Sakai, Appl. Phys. Lett. 76, 1737(2000).

文獻探討:
[2.1] H. Morkoc, S. Strite, G.B. Gao, M. E. Lin, B. Sverdlov and M. Burns, “Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies”, J. Appl. Phys., 76, p.1363-1398, (1994).
[2.2] S. C. Jian, M. Willander, J. Narayan and R. Van Overstraeten, “III-nitrides:Growth, characterization, and properties”, J. Appl. Phys., 87, p.965-1006, (2000).
[2.3] G. Landwher, A. Waag, F. Fischer, H. –J. Lugauer and K. Schüll, “Blue emitting hetero-structure laser diodes”, Physica E, 3, p.158-168, (1998).
[2.4] A. Gerhard, J. Nürnberger, K. Scühll, V. Hock, C. Schumacher, M. Ehinger and W. Faschinger, “ZnSe-based MBE-grown photodiodes, Journal of crystal growth, 184/185, p.1319-1323, (1998).
[2.5] G. F. Neumark, “Achievement of low-resisitivity p-type ZnSe and role of twinning”, J. Appl. Phys., 65, p.4859-4863, (1989).
[2.6] J. Wu, W. Walukiewicz, K. M. Yu, J. W. Ager, E. E. Haller, Hai Lu, William J. Schaff, Yoshiki Saito, and Yasushi Nanishi, “Unusual properties of the fundamental band gap of InN”, Appl. Phys. Lett., vol. 80, pp. 3967-3969 (2002).
[2.7] Takashi Matsuoka, Hiroshi Okamoto, Masashi Nakao, Hiroshi Harima, Eiji Kurimoto, “Optical bandgap energy of wurtzite InN”, Appl. Phys. Lett., vol. 81, pp. 1246-1248 (2002).
[2.8] R. F. Davis, M. J. Paisley, Z. Sitar, D. J. Kester, K. S. Ailey, K. Linthicum,L. B. Rowland, S. Tanaka, and R. S. Kern, J. Cryst. Growth 178, 87 (1997).


文獻探討
[3.1] Shuji Nakamura, Masayuki Senoh, Shin-ichi Nagahama, Naruhito Iwasa, Takao Yamada, Jpn. J. Phys. V36 L1568 (1997).
[3.2] D. Keith Bowen and Brian K. Tannner, High Resolution X-ray Diffractiometry and Toporaphy.
[3.3] Swaminathan , V, Materials aspects of GaAs and InP based structures / V. Swaminathan, A.T. Macrander, Prentice Hall c1991.
文獻參考 :
[4.1] M. Schuster, P. O. Gervais, B. Jobst, W. H. Osler, J. Phys. D: Appl. Phys. 32, A56 (1999).
[4.2] K. Kusakabe, T. Hara, K. Ohkawa, J. Appl. Phys. 97, 043503 (2005).
[4.3] R. J. Kaplar, S. R. Kurtz, D. D. Koleske, J. Appl. Phys. 95, 9 (2004).
[4.4] P. G. Eliseev, P. Perlin, J. Lee, M. Osinski, Appl. Phys. Lett. 71, 569 (1997).
[4.5] M. Kneissl, D. P. Bour, N. M. Johnson, L. T. Romano, B. S. Krusor, Appl. Phys. Lett. 72, 1539 (1998).


文獻參考 :
[5.1] T. Wang,a) D. Nakagawa, J. Wang, APPLIED PHYSICS LETTERS VOLUME 73, 1998,0003-6951
[5.2] H.K. Cho,*, J.Y. Lee, Applied Surface Science 221 (2004) 288–292
[5.3] H. K. Cho and J. Y. Lee, APPLIED PHYSICS LETTERS VOLUME 79, 2001 215-217
[5.4] J. Bai, T. Wang, JOURNAL OF APPLIED PHYSICS VOLUME 90, NUMBER 4 15 AUGUST 2001
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