臺灣博碩士論文加值系統

成長奈米碳管最常使用的金屬觸媒為鐵、鈷、鎳三種元素，然而研究報導指出，含二種元素所組成的合金觸媒對於控制碳管生長的型態、管徑等具有特殊的效果。本論文主要是使用射頻磁控濺鍍系統(RF Magnetron sputtering System)製備金屬觸媒層，金屬觸媒層方面採用鎳金屬掺雜鐵金屬使之成為Ni-Fe 合金觸媒層，並控制Ni-Fe 合金觸媒層的組成比，藉由改變金屬觸媒層的成份，探討不同的金屬觸媒層對成長奈米碳管及場發射特性的影響。濺鍍沉積之合金觸媒層，先利用微波電漿化學氣相沉積(Microwave Plasma-enhance Chemical Vapor Deposition,MPCVD)系統以氫氣電漿蝕刻成奈米尺寸合金金屬球，於500℃溫度，在氫氣氣氛下分解甲烷，產生構築奈米碳管的碳分子以進行奈米碳管成長。最後使用FE-SEM、TEM、場發射量測系統與Raman光譜儀，分析探討奈米碳管的成長型態與特性。
結果顯示︰由SEM 觀察可知，Ni-Fe 合金觸媒所成長之CNT 的成長型態屬於分支狀型。由TEM 觀察可得Ni-Fe 合金觸媒所成長之CNT為中空竹節狀多層奈米碳管。隨著Fe 含量的增加，其場發射特性越好，在Fe 含量39.4wt% 時，得到最低起始電壓為6.8V/μm，最高電流密度為314μA/cm2。

The iron, cobalt and nickel are three kinds of element most used as catalyst to grow CNT. However the research report pointed out that, the alloy catalyst which contains two different kinds of element has special effect on controlling CNT growth and caliber. The present research mainly uses RF Magnetron sputtering system to prepare the metal catalysts. The metal catalyst used in this study is nickel metal doped with different percent of iron metal and annealed to become a Ni-Fe alloy catalyst. By
changing the composition of alloy catalyst, the growth of CNT and the character of field emission were studied. The alloy catalysts were etched by the microwave plasma enhanced chemical vapor deposition system in hydrogen atmosphere to produce nano scale catalysts. Then the mixture of methane and hydrogen were fed into the system to grow CNT at 500℃.
The as-grown CNT samples were characterized by FE-SEM、TEM and Raman Spectroscopy. Its field emission properties were characterized by the I-V Measurement. The result shows that using Ni-Fe alloy catalyst will produce branched shape CNT. These CNT observed by the TEM showing a hollow bamboo structure with multi-walled CNT. Increasing the Fe amount in catalyst, the behavior of field emission is better. When Fe content in alloy catalyst is 39.4wt%, the lowest initial voltage of emission is 6.8V/μm and the highest current density is 314μA/cm2.

中文摘要-------------- i
英文摘要----------- ii
致 謝---------------iiii
目 錄--------------iv
圖目錄--------- vi
第一章、 序論 1
前言------------1
第二章、 文獻回顧與理論基礎 2
2-1 奈米碳管的結構與特性-----------2
2-1-1 單層奈米碳管之結構與電性---------3
2-1-2 多層奈米碳管之結構與電性----3
2-1-3 機械性質-------4
2-1-4 熱性質--------5
2-1-5 儲氫性質-------5
2-2 奈米碳管之合成方法---------- 12
2-2-1 電弧放電法--------- 12
2-2-2 雷射蒸鍍法------- 13
2-2-3 化學氣相沉積法--------- 13
2-3 奈米碳管之成長機制------------ 19
2-4 觸媒種類-------- 23
2-5 場發射理論----- 25
2-6 奈米碳管之應用--- 27
第三章、 實驗方法與步驟 29
3-1 實驗流程------ 30
3-2 實驗材料------- 31
3-3 實驗步驟------ 31
3-3-1 基板之製備------- 31
3-3-2 觸媒層之製備--------- 31
3-3-3 MPCVD 前處理與成長奈米碳管之實驗步驟--- 32
3-4 實驗與分析設備----------- 32
3-4-1 實驗設備----- 32
3-4-2 分析設備----- 33
第四章、 結果與討論 39
4-1 觸媒成份分析------- 39
4-2 不同合金成份觸媒經氫電漿前處理後之影響---- 42
4-3 不同合金成份觸媒成長奈米碳管之影響------ 45
4-4 不同合金成份觸媒成長奈米碳管之場發射特性--54
4-5 不同合金成份觸媒成長奈米碳管之拉曼分析--- 59
第五章、 總結論 62
參考文獻----------63
自傳簡歷------------68

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