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研究生:沈振榮
研究生(外文):Chen-Jung Shen
論文名稱:以直流磁控濺射製備氮化鉻鋁矽奈米複合薄膜之製程與特性研究
論文名稱(外文):Microstructure and Characterizations of Nano-composite Cr-Al-Si-N Coating by Reactive DC Magnetron Sputtering Process
指導教授:張奇龍張奇龍引用關係
指導教授(外文):Chi-Lung Chang
學位類別:碩士
校院名稱:明道大學
系所名稱:材料暨系統工程研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:88
中文關鍵詞:氮化鉻鋁矽奈米複合薄膜
外文關鍵詞:Cr-Al-Si-N
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本研究主要目的在利用直流磁控濺射(Reactive DC Magnetron Sputtering)技術來製備氮化鉻鋁矽(Cr-Al-Si-N)薄膜,探討基材偏壓與鉻靶靶功率製程參數對氮化鉻鋁矽奈米複合薄膜之微結構、機械、磨潤與腐蝕性質之影響。利用掃描式電子顯微鏡及X-光繞射儀來進行氮化鉻鋁矽奈米複合薄膜之微結構、晶粒大小與殘留應力之分析,薄膜元素成分定量分析則使用波長散佈光譜儀(WDS),機械與磨耗性質則使用奈米壓痕和磨耗試驗機來進行量測,使用恆定電位儀來進行腐蝕電位之量測。研究結果顯示氮化鉻鋁矽薄膜硬度範圍在20-24 GPa之間,分別高於CrN、AlN薄膜的硬度值18GPa及19GPa,其磨擦係數在0.3~0.4之間,較CrN的0.5及AlN來的0.7低。腐蝕性質也優於CrN、AlN薄膜。由XPS與XRD得知Cr-Al-Si-N奈米薄膜是由CrN/AlN及a-Si3N4所組成。
Nano-composite Cr-Al-Si-N films have been deposited on Si wafer、stainless steel and M2 tool steels substrates by reactive DC magnetron sputtering. The influences of bias voltage and Cr target power on the synthesis, microstructure, mechanical, and corrosion properties of the Cr-Al-Si-N films were investigated. The chemical composition of the deposited Cr-Al-Si-N coatings was evaluated using high-resolution electron probe microanalyzer equipped with a wavelength dispersive X-ray spectrometer (WDS). Scanning electron microscopy and X-ray diffraction techniques were employed to analyses the microstructure, grain size and residual stress. Nano-indentation and tribometer testes were used to measure the microhardness, mechanical and tribological properties of Cr-Al-Si-N thin films.Subsequent results showed that the hardness of the films ranged from 20-24GPa,which were higher than that of CrN and AlN (18GPa,19GPa). The coefficient of steady-state friction of the films against WC-Co ball ranged from 0.3 to 0.4,which the value is lower than both of CrN(0.5) and AlN(0.7).The corrosion resistance of coating was investigated in 500ml of 1M H2SO4 solution by mean of an electrochemical potentiodynamic polarization. A results demonstrated that the corrosion resistance of Cr-Al-Si-N coating was better than of CrN and AlN coating since effects of Si added to CrN/AlN caused a more dense structure to form.The combined XRD and XPS results indicate that the Cr-Al-Si-N coatings have a nanocomposite structure consisting of nano-crystalline CrN/AlN and amorphous Si3N4 in the film.
摘要 I
Abstract II
總目錄 III
圖目錄 VII
表目錄 X
第一章 序論 - 1 -
1-1 前言 - 1 -
1-2 研就動機及目的 - 3 -
第二章 文獻回顧 - 4 -
2-1 奈米複合薄膜 - 4 -
2-1.1 奈米複合薄膜強化機制 - 6 -
2-2 薄膜沉積技術 - 9 -
2-3 鍍膜微結構 - 11 -
2-4 Cr-Al-Si-N薄膜文獻回顧 - 14 -
2-4.1氮化鉻(CrN) - 14 -
2-4.2氮化鋁(AlN) - 15 -
2-4.3氮化鋁鉻及氮化鉻矽(CrAlN & CrSiN) - 16 -
2-5 磁控濺射技術與原理〔44〕 - 21 -
2-6 分析原理 - 22 -
2-6.1薄膜殘留應力 - 22 -
2-6.2 附著性影響 - 24 -
2-6.3 磨耗特性 - 24 -
2-6.3.1 磨耗型態 - 25 -
2-6.4 腐蝕電化學分析原理 - 26 -
2-6.4.1腐蝕形態〔46-49〕 - 30 -
第三章實驗方法 - 31 -
3-1 實驗流程 - 31 -
3-2 試片準備 - 33 -
3-3 實驗設備 - 35 -
3-4 分析儀器 - 36 -
3-4.1 硬度試驗 - 36 -
3-4.2 附著力分析 - 37 -
3-4.3 磨耗試驗 - 38 -
3-4.4 掃描式電子顯微鏡(SEM) - 38 -
3-4.5原子力顯微鏡(AFM) - 38 -
3-4.6高解析度場發射電子微探針(High Resolution EPMA) - 38 -
3-4.7 X光繞射儀(XRD) - 39 -
3-4.8化學分析電子光譜儀(ESCA/XPS) - 41 -
3-4.9腐蝕試驗 - 41 -
第四章 結果與討論 - 42 -
4-1 基材偏壓(Bias)控制對沉積氮化鉻鋁矽薄膜性質之影響 - 42 -
4-1.1 表面與斷面形貌分析 - 42 -
4-1.2 EPMA 元素定量分析 - 46 -
4-1.3 X-Ray繞射分析與奈米壓痕硬度分析 - 48 -
4-1.4 XPS/ESCA表面分析 - 51 -
4-1.4.1氮化鉻鋁矽薄膜之化學鍵結分析 - 52 -
4-1.5腐蝕電化學分析 - 55 -
4-1.6 附著性及磨耗分析 - 57 -
4-2 鉻靶靶材功率(Cr Target Power)控制對沉積氮化鉻鋁矽薄膜性質之影響- 61 -
4-2.1斷面與表面形貌分析 - 61 -
4-2.2 XPS元素定量分析 - 65 -
4-2.3 G-DOS縱深分析 - 66 -
4-2.4 X-Ray繞射分析與奈米壓痕硬度分析 - 67 -
4-2.5 XPS/ESCA表面分析 - 70 -
4-2.5.1氮化鉻鋁矽薄膜之化學鍵結分析 - 71 -
4-2.6腐蝕電化學分析 - 74 -
4-2.7 附著性及磨耗分析 - 77 -
第五章 結論 - 83 -
參考文獻 - 85 -
作者簡歷 - 88 -
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