跳到主要內容

臺灣博碩士論文加值系統

(3.235.120.150) 您好!臺灣時間:2021/07/31 15:09
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:陳宥辰
研究生(外文):Y. C. Chen
論文名稱:鎳基超合金Inconel718在過氯酸與醋酸混合溶液之電化學拋光行為
論文名稱(外文):The electropolishing behavior of the Inconel 718 alloy in the perchloric and acetic mixed acids with different concentrations of perchloric acid
指導教授:黃清安
指導教授(外文):C. A. Huang
學位類別:碩士
校院名稱:長庚大學
系所名稱:機械工程研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:英文
論文頁數:57
外文關鍵詞:Inconel 718electropolishingAC impedanceHClO4-CH3COOH mixed acids
相關次數:
  • 被引用被引用:0
  • 點閱點閱:169
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
The electropolishing behavior of the Inconel 718 alloy was studied by using rotating disc electrode (RDE) in the HClO4-CH3COOH mixed acids with different HClO4-concentrations. After electropolishing, surface morphologies of RDE specimens were examined with surface profiler, atomic force microscope and scanning electron microscope. According to the polished surfaces, three types of anodic dissolution behavior can be characterized in relation to the HClO4-content in mixed acids; namely, a leveling without brightening of the surface in 10 and 20 vol% HClO4, a leveling and brighten of the surface in 30 and 40 vol% HClO4, and a matt and gray surface in the mixed acids with 50 vol% or more HClO4. Anodic dissolution in the first and second dissolution types follows a mass-transfer controlled mechanism, in which a linear relationship between the reciprocal of limiting-current density and the reciprocal of square root rotation speed of RDE specimen can be detected. Owing to precipitation of a salt film on the polished surface of the Inconel 718 alloy, saturated dissolved metallic ions could be the chemical species for the mass-transfer controlled mechanism. The salt film, in addition, also enhances the corrosion resistance of the Inconel 718 alloy. This can be realized with the results of anodic potentiodynamic test in 1 M H2SO4.

The electropolishing behavior of Inconel 718 alloy was studied by means of alternative current (AC) impedance test in the perchloric-acetic mixed acids at 25oC. The AC impedance test was conducted at the potential located in the limiting current plateau region with different potential amplitudes of 20, 200, 500 and 1000 mV, respectively. The results of AC impedance test show that large potential amplitudes will be recommended to obtain stable AC impedance spectra in the anodic dissolution under mass-transfer controlled mechanism. It can be recognized with the results of AC impedance test that precipitation of a salt film on the surface of Inconel 718 alloy was the main reason for mass-transfer controlled mechanism. That is, small semi-circles can be found with the Inconel 718 RDE specimens in the Nyquist diagrams in the high frequency domain when polishing at the potential located in the limiting-current plateaus.
指導教授推薦書 ii
口試委員會審定書 iii
授權書 iv

Acknowledgement v
Abstract vi
Contents vii
Pictures of Contents ix
Tables of Contents xii

CHAPTER I Introduction 1
1.1 Introduction to the Inconel 718 alloy 1
1.1.1 The micorstructure of Inconel 718 2
1.2 Electropolishing 3
1.2.1 Application of electropolishing 4
1.2.2 Electropolishing mechanism 5
1.3 Electrochemical test 7
1.3.1 Anodic polarization 7
1.3.2 Potentiostatic test 8
1.3.3 AC impedance 9

CHAPTER II The Purpose of This Study 10

CHAPTER III Experimental Procedures 11
3.1 Specimen preparation 11
3.2 Electropolishing 11
3.3 Electrochemical test 12
3.4 Surface morphology examination 13

CHAPTER IV Results and Discussion 14
4.1 Anodic polarization behavior 14
4.2 Potentiostatic etching and surface morphology 15
4.2.1 Polishing in 10 and 20 vol % HClO4-CH3COOH mixed acids 15
4.2.2 Polishing in the mixed acids with 30 and 40 vol % HClO4 17
4.2.3 Polishing in the mixed acids with 50 vol % or more HClO4 18
4.3 AC impedance test 19
4.3.1 AC impedance spectra in the mixed acids with 10 and 20 vol% HClO4 19
4.3.2 AC impedance spectra in the mixed acid with 30 and 40 vol% 21
4.3.3 AC impedance spectra in the mixed acid with 50 vol% HClO4 22
4.4 Examination of polished surface morphology2 22
4.5 The salt-film mechanism 24

