跳到主要內容

臺灣博碩士論文加值系統

(44.201.94.236) 您好!臺灣時間:2023/03/25 00:28
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:黃建豪
研究生(外文):Chien-Hao Huang
論文名稱:脈衝直流濺鍍法製作參雜氮之二氧化鈦
論文名稱(外文):The research of nitrogen doped titanium dioxide fabricated by pulsed DC magnetron sputtering
指導教授:李正中李正中引用關係
學位類別:碩士
校院名稱:國立中央大學
系所名稱:光電科學研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:中文
論文頁數:76
中文關鍵詞:二氧化鈦脈衝直流磁控濺鍍光觸媒
外文關鍵詞:photocatalystTiO2pulsed DC magnetron sputtering
相關次數:
  • 被引用被引用:6
  • 點閱點閱:264
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
本研究分成兩部分,第一部分是利用脈衝直流磁控濺鍍系統成長二氧化鈦薄膜( TiO2),藉以了解二氧化鈦的基本特性。製程參數為調變基板不同製程溫度、氬氣流量、氧氣流量的變化,並利用接觸角量測儀、X光繞射儀及電子顯微鏡,親水性、薄膜結晶與表面型態。
實驗結果顯示,溫度對樣品親水性影響顯著。且膜面狀態深受氬氣、氧氣流量的影響;氬氣流量越多且氧氣流量適當的選擇之下,可得較佳的TiO2光觸媒薄膜表面形態與親水性效果。
第二部份為二氧化鈦參雜氮氣製作之研究,目的為使其工作波長能移至可見光波段,實驗以第一部分的遲滯曲線為基礎,計算參雜比例分別為0%、20%、40%、60%、80%。並利用光譜儀、接觸角量測儀、X光繞射儀及電子顯微鏡與原子力顯微鏡,分析光學能隙、親水性、薄膜結晶與表面型態。
實驗結果顯示,氧氣流量對樣品親水性都與光分解顯著。且在本研究中,因為粗糙度在0.4~2.062 nm之間,故推測粗糙度對親水性無直接影響;氮氣參雜過多的情況下,量測XRD顯示anatase晶相強度有變小的情況,而氧氣流量過少的情況下,卻會得到氧化不足,偏金屬狀態,得到的光觸媒效果皆非理想,但在過渡模態與金屬模態間可得較佳的TiO2光觸媒薄膜親水性效果。
This research is separated into two parts. In the first part, the main purpose of this research is titanium dioxide thin film deposited on glass substrate with pulsed DC reactive sputterring system. The various parameters include three different parts: heating temperature, argon and oxygen flow. The films were characterized by spectrophotometer, contact angle, X-ray diffraction and scanning electron microscope.
The result shows that temperature is important to hydrophilicity. Also, thin film surface profile is strongly influenced by argon flow and oxygen flow. More argon flow and adequate oxygen flow can lead to better surface profile and hydrophilicity.
In the second part, the main purpose of this part is titanium dioxide thin film doped with nitrogen and shifted the working wavelength to visible light. Experimental parameter based on hysteresis curve in the first part. The films were characterized by spectrophotometer, contact angle, X-ray diffraction, scanning electron microscope and atomic force microscope. The photo-induced degeneration test is irradiated with 365nm UV light and visible light examined with absorption spectrum.
The result shows that oxygen flow is important to both photodegeneration and hydrophilicity. The roughness of thin film is between 0.4~2.062 nm, and it seems to no influence upon this research. The anatase phase becomes weaker with overflowed nitrogen. Besides, less oxygen flow leads to metal like thin film. Therefore, it would be better hydrophilicity to choose oxygen flow between transition mode and oxygen mode.
摘要 I
Abstract III
目錄 IV
表目錄 VI
圖目錄 VII
第一章 緒論 1
1-1前言 1
1-2研究動機 3
第二章 原理與製程簡介 4
2-1理論背景 4
2-2光觸媒介紹 8
2-3添加異質原子對二氧化鈦薄膜性質的改變 11
2-4一般製備方法介紹 13
2-5製程比較 26
第三章 實驗內容 28
3-1研究內容簡介 28
3-2研究步驟 28
3-3試樣選擇 29
3-4實驗設備及測量裝置 29
第四章 實驗結果與討論 37
4-1二氧化鈦薄膜之性質 37
4-1-1氧氣流量與靶材電壓之關係 37
4-1-2製程溫度與工作氣體流量對親水性的影響 39
4-1-3工作氣體流量對膜結構的影響 45
4-2參雜氮氣之二氧化鈦薄膜 50
4-2-1接觸角及分解效果 51
4-2-3膜面結構與XRD分析 59
4-2-4光學能隙 67
第五章 結論 72
5-1研究結論 72
5-2未來工作 72
參考文獻 74
1.Fujishima, “Electrochemical Photolysis of Water at a Semiconductor Electrode,” K. Honda, Nature, 238, 37-38 (1972).
