臺灣博碩士論文加值系統

本研究主要目的在利用陰極電弧沉積(Cathodic Arc Plasma Deposition；CAD)技術以TiSi (80:20 at.%)及TiAl (50:50 at.%)之合金靶材製備TiSiN/TiAlN奈米多層膜。探討介層設計、基材偏壓及轉速變化等製程參數對TiSiN/TiAlN奈米多層膜之微結構、磨潤與腐蝕性質之影響。利用掃瞄式電子顯微鏡、穿透式電子顯微鏡及X光繞射儀來進行TiSiN/TiAlN奈米多層膜之微結構、晶粒大小與殘留應力之分析；機械性質與磨耗性質則使用維氏硬度計與磨耗試驗機來進行量測；並使用恆定電位儀來進行腐蝕電位之量測。其結果顯示薄膜硬度範圍約32~34GPa之間，介於TiAlN的29GPa與TiSiN的34GPa。當對磨材為Cr鋼球時，薄膜的摩擦係數範圍約為0.5~0.6之間，較TiSiN的0.6及TiAlN的0.7來的低。腐蝕性質優於單層之TiSiN與TiAlN薄膜。此外，介層設計將可增加TiSiN/TiAlN奈米多層膜的附著力，以達到高負荷使用之需求。
總結發現，TiSiN/TiAlN奈米多層膜之微結構、磨潤與腐蝕性質深受製程參數變化之影響，且多層結構之腐蝕性質亦明顯優於單層之TiSiN與TiAlN薄膜。

In this work, nano-multilayer TiSiN/TiAlN films have been deposited on WC-Co substrates by using TiSi (80:20 at.%) and TiAl (50:50 at.%) alloy target on a dual cathodic arc plasma evaporation system. The influences of bias voltages, holder speed rotation and reaction gas pressure varied on the microstructure, adhesion strength and tribological properties of the films were investigated. Scanning electron microscopy (SEM), X-ray diffraction (XRD) techniques were employed to analysis the microstructure, grain size, residual stress and bi-layer thickness. Corrosion test were used by Potentiostat to analysis the corrosion potential. Vicker’s hadrness and tribometer tester were used to measure the mechanical and tribological properties of nano-multilayer TiSiN/TiAlN thin films. The results showed that the hardness of the films ranged from 24-27 GPa, which the value is lower than both of TiAlN (29 GPa) and TiSiN (35 GPa). The coefficient of steady-state friction of the films against Cr steel ball ranged from 0.45 to 0.6, and TiSiN and TiAlN is 0.6 and 0.7, respectively. It has been found that the microstructure, adhesion strength and wear properties of the films were dependent on bias voltage, interlayer design bi-layer thickness and grain size in film structure, resulting from both improved adhesion strength and wear properties of nano-multilayer TiSiN/TiAlN coatings.

總 目 錄
中文摘要…………………………………………………….……… I
英文摘要……………………………………….………….……….... II
總目錄……………………………………………………...……...… III
圖目錄……………………………………………………………..… VI
表目錄………………………………………………………….....…. XI
第一章 前言…………………………………………………...….… 1
第二章 文獻回顧……………………….……………………...….... 2
2-1薄膜沈積技術…………………………………..……………… 2
2-2 電漿表面改質技術…………………………..……………… 3
2-2-1 物理氣相沈積 (Physical Vapor Deposition，PVD)……..… 3
2-2-2 化學氣相沈積 (Chemical Vapor Deposition，CVD)…… 3
2-3陰極電弧蒸鍍技術與原理..…………………...….……………... 6
2-3.1 真空電弧的產生...………………………………………... 7
2-3.2 陰極點（Cathodic Spot）….....…………………..……….. 8
2-4 鍍膜微結構……………………………….............................….. 10
2-5 TiAlN薄膜文獻回顧………...……………………………..….. 12
2-6 TiSiN薄膜文獻回顧………...………………………….…..….. 14
2-7 分析原理…………..…………………………………...….......... 15
2-7.1 薄膜殘留應力…………………………………………… 15
2-7.2 附著力影響磨耗試驗…..………………………………… 16
2-7.3磨耗特性………………………………….…....................... 16
2-7.3.1磨耗型態…………………………………............... 17
2-7.4腐蝕電化學分析原理……………….….……………….... 18
2-7.4.1腐蝕形態……………………….…….……….….... 21
第三章 實驗方法……………...……………….……………………... 23
3-1實驗流程圖…...………………………………….………………. 23
3-2試片準備………….………………………………..…………….. 24
3-3實驗設備……………………….………………………....……… 26
3-4 膜層設計與規劃……………….………………………....…….. 27
3-4.1膜層設計……………….……………………….......……. 27
3-4.2奈米多層薄膜製程規劃.……………………….......……. 28
3-5 分析儀器……………………………………………………..… 30
3-5.1 硬度分析………….…...…….………………………....…. 30
3-5.2 附著力分析…………....……………………………..…… 31
3-5.3 磨耗分析……….…...…………………..……………….... 32
3-5.4 顯微組織觀察……………………..……..………………. 33
3-5.5 X光繞射分析(XRD)………………………….………..…. 34
3-5.5.1 晶粒大小分析………..…………………………... 34
3-5.5.2 殘餘應力分析………..…………………………... 35
3-5.6 腐蝕電化學分析…………………………………...……... 36
3-5.6.1 腐蝕電化學分析原理…………………................. 36
第四章 結果與討論…………………………………........................... 37
4-1 介層設計對於薄膜附著性的影響……………………………... 37
4-2 基材偏壓之影響................................................................... 39
4-2.1 表面與斷面形貌分析…………….……………..................... 39
4-2.2 微結構分析…………………..……………………………… 43
4-2.2.1 X-Ray繞射分析..…………………………………. 43
4-2.2.2 薄膜硬度與附著性分析……………………………. 44
4-2.2.3 殘留應力分析……….………………………............ 47
4-2.4 磨耗試驗分析……................……………………….............. 48
4-2.5 腐蝕電化學分析……….……………………………..…...... 57
4-3 Bi-layer厚度改變之影響…..... ……..... ……..... ……..... ……..... 59
4-3.1表面與斷面形貌分析………….…………………………….. 59
4-3.2微結構分析………………………………….... ……………. 64
4-3.2.1 X-Ray繞射分析……..…………………………….. 64
4-3.2.2 薄膜硬度與附著性分析…………………………… 65
4-3.2.3 殘留應力分析……….………………………............ 68
4-3.3 磨耗試驗分析……….………………………......................... 69
4-3.4 腐蝕電化學分析……….……………………………............. 77
第五章 結論……………………….…………………..………………… 79

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