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研究生:黃昶瑋
研究生(外文):Chang-wei Huang
論文名稱:介電材料雷射反射器與微腔體之製作與模擬
論文名稱(外文):The fabrication and simulation of dielectric-based laser reflector and microcavity
指導教授:蘇炎坤蘇炎坤引用關係丁志明丁志明引用關係
指導教授(外文):Su-Yen KunChih-Ming Ting
學位類別:碩士
校院名稱:國立成功大學
系所名稱:奈米科技暨微系統工程研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:英文
論文頁數:84
中文關鍵詞:介電材料射頻濺鍍系統布拉格反射器
外文關鍵詞:dielectric-based materialRF sputtering systemDistributed Bragg Reflector(DBR)
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本論文是以介電材料為基礎應用在半導體藍光雷射中布拉格反射器之改良。我們用射頻濺鍍系統製作TiO2 /SiO2及ITO/SiO2 兩種不同的布拉格反射器(DBR)去做一些反射率的量測和比較,其禁止帶中心波長設400nm 。
首先 , 我們以傳輸矩陣(transfer matrix)的理論配合Matlab軟體去模擬分析 , 去解釋在不同的對數下所產生的反射率對波長的關係圖 。
之後 , 在不同基板上製作不同布拉格反射器(DBR)的堆疊設計,比較反射率的差異和禁止帶寬度的不同。此外 , 把實驗樣品拿去作SEM、AFM、SIMS、UV-UIS-NIR等儀器量測 , 作一些特性上的量測 。然後進一步將實驗和理論的結果做比較。
最後 , 製作介電材料為主的微腔體 ,在腔體的上半部和下半部是由高反射率的布拉格反射器所組成。微腔體主要的功用是在某一個波段有濾光的效應 。 此外 ,如果我們調整實驗參數 , 最後實驗結果,也就是在反射率對波長的關係圖中 , 所產生的低反射谷(凹陷處)會有偏移或反射率改變的現象。
In this paper, we use dielectric-based material in the improvement and application of Distributed Bragg Reflector (DBR) of semiconductor blue laser. We fabricateTiO2 /SiO2 and ITO/SiO2 two different kinds of Distributed Bragg Reflector (DBR) by RF sputter system. Also, we measure and compare the reflectivity of DBR in different pairs. To design the central wavelength of stop band (400nm).
First, we learn transfer matrix theory and Matlab software to simulate and analysis. Besides,to explain the diagram of reflectivity versus wavelength in different pairs.
Then, we fabricate different stack design of Distributed Bragg Reflector (DBR) on the different substrate and compare the difference of reflectivity and the diversity of stop band width. Besides, the samples are measured by SEM、AFM、SIMS、UV-UIS-NIR measurement and do characteristic measurement. At last,we will compare experimental and simulated result.
At last, we also fabricate and simulate dielectric-based microcavity. The structure of microcavity is composed of fixed cavity between two highly reflectivity mirrors. The purpose of dielectric-based microcavity is to filiter light in some wavelength.Besides, we adjust experimental parameters and from the result, the curve of dip in the diagram will be shift and the reflectivity will be changed.
