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研究生:陳致榮
研究生(外文):Chih-jung Chen
論文名稱:鋯鈦與鋯銅非晶質薄膜之濺鍍製備與性質分析
論文名稱(外文):Preparation and Characterization of Sputtered Zr-Ti and Zr-Cu Thin Film Metallic Glasses
指導教授:黃志青黃志青引用關係
指導教授(外文):Huang, J. Chih-Ching
學位類別:碩士
校院名稱:國立中山大學
系所名稱:材料科學研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:95
語文別:中文
論文頁數:112
中文關鍵詞:濺鍍非晶質薄膜
外文關鍵詞:Thin FilmSputteredamorphous
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本實驗中使用直流濺鍍法,利用濺鍍多層膜以及共濺鍍製程的不同,以不同之純金屬靶材濺鍍合成出不同成份之薄膜。由於鋯基非晶質合金具有耐腐蝕特性與良好之機械性質,且有較佳的熱穩定性與玻璃形成能力。加上已有人成功利用累積滾壓接合法 (ARB)合成出 Zr-Ti 和 Zr-Cu 二元非晶質合金。所以本實驗選擇以 Zr-Ti 和 Zr-Cu 作為研究材料,因此我們在這要利用濺鍍系統濺鍍出 Zr-Ti 和 Zr-Cu 非晶質薄膜,並藉由各種不同之分析探討薄膜厚度與薄膜退火時間之間的關係,以及薄膜成份與玻璃形成能力之間的關係。由於多層膜製程必須經由真空熱處理來造成擴散以達成非晶質化,因此會牽涉到混合熱大小的問題,混合熱約為零之 Zr-Ti 多層膜,由於擴散現象較不明顯,較不易形成非晶質薄膜。而混合熱為負值之 Zr-Cu 多層膜,熱處理後較易形成非晶質薄膜。共濺鍍製程則是要控制基板之溫度,基板之溫度控制於靶材電壓高低以及濺鍍速率,溫度過高會使得薄膜結晶化。而 Zr-Ti 共濺鍍薄膜其混合熱約為零,易形成固溶態,因此不易形成非晶質薄膜。但是 Zr-Cu 共濺鍍薄膜其混合熱為負值並且半徑差比例大於12%,因此易形成非晶質薄膜。而 Zr-Ti 多層膜薄膜經過退火發現 XRD 繞射分析無明顯之變化,是由於混合熱趨近於零,擴散較不明顯現象。而 Zr-Cu 具負混合熱,經過退火進行擴散,經由 XRD 繞射分析可得到寬化之曲線。然而 Zr-Ti 和 Zr-Cu 之共濺鍍薄膜在一定的條件下,皆可得到XRD 繞射之寬化曲線。其後再以 DSC、SEM 和 TEM 觀察薄膜的結構變化,以及成份之關係。
目錄..................................................................................................................................................I
表目錄...........................................................................................................................................IV
圖目錄.............................................................................................................................................V
摘要............................................................................................................................................ VIII
第一章 前言....................................................................................................................................1
1-1 簡介............................................................................................................................1
1-2 鋯基非晶質合金........................................................................................................2
1-3 研究目的....................................................................................................................2
第二章 理論背景............................................................................................................................4
2-1 非晶質合金的發展....................................................................................................4
2-2 非晶質合金的種類....................................................................................................5
2-3 非晶質合金的製程....................................................................................................5
2-4 非晶質合金的特性....................................................................................................8
2-4-1 機械性質.........................................................................................................8
2-4-2 化學性質.........................................................................................................8
2-4-3 物理性質.........................................................................................................9
2-5 真空濺射鍍膜層積原理............................................................................................9
2-5-1 薄膜沉積..........................................................................................10
2-5-2 電漿的產生...................................................................................................10
2-5-3 輝光放電.......................................................................................................11
2-5-4 濺射方法.......................................................................................................12
2-5-5 影響附著力的因素.......................................................................................13
2-5-6 影響濺射率的因素.......................................................................................14
2-5-7 影響成分的因素...........................................................................................15
2-6 論文回顧..................................................................................................................16
第三章 實驗步驟..........................................................................................................................21
3-1 實驗設備..................................................................................................................21
3-1-1 濺鍍系統.......................................................................................................21
3-1-2 真空熱處理系統...........................................................................................22
3-2 實驗分析儀器..........................................................................................................22
3-2-1 雷射掃描共軛焦顯微鏡...............................................................................22
3-2-2 XRD 繞射分析.............................................................................................23
3-2-3 DSC 熱分析..................................................................................................23
3-2-4 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析.....................................24
3-2-5 F I B 雙束型聚焦離子束顯微鏡...............................................................24
3-2-6 TEM 穿透式電子顯微鏡與 SAD 擇域繞射分析.....................................24
第四章 實驗結果..........................................................................................................................26
4-1 利用多層膜與共濺鍍製程形成 Zr-Ti 薄膜..........................................................27
4-1-1 DSC 熱分析..................................................................................................27
4-1-2 XRD 繞射分析.............................................................................................27
4-1-3 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析......................................30
4-1-4 TEM 穿透式電子顯微鏡............................................................................ 31
4-2 利用多層膜與共濺鍍製程形成 Zr-Cu 薄膜........................................................32
4-2-1 DSC 熱分析..................................................................................................32
4-2-2 XRD 繞射分析.............................................................................................33
4-2-3 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析......................................34
4-2-4 TEM 穿透式電子顯微鏡.............................................................................35
第五章 分析與討論......................................................................................................................37
5-1 Zr-Ti 多層膜薄膜的分析與討論.............................................................................37
5-2 Zr-Ti 共濺鍍薄膜的分析與討論.............................................................................38
5-3 Zr-Cu 多層膜薄膜的分析與討論...........................................................................39
5-4 Zr-Cu 共濺鍍薄膜的分析與討論...........................................................................40
5-5 Zr-Ti 與 Zr-Cu 之比較與討論............................................................................41
第六章 結論..................................................................................................................................43
參考文獻........................................................................................................................................45
表....................................................................................................................................................48圖....................................................................................................................................................61
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