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研究生:鄭尹豪
研究生(外文):Yin-Hao Chang
論文名稱:奈米壓印之製程設計與參數優化
論文名稱(外文):Process Design and Parameter Optimization on Nano Imprint
指導教授:黃忠仁黃忠仁引用關係
指導教授(外文):Jong-Zen Huang
學位類別:碩士
校院名稱:華梵大學
系所名稱:機電工程學系博碩專班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:84
中文關鍵詞:奈米壓印滾壓金屬模仁軟材模仁
外文關鍵詞:NanoimprintingRoll to roll imprintingMetal moldPDMS mold
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在無塵室內昂貴設備與設施的限制之下,且特徵尺寸縮小、研發時間與研發經費巨增,傳統的半導體製程越來越不利於產品生產,未來發展的瓶頸已能預見。
因此,我們開始尋找另一條新的製程技術來滿足未來的產品需求。其中最價格低廉、製程簡單並兼具量產優勢的方法之一就是奈米壓印。
本論文主要在研究奈米壓印相關之製程技術,特別是以UV-Curing 滾壓的方式,探討其各種參數調變後成型效果之優劣,其中主要探討之參數為:UV膠種類、轉速及輔助輪間隙。本論文亦討論微米尺度的金屬模仁與奈米尺寸PDMS模仁在滾壓中,分別表現出何種成型效果,其成型結果之檢測乃利用表面輪廓儀、SEM、AFM等不同檢測儀器進行精確之觀察,並根據檢測之照片與數據做更進一步的分析與探討。
Because of the limitation arising from the expensive equipments and installments in the clean room, the reduction in feature size of the semiconductor, and the immense increase in R&D time and budget, the traditional manufacturing of the semiconductor have become unfavorable to the production and the bottleneck of the development in the future can be expected.
Therefore, we started to look for a new manufacturing technology to satisfy the product requirements of the future. The “Nanoimprint” is one of the most costless and simplest manufacturing technologies; in addition, it has the advantage of mass production.
This thesis focus on studying the Nanoimprinting related manufacturing technologies, especially the technology called “UV-Curing Roll to Roll Nanoimprint”, and looking into the good and bad of the forming effect after adjusting the parameters. The parameters mainly explored herein are UV glues, motor speed and the gap of adjutant roll.
This thesis also discusses how the metal mold of the nanometer scale and the PDMS mold of the nanometer scale display its forming on the roll to roll nanoimprinting respectively. The forming effect are inspected, measured, and observed precisely by the alpha step, SEM, AFM and etc. different equipments and further analyzed and explored based on the photos and data resulting from such inspection and measurement.
誌謝…………. I
摘要………… III
Abstract…….. IV
目錄…………. V
表錄………… VIII
圖錄………… X
第1章. 緒論 1
1.1. 前言 1
1.2. 奈米壓印的種類 3
1.3. 文獻回顧 13
1.4. 論文架構 14
第2章. 製程及設備介紹 16
2.1. 機台介紹 16
2.2. 材料簡介 25
2.2.1 PET介紹 25
2.2.2 UV膠介紹 28
2.3. 製程參數 29
第3章. 金屬模仁滾壓 30
3.1. 金屬模仁介紹 30
3.2. 滾壓製程 34
3.3. 網點模仁實驗與結果 35
3.4. V溝模仁實驗與結果 40
第4章. PDMS模仁滾壓 46
4.1. PDMS模仁介紹 46
4.2. 滾壓製程 50
4.3. 田口式實驗法簡介 51
4.4. 實驗與結果 52
第5章. 實驗錯誤回修之歷程 58
5.1. 機台修改 58
5.2. 參數確立 61
第6章. 結果分析與討論 63
6.1. 網點模仁滾印結果分析與討論 63
6.1.1 高度分析與討論 63
6.1.2 寬度分析與討論 65
6.2. V溝模仁滾印結果分析與討論 66
6.2.1 高度分析與討論 66
6.2.2 寬度分析與討論 67
6.3. PDMS模仁滾印結果分析與討論 68
6.3.1 高度分析與討論 68
6.3.2 寬度分析與討論 72
第7章. 結論與建議 76
7.1. 結論 76
7.2. 建議與未來展望 77
參考文獻 79
附錄 82
作者簡介 85
[1]S. Y. Chou, P. R. Krauss, P. J. Renstrom; “Imprint of sub-25nm vias andtrenvhes in polymer.”; Applied Physics Letter, Vol67(21), pp.3114-3116,1995.
[2]Watts M.P.C., Miller M., Stacey N., Choi J., Subramanian M., Schumaker P., McMackin I., Jin Choi, Resnick D., Sreenivasan S.V., Falcon, M., “New developments in S-FIL technology”; Microprocesses and Nanotechnology Conference, 2005 International, Page(s):258 – 259, 25-28 Oct. 2005.
[3]Hella-C Scheer, et al., “Nanoimprint techiques” ; Nanomaterials and Magnetic Thin Film, Academic Press(2002).
[4]M Colbum, et al; “Step and flash imprint lithography: A new approach to high resolution patterning”; Proc. SPIE:Emerging Lithographic Technologies Ⅲ,1999.3676(Ⅰ):p.379.
[5]Xia, Y.; Whitesides, G. M.; Angew. Chem.Int.ed.1998,37,550-75.
[6]R. Maboudian., W.R. Ashurst and C. Carraro; “Self Assembled monolayers as anti-stiction coatings for MEMS: characteristics and recent developments”; Sensors and Actuators, Vol.82 pp.219-223,2000.
[7]W. R. Ashurst., C. Yau., C. Carraro, C. Lkgf, G. J. Kluth., R T. How and R. Maboudian; “Alkene based monolayersmfilms as anti-stiction coatings for polysilicon MEMS”; Sensors and Actuators Vol. A 91, pp.239-248,2001.
[8]J.N. Ding., P.L. Wong, J.C. Yang; “Friction and fracture properties of polysilicon coated with self-assembled monolayers. ”; Wear, Vol. 206 , pp.209-214,2006.
[9]S. Zankovych, T. Hoffmann, J. Koeth, A. Forchel; “Nanoimprint Lithography: Challenges and Prospects.”; Nanotechnology 12, pp.91-95,2001.
[10]D.J. Srkgfnivasan, S.V. Willson, C. Grant; ”Step & flash imprint lithography.” Materials Today Vol.8, pp.34-42, 2005.
[11]X. Cheng, Y. Hong, J. Kanicki, L. J. Guo; ”High resolution organic polymer light-emitting pixels fabricated by imprinting technique.” ;The Journal of Vacuum Science and Technology B, Vol. 20, No. 6, Nov/Dec 2002.
[12]J. Rhkgh, H. H. Lkgf; “Patterning organic light-emitting diodes by cathode transfer.” ;Applied Physics Letters, Vol. 81, 2002.
[13]Patrick Carlberg , Lars Montelius, Jonas Tegenfeldt; “Nanoimprint in PDMS on glass with two-level hybrid stamp”; ScienceDirect ,Microelectronic Engineering 85 210–213 2008.
[14]R.K. Dutta , J.A. van Kan, A.A. Bettiol, F. Watt; “Polymer microlens replication by Nanoimprint Lithography using proton beam fabricated Ni stamp”; ScienceDirect, Nuclear Instruments and Methods in Physics Research B 260 464–467, 2007.
[15]劉克琪, “實驗設計與田口式品質工程”, 華泰文化.
[16]田口玄一, “開發設計階段的品質工程”, 中國生產力中心.
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