CHAPTER V Conclusion 27

REFERENCES 43
[1] M. J. Donchie Jr., Introduction to Superalloys, ASM International, Ohio, 1984
[2] Q. Chen, N. Kawagoishi, H. Nisitani, Mater. Sci. Eng. A, 277 (2000) 250.
[3] L. Nastac, D.M. Stefanescu, Metall. Mater. Trans. A, 27 (1996) 4075
[4] M. J. Cieslak, T. J. Headley, G. A. Knorovsky, A. D. Romig, T. Kollie, Metall. Trans. A , 21 (1990) 479
[5] J. Prybylowski, R. Ballinger, Nat. Assoc. Corr. Eng., 43 (1987) 111.
[6] C. A. Huang, T. H. Wang, C. H. Lee, W. C. Han, Mater. Sci. Eng. A, 398 (2005) 275
[7] Vol. 9 Metallography and Microstructures 9th edt. , ASM handbook International, Taiwan, 1992
[8] G. A. Knorovsky, M. J. Cieslak, T. J. Headley, Metallogr. Transact. A, 20 (1987) 1989
[9] J. He, G. Han, S. Fukuyama, K. Yokogawa, Acta Mater., 46 (1998) 1359
[10] S. Srinivas, M. C. Pandey, Prakt. Metallogr. 32 (1995) 3
[11] R. B. Li, M. Yao, W. C. Liu, X. C. He, Scripta Mater., 46 (2002) 635
[12] R. Vincent, Acta Metall., 33 (1985) 1205
[13] Ch. Radhakrishna, K. P. Rao, S. Srinivas, J. Mater. Sci. Letters, 14 (1995) 1810
[14] C. Slama, M. Abdellaoui, J. Allo. Compon., 306 (2000) 277
[15] Xiao Huang, M. C. Chaturvedi, N. L. Richards, J. Jackman, Acta Mater., 45 (1997) 3095
[16] P. A. Jacquet, Nature, 135 (1935) 1076
[17] P. A. Jacquet, Trans. Electrochem. Soc., 69 (1936) 639
[18] P. A. Jacquet, Metal Finishing, 47 (1949) 83
[19] H. Figour, P. A. Jacquet, French Patent, No. 707526 (1930)
[20] T. P. Hoar, J. A. S. Mowat, Nature, 165 (1950) 64
[21] T. P. Hoar, T. W. Farthing, Nature, 169 (1952) 324
[22] T. P. Hoar, Modern Aspects of Ekctrochemistry, Butterworths, London, 1959
[23] T. P. Hoar, D. C. Mears, G. P. Rothwell, Corros. Sci., 5 (1965) 279
[24] T. P. Hoar, Corros. Sci., 7 (1967) 341
[25] T. P. Hoar, G. P. Rothwell, Electrochim. Acta, 9 (1964) 135
[26] I. Epelboin, Proc. Surface, Foster, Zurich, 1966
[27] I. Enelboin, Z. Elektrochem., 62 (1958) 813
[28] M. Daguenet, I. Epelboin, M. Froment, Acad. Sci., 285 (1964) 3694
[29] I. Epelboin, M. Keddam, Acad. Sci., 258 (1964) 137
[30] M. Datta, D. Landolt, J. appl. Electrochem., 7 (1977) 247
[31] J. Edwards, J. Electrochem. Soc., 180 (1950) 189
[32] J. Edwards. J. Electrodeposition Techn. Soc., 28 (1952) 133
[33] W. J. McTegart, The Electrolytic and Chemical Polishing of Metals, Pergamon Press, London, 1956
[34] P. V. Shigolev, Electrolytic and Chemical Polishing of Metals 2nd edt., Freund Public, Israel, 1974
[35] D. Landolt, Electrochim. Acta, 32 (1987) 1
[36] M. Datta and D. Landolt, J. Electrochem. Soc., 122 (1975) 1446
[37] C. Clerc, M. Datta, D. Landolt, Electrochem. Acta, 29 (1984) 787
[38] Annual book of ASTM Standards, Part 9 B 374, ASTM. Philadelphia, PA , 1979
[39] E. Heitz, R. Henkhaus, A. Rahmel, CORROSION SCIENCE an experiment approach, Ellis Horwood, New York, 1992
[40] Denny A. Jones, Principles and Prevention of Corrosion, Macmillan Publishing, New York, 1992
[41] E. E. Stanstbury, R. A. Buchanan, Fundamental of Electrochemical Corrosion, ASM International, Ohio, 2000
[42] S. Magaino, M. Matlosz, D. Landlt, J. Electrochem. Soc., 140 (1993) 1365
[43] R.Vidal, A.C. West, J. Electrochem. Soc., 145 (1998) 4067.
[44] C. A. Huang, W. Lin, S.C. Lin, Corros. Sci., 45 (2003) 2627.
[45] Scully, R. John, C. David, Electrochemical Impedance :analysis and interpretation, Philadelphia : ASTM, 1993
[46] C. A. Huang, Y. Z. Chang, S.C. Chen, Corros. Sci., 48 (2003) 460
[47] L. Ponto, M. Datta, D. Landolt, Surf. Coat. Tech., 30 (1987) 256
[48] S. C. H. Huang, Y. Pan, Corros. Sci., 48 (1992) 594
[49] D. Wallinder, J. Pan, C. Leygraf, A. Delblanc-Bauer, Corros. Sci., 42 (2000) 1457
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top