本研究目的為獲得最大薄膜製品折射率的鍍膜製程參數。鍍膜材料為二氧化鈦，以電子槍蒸鍍加離子源助鍍實驗，實驗因子為製鍍氣壓、基板溫度、蒸發速率。實驗設計採用三個2水準因子，反覆次數為3的全因子設計。
以變異數分析分析數據，得知製鍍氣壓、基板溫度、蒸發速率及三個因子的交互作用為顯著效應，並得到最大薄膜製品折射率的鍍膜製程參數為製鍍氣壓1.0×10-3pa、基板溫度300℃及蒸發速率4 Å/sec。經過確認實驗，確認所得鍍膜製程參數。

The objective of this paper is to obtain the thin filmed process parameters to maximize the refraction rate. The plating material is TiO2 and using electron beam evaporation associated with ion-beam assisted deposition to experiment. The experiment factors are working pressure, substrate temperature and deposition rate. The design of experiment is 23 full factorial design with 3 replications.
The analysis of variance indicate that the main effect of working pressure, substrate temperature, deposition rate and three-factor interaction are significance and obtain the optimal thin filmed process parameters that are working pressure 1.0×10-3pa, substrate temperature 300℃ and deposition rate 4Å/sec. The result of confirmation experiment makes sure the optimal thin filmed process parameters.

誌謝 i
摘要 ii
Abstract iii
目錄 iv
圖目錄 vi
表目錄 vii
第一章 緒論 - 1 -
1.1 光電產業 - 1 -
1.2 研究動機與目的 - 3 -
1.3 研究架構 - 3 -
第二章 文獻探討 - 5 -
2.1 鍍膜材料、製程參數及鍍膜方法相關文獻 - 5 -
2.2 實驗設計文獻回顧 - 8 -
第三章 研究方法 - 11 -
3.1鍍膜製程 - 11 -
3.2 實驗因子、水準及反應變數 - 14 -
3.2.1反應變數 - 14 -
3.2.2因子選擇與水準設定 - 14 -
3.3實驗設計 - 16 -
3.4數據分析 - 17 -
3.5最佳參數選擇與確認實驗 - 21 -
3.5.1 最佳參數選擇 - 21 -
3.5.2確認實驗 - 21 -
3.6 結論與建議 - 24 -
3.7 實驗設備 - 24 -
3.7.1 真空系統 - 24 -
3.7.2電子槍蒸鍍系統 - 25 -
3.7.3 監控系統 - 27 -
3.7.4紫外/可見/近紅外光譜儀 - 28 -
第四章 數據分析 - 29 -
4.1 實驗數據 - 29 -
4.2模型適合性檢查 - 30 -
4.3 計算因子效應平方和 - 35 -
4.4 進行變異數分析檢定 - 37 -
4.5 取得最佳參數水準 - 38 -
4.6 確認實驗 - 39 -
4.6.1 估計迴歸模型 - 39 -
4.6.2 確認實驗值的預測區間 - 41 -
4.6.3 確認實驗 - 42 -
4.7 實驗數據分析結論 - 42 -
第五章 結論 - 43 -
參考文獻 - 44 -

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