Abstract in Chinese.....I
Abstract..........II
Acknowledgements.. III
Contents.........IX
Figure Captions..XII
Table Captions..XVII
Chapter 1 Introduction....1
Chapter 2 The Theory of Simulation ......4
2.1 The Principle and Simulated Analysis of Reflective
layer of Multilayer film-TMM (Transfer Matrix
Method).... 4
2.2 The Simulation of Dielectric-based DBR In
Different Pairs-Numerical Simulation of DBR use
Matlab software...... 13
2.3 The energy dispersion of the refractive index of
three different material.............. 20
2.4 The calculated reflectivity of SiO2- ITO (DBR) and
SiO2-TiO2(DBR) in different
substrate............................21
Chapter 3 The fabrication and method of Distributed
Bragg Reflector (DBR)............. 24
3.1 The principle of plasma...... 24
3.2 RF sputtering system .........25
3.3 The procedure of experiment........... 28
3.4 The fabrication of SiO2-ITO (DBR)..... 30
3.5 The fabrication of SiO2-TiO2 (DBR)....31
3.6 Experimental parameter....... 33
Chapter 4 Experimental Measurement........... 35
4.1 SEM Measurement..... 35
4.2 Hall Measurement....37
4.3 UV-VIS-NIR Measurement....... 40
4.4 SIMS Measurement... 45
4.5 AFM Measurement..... 49
4.6 Ellipsometric Measurement.... 53
4.7 O2 content-optical constant.. 64
Chapter 5 Microcavity-Fabrication and Simulation.....65
5.1 The simulation of microcavity .....65
5.2 The DBR Microcavity Analysis.......... 66
5.3 The procedure of experiment........... 67
5.4 The fabrication of microcavity........ 71
Chapter 6 Results and Discussion........... 73
6.1 The advantages of dielectric-based material for
Distributed Bragg Reflector (DBR).....73
6.2 The physical property of dielectric material... 74
6.3 Mechanical Properties of Optical Thin Films....75
Chapter 7 Conclusions.... 76
Chapter 8 Future Works... 77
References........ 78
附錄一 利用數學軟體Matlab來計算多層膜堆疊的問題
[1]莊達人,VLSI製造技術
[2]李正中,薄膜光學與鍍膜技術
[3]Frank L. Pedrotti, S.J. Leno S. Pedrotti,Introduction
to optics
[4]FRANCOIS R.FLORY THIN FILMS FOR OPTICAL SYSTEMS
[5] S. F. Chichibu,T. Ohmori, N. Shibata, and T. Koyama
“Dielectric SiO2 /ZrO2 distributed Bragg reflectors for
ZnO microcavities prepared by the reactive helicon-
wave-excited-plasma sputtering method”APPLIED PHYSICS
LETTERS 88, 161914 _2006_
[6] H. Wrzesińska, , L. Ilka1, D. Wawer, K. Hejduk, A. Kudł
a1, M. Bugajski, and E. Łusakowska2“Investigation of
Indium Tin Oxide (ITO) films for the VCSEL laser with
dielectric Bragg reflectors” phys. stat. sol. (c) 1,
No. 2, 396–400 (2004)
[7] S. Vicknesh, Mithilesh Shah, S. L. Teo and A.Ramam
“Dielectric-based Distributed Bragg Reflector (DBR)
Mirrors for Tunable MOEMS applications” MEMS/MOEMS
Technologies and Applications II, edited by Zhichun
Ma, Guofan Jin, Xuyuan Chen, Proceedings of SPIE
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[8] M. de la Fargue and M. Missous“Design and Fabrication
of SiO2/TiO2 Dielectric Bragg Reflectors by RF
Sputtering: Application to Near Infrared InGa AsIGa
AsIAlGa As Vertical Cavity Surface Emitting Laser”
1999 IEEE
[9] A. Szerling, D. Wawer, K. Hejduk, T. Piwoński, A.
Wójcik, B. Mroziewicz, and M. Bugajski, Optica
Applicata, XXXII (3), 523 (2002).
[10] Wei Su*, Gang Zhong“Numerical Design of Novel DBR”
Semiconductor Lasers and Applications II, edited by
Jian-quan Yao,Yung Jui Chen, Seok Lee, Proceedings of
SPIE Vol. 5628 (SPIE,Bellingham, WA, 2005).
[11] Ali Serpengüzel*“Photonic Crystal based Amorphous
Silicon Microcavity” Physics and Simulation of
Optoelectronic Devices XI, Marek Osinski, Hiroshi
Amano,Peter Blood, Editors, Proceedings of SPIE Vol
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[12] Wei Su*, Gang Zhong“Numerical Design of Novel DBR”
Semiconductor Lasers and Applications II, edited by
Jian-quan Yao,Yung Jui Chen, Seok Lee, Proceedings of
SPIE Vol. 5628
[13]http://nano.ece.uci.edu/Lectures/Overview%20of%20the%
20VCSEL.pdf“Overview of the VCSEL”
[14] 鄭景翔, “GZO/Pt/GZO透明導電多層膜之性質研究及光學模
擬”, 國立成功大學材料科學與工程學系,碩士論文, 民國九
十五年
[15] 劉琝忠, “射頻濺鍍紫外光氧化薄膜之研究”, 國立中央大學
光電科學研究所,碩士論文, 民國八十九年
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