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研究生:林永鑫
研究生(外文):YUNG-HSIN LIN
論文名稱:以離子束濺鍍系統鍍製氮氧化鋁薄膜之研究
論文名稱(外文):Research of Aluminum Oxynitride Thin Films Deposited by Ion Beam Sputtering
指導教授:徐進成
指導教授(外文):JIN-CHERNG HSU
學位類別:碩士
校院名稱:輔仁大學
系所名稱:物理學系
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:中文
論文頁數:54
中文關鍵詞:氮氧化鋁離子束濺鍍
外文關鍵詞:Aluminum OxynitrideIon Beam Sputtering
相關次數:
  • 被引用被引用:3
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研究對於不同比例的氮氧化鋁薄膜做分析,研究中的氮氧化鋁薄膜光學特性介於氮化鋁以及氧化鋁薄膜之間(2.1~1.68),但要如何使氮氧化鋁薄膜中含有氮與氧的成分,則必須控制微量的氧通量及供給高能量的氮離子束。
氮氧化鋁薄膜之前文獻的研究必須使用離子束輔鍍的方式才能使氮化合於薄膜中,此研究則是以離子束濺鍍系統鍍製氮氧化鋁薄膜,此系統有高離子束能量的優勢以及穩定的沉積速率,較其它鍍製方式有效使氮沉積於薄膜中,且能穩定的使氮氧化鋁沉積於機板上。
氮化鋁薄膜為一高硬度、高絕緣以及高能隙的薄膜(6.2eV),氧化鋁與氮化鋁薄膜特性大致相同,同為高能隙的薄膜(6.7eV),皆具有低吸收的特性,最大的差異在光學折射率,氮化鋁薄膜為高折射率2.1,氧化鋁為中折射率在1.68,這樣的差異經由不同混合的方式可以配置出不同光學特性的氮氧化鋁薄膜,因此在多層膜的設計就更易使用一種材料完成。此外氮氧化鋁特性具有較高的能隙,可以做為近紫外光薄膜應用。
Aluminum Oxynitride thin films(AlOxNy) exhibit high transmittance, high resistivity, variable refractive index(2.1~1.68) and high energy gap(>6.2). The method of ion beam assisted deposition (IAD) has been wildly used in the AlOxNy thin films deposition process due to nitrogen hardly inhabits in thin film without using IAD.
In this study, AlOxNy thin films are deposited by ion beam sputtering (IBS) system at room temperature. The advantages of IBS system are high ion beam energy and stable deposition rate.The N atoms content of AlOxNy thin films come from high energy nitrogenous ions, and the O atoms content are controlled by different pressure of oxygen. The optical properties of AlOxNy change as the pressure of oxygen changes. The optical properties of AlOxNy have successfully controlled in this study, and AlOxNy thin films are expediently used in the optical thin film design, especially in the UV light range.
中文摘要 .........................i
英文摘要 .........................ii
致謝辭 .........................iii
目錄...........................iv
圖目錄..........................vii
表目錄..........................x
第一章 簡介........................1
第二章 文獻回顧.....................3
第三章 實驗儀器及原理.................13
3.1離子束濺鍍系統及原理................13
3.2 Varian Cary 5E光譜儀.................17
3.3橢偏儀.......................19
3.4 X-ray 繞射儀....................20
3.5原子力顯微鏡....................22
3.6紅外線光譜儀....................23
第四章 實驗結果與討論..................26
4.1氮氧化鋁之研究...................26
4.2氮氧化鋁實驗方法..................26
4.2.1氮化鋁之研究..................27
4.2.2氮化鋁方法...................28
4.2.3氮化鋁實驗結果..................29
4.2.3.1 Varian Cary-5E光譜儀量測薄膜穿透光譜.....29
4.2.3.2 折射率及消光係數之計算與比較.........30
4.2.3.3 AFM量測各膜層之表面粗糙度.........33
4.2.3.4氮化鋁薄膜能隙計算..............34
4.2.3.5. 氮化鋁薄膜研究結論..............36
4.2.4 氧化鋁之研究...................37
4.2.5 氧化鋁實驗方式..................38
4.2.6氧化鋁實驗結果..................39
4.3 氮氧化鋁實驗結果...................41
4.3.1 光學特性分析...................41
4.3.2 AFM量測....................44
4.3.3 氮氧化鋁能隙之變化................47
4.3.4 XRD與FTIR...................48
第五章 氮氧化鋁實驗結論................50
參考文獻.......................52
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