2.卡田博史,”光觸媒圖解,”朱旭山 審訂,商周出版.
3.黃文魁,洪世淇,王偉洪,奈米光觸媒之發展與市場應用,工研院產經資訊服務中心
4.資料來源: 技術調查報告(技術動向篇)第2號,經濟產業省產業技術環境局技術調查室(2002/05).
5.呂信德,”磁控濺鍍 TiO2-WO3 複合膜光催化性質之研究,”國立成功大學資源工程系碩士班碩士論文(2003).
6.許明琮,”射頻磁控濺鍍法製備TiO2及TiO2-xNx光觸媒薄膜之研究,” 國立雲林科技大學化學工程系碩士班碩士論(2005).
7.高濂、鄭珊、張青紅,”奈米光觸媒,”五南出版,2004
8.S N Frank , A J Bard,” Heterogeneous photocatalytic oxidation of cyanide and sulfite in aqueous solutions at semiconductor powders ,”J.Phys.Chem.,81,1484~1488(1977)
9.J K Leland , A J Bard, ”Photochemistry of colloidal semiconducting iron oxide polymorphs ,”J.Phys.Chem.,91,5076~5083(1987)
10.沈偉韌,趙文寬,賀飛等。化學進展,10,349~361(1998)
11.A. Sclafani , J. H. Herrmann , “ Comparison of the Photoelectronic and Photocatalytic Activities of Various Anatase and Rutile Forms of Titania in Pure Liquid Organic Phases and in Aqueous Solutions , ”J. Phys. Chem,100,13655 (1996)
12.A. Sclafani , L. Palmisano , M. Schiavello ,” Influence of the preparation methods of titanium dioxide on the photocatalytic degradation of phenol in aqueous dispersion ,” J. Phys. Chem. 94,829(1990)
13.B. G. Kyle , Chemical and Process Thermodynamics , 3rd edition., Prentice-Hall (1999)
14.J K. Burdett , T Hughbanks , G J. Miller , J W. Richardson , J V. Smith ,” Structural-electronic relationships in inorganic solids: powder neutron diffraction studies of the rutile and anatase polymorphs of titanium dioxide at 15 and 295 K ,” J. Am. Chem. Soc. 109,3639~3646(1987)
15.A L Linsebigler, G Lu , J T Yates, ” Photocatalysis on TiO2 Surfaces: Principles, Mechanisms, and Selected Results, ” Chem. Rev. 95, 735~738, (1995)
16.Boer K W. Survey of Semiconductor Physics . New York :Van Nostrand Reinhold
17.E Brillas , R Sauleda ,et al. ,” Aniline mineralization by AOP''s: anodic oxidation, photocatalysis, electro-Fenton and photoelectro-Fenton processes,”Appl.Catal. B:Environ. 16,31~42,(1998)
18.R M Alberici , W F Jardim,” Photocatalytic destruction of VOCs in the gas-phase using titanium dioxide,”Appl.Catal.B:Environ. 14,55~68,(1997)
19.I.Sopyan, M.Watanabe, S.Murasawa, K.Hashimoto, A.Fujishima ,” An efficient TiO2 thin-film photocatalyst: photocatalytic properties in gas-phase acetaldehyde degradation ,”Journal of Photochemistry and Photobiology A: Chemistry 98 ,79-86 (1996)
20.取自http://www.photocatalyst.co.jp
21.Y. Takata, S. Hidaka, M. Masuda and T. Ito, “Pool boiling on a superhydrophilic surface”, Int. J. Energy Res, 27,111~119 (2003)
22.S.Sato,” Photocatalytic activity of NOx-doped TiO2 in the visible light region ,” Chem. Phys.Lett.123,126~128(1986)
23.R.Asahi, T.Morikawa, T.Ohwaki, K.Aoki,Y.Taga, ”Visible-LightPhotocatalysis in Nitrogen-Doped Titanium Oxides, ” Science, 2939(5528):269~271,(2001)
24.李正中 , “薄膜光學與鍍膜技術”, 第四版(2004.8), 藝軒出版社
25.工業材料雜誌 95年4月 232期 P.91~P.98
26.Marte I. Litter, “Heterogeneous photocatalysis: Transition metal ions in photocatalytic systems,”Applied Catalysis B: Environmental 23 ,89–114,(1999)
27.S.Takeda , S.Suzuki , H.Odaka , H.Hosono , “Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering ,”Thin Solid Films 392 ,338-344(2001)
