|
1.J. Colaruotolo, D. Tramontana, in: G. O. Mallory, J. B. Hajdu (Ed.), Electroless Plating: Fundamentals and Applications, American Electroplaters and Surface Finishers Society, Orlando (1990) Ch. 8 2.R. L. Zeller, Corrosion, 50 (1994) 457 3.T. M. Harris, Q. D. Dang, J. Electrochem. Soc., 140 (1993) 81 4.M. Bayes, I. Sinitskaya, K. Schell, R. House, Trans. Inst. Met. Finish., 69 (1991) 140 5.G. F. Cui, N. Li, D. Y. Li, M. Li, J. Electrochem. Soc., 152 (2005) C669 6.J. F. Hamilton, R. C. Baetzold, Science , 205 (1979) 1213 7.R. L. Cohen, K. W. West, Chem. Phys. Lett., 16 (1972) 128 8.H. Graham, R.W. Lindsay, H. J. Read, J. Electrochemical Soc., 112 (1965) 401 9.W. J. Tomlinson, M. W. Carroll, J. Mater. Sci., 25 (1990) 4972 10.陳俊翰,以銅離子為化學鍍鎳磷鍍液之穩定劑時其析鍍行為之探討,碩士論文,國立成功大學,中華民國 (2004) 11.楊聰仁,無電鍍鎳及其應用,國璋出版社 (1987) 12.G. O. Mallory, J. B. Hajdu, Electroless Plating: Fundamentals and Applications, AESF, Orlando, U.S.A. (1990) 13.李寧,化學鍍實用技術,化學工業出版社 (2004) 14.方景禮,電鍍添加劑理論與應用,國防工業出版社 (2006) 15.M. Froment, E. Queau, J. R. Martin, G. Stremsdoerfer, J. Electrochem. Soc., 142 (1995) 3373 16.鄭宗記,李昆峰,張憲彰,電化學石英晶體微天平之原理及應用,Chemistry,59 (2001) 219 17.A. J. Bard, L. R. Faulkner, Electrochemical Methods, John Wiley &Sons, New York (2001) 18.李建良,化學鍍活化液-鈀金屬奈米粒子,產業奈米技術應用資訊園地,10 (2004) 79 19.張立德,牟季美,奈米材料和奈米結構,滄海書局 (2002) 20.蘇品書,超微粒子材料技術,復漢出版社 (1998) 21.馬振基,奈米材料科技原理與應用,全華科技圖書股份有限公司 (2003) 22.郭清癸,黃俊傑,牟中原,物理雙月刊,23 (2001) 614 23.賴炤銘,李錫隆,奈米材料的特殊效應與應用,Chemistry,61 (2003) 585 24.曹�琤�,連大成,淺談微乳液,物理雙月刊,23 (2001) 488 25.C. L. Lee, C. C. Wan, Y. Y. Wang, Adv. Funct. Mater., 11 (2001) 344 26.G. O. Mallory, in: G. O. Mallory, J. B. Hajdu (Ed.), Electroless Plating: Fundamentals and Applications, American Electroplaters and Surface Finishers Society, Orlando (1990) Ch. 1 27.Y. Sverdlov, V. Bogush, H. Einati, Y. Shacham-Diamand, J. Electrochem. Soc., 152 (2005) C631 28.W. Riedel, Electroless Nickel Plating, ASM International and Finishing Publication LTD., Ohio (1991) Ch. 3 29.M. Froment, E. Queau, J. R. Martin, G. Stremsdoerfer, J. Electrochem. Soc., 142 (1995) 3373 30.M. T. Reetz, W. Helbig, S. A. Quaiser, U. Simming, N. Breuer, R.Vogel, Science, 267 (1995) 367 31.K. Boal, F. Iihan, J. E. DeRouchey, T. Thun-Albrecht, R. P. Russell, V. M. Rotello, Nature, 404 (2000) 746 32.M. J. Hostetler, S. J. Green, J. J. Stokes, R. W. Murray, J. Am. Chem. Soc., 118 (1996) 4212 33.R. P. Andres J. D. Bielefeld, J. I. Henderson, D. B. Janes, V. R. Kolagunta, C. P. Kubiak, W. J. Mahoney, R. G. Osifchin, Science, 273 (1996) 1690 34.C. P. Collier, R, J. Sakally, J. J. Shiang, S.E. Henrichs, J. R. Heath, Science, 277 (1997) 1978 35.C. Petit, A. Taleb, M.P. Pileni, Adv. Mater., 10 (1998) 259 36.Rahman, J. Appl. Polym. Sci., 28 (1983) 1331 37.J.F. Mulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, J.Chastain, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corporation, Minnesota, (1992) 38.M. José-Yacamán, M. Marín-Almazo, J. A. Ascencio, J. Mol. Catal., 173 (2001) 61 39.J. F. Hamilton, R. C. Baetzold, Science, 205 (1979) 1213
|