28.P. Zeman, S. Takabayashi ,” Effect of total and oxygen partial pressures on structure of photocatalytic TiO2 films sputtered on unheated substrate ,”Surface and Coatings Technology 153 ,93–99 (2002)
29.D.Glöß, P. Frach , O. Zywitzki, T. Modes, S. Klinkenberg, C. Gottfried,“Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature,“ Surface & Coatings Technology 200,967–971(2005)
30.P. Frach*, D.Glöß, K. Goedicke, M. Fahland, W.-M. Gnehr,“ High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications,“ Thin Solid Films 445,251–258 (2003)
31.Lin , S. Kumon , H. Kozuka , T. Yoko , “Electrical properties of sol–gel-derived transparent titania films doped with ruthenium and tantalum ,”Thin solid Films 315, 266-272,(1998)
32. J. Wang , S. Uma , K. J. Klabunde ,” Visible light photocatalysis in transition metal incorporated titania-silica aerogels ,” Applied Catalysis B: Environmental 48, 151-154,(2004)
33.K.M Krishna , Md. Mosaddeq-ur-Rahman , T Miki , T Soga , K Igarashi , S Tanemura , M Umeno , “Optical properties of Pb doped TiO2 nanocrystalline thin films: A photoluminescence spectroscopic study ,”Applied Surface Science 113-114,149-154, (1997)
34.Y Ma , J B Qiu , Y A Cao , Z S Guan , J N Yao,” Photocatalytic activity of TiO2 films grown on different substrates ,” Chemosphere 44 ,1087,-1092(2001)
35.J G Yu , X J Zhao ,“Effect of substrates on the photocatalytic activity of nanometer TiO2 thin films ,”Materials Research Bulletin 35,1293,(2000)
36.L Q Jing, X J Sun, W M Cai, Z Xu, Y G Du and H G Fu,” The preparation and characterization of nanoparticle TiO2/Ti films and their photocatalytic activity ,” Journal of Physics and Chemistry of Solids, 64, 615-623, (2003).
37.P. Zeman , S. Takabayashi , “Nano-scaled photocatalytic TiO2 thin films prepared by magnetron sputtering ,”Thin Solid Films 433 ,57–62,(2003)
38.E.K Kim, M.H Son, S.K Min, Y.K Han. and S.S Yom,” Growth of highly oriented TiO2 thin films on InP(100) substrates by metalorganic chemical vapor deposition ,” J. Cryst. Growth 170, 803-807. (1997)
39.工研院 奈米級抗污塗料驗證規範(草案)
40.S. Ohno, N. Takasawa, Y. Sato, M. Yoshikawa, K. Suzuki, P. Frach and Y. Shigesato, “Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems,” ThinSolidFilms,496,126–130 (2006).
41.R.A.Spurr, H.Myers , ”Quantitative Analysis of Anatase-Rutile Mixtures with an X-Ray Diffractometer ,”Anal.Chem.29,760–762(1957)
42.S.Z Chen, P.Y Zhang, D.M Zhuang, W.P Zhu,” Investigation of nitrogen doped TiO2 photocatalytic films prepared by reactive magnetron sputtering,”Catalysis Communications 5 (2004) 677–680
43.M.S Wong , H.P Chou, T.S Yang,” Reactively sputtered N-doped titanium oxide films as visible-light photocatalyst,” THIN SOLID FILMS 494 (1-2): 244-249 JAN 3 2006
44.J. Tauc, “Amorphous and Liquid Semiconductors,” chap. 5, Plenum Press, 1974.
45.W.Q Hong, “Extraction of extinction coefficient of weak absorbing thin films from special absorption ,”J. Phys. D: Appl. Phys. 22 (1989) 1384-1385.
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top
無相關期刊