臺灣博碩士論文加值系統

摘要
傳統彩色濾光片之黑色矩陣，由玻璃基板濺鍍鉻金屬後蝕刻圖案完成，此方法需利用昂貴真空濺鍍設備，且六價鉻已被歐盟於2006年7月開始實施的有害物質管制指令列為管制項目，在環保及成本考量下，開發具有高光學密度及低導電度的環保型與高精細度樹脂型黑色矩陣材料是一項重要的課題。
目前樹脂型黑色矩陣是以提高顏料濃度和膜厚來提升光學密度，容易造成光阻與基材間附著力不佳、R、G、B三畫素成型困難等問題，又由於碳黑粒子本身是導體，所製備出的樹脂型黑色矩陣電阻抗不高，因此降低了樹脂型黑色矩陣的應用層面。本研究藉著奈米碳黑粒子具有比表面積大的特性，使得樹脂型黑色矩陣薄膜在低碳黑含量即可獲得很高的光遮蔽效果，加上選用表面揮發份含量較高的碳黑粒子作為顏料，這些揮發份含量可以提高電子在碳黑表面轉移所需的能量，增加碳黑的電絕緣，提升材料的電阻抗值，增加樹脂型黑色矩陣的應用範圍。
本研究選用CARBOT高色調類M-1000原始粒徑16nm，表面揮發份含量9.5wt%的碳黑作為顏料，經由機械研磨分散碳黑粒子，撘配高分子型分散劑PS-3安定製備出M-1000碳黑分散液，再將粒子分散在多官能基壓克力樹脂39S裡，加入反應性單體TMPTA與光起始劑CGI-242和I369，製備出高性能黑色光阻，測其光學密度值及表面電阻抗值，最後進行光微影測試。實驗結果顯示當黑色光阻含有9.45wt% M-1000碳黑、膜厚0.7μm時，其光學密度值和表面電阻抗值分別為3.05及1011.5Ω/□。且經由微影測試的結果可得到5μm的線寬圖案。

關鍵詞 :彩色濾光片、黑色矩陣、光阻、碳黑表面改質、表面阻抗值

Abstract
The black matrix used in traditional color filter is produced with chromium and its oxide and nitride material. It is usually made by sputtering and followed by etching process. The process needs expensive vacuum system, and chromium is hazardous to environment. Therefore, it’s an important research to develop new material with higher optical density, low conductivity, and free environmental problem for finer resin black matrix.
Resin black matrix usually gets higher optical density by increasing content of pigment and thickness, which cause bad adhesion between photo-resist and substrate and difficulty in forming color layer. Carbon black is less resistant to the flow of electricity than resin in which it is dispersed, so resistivity of resin black matrix isn’t high enough to be applied widely. In this study, lower content of the carbon black in thin black photo-resist can get high optical density with the property of large specific surface area. In addition, high volatile content of carbon black which tends to insulate the primary aggregate so that more energy is required for electron transfer is used as coloring agent to form the material with high surface resitivity.
The carbon black is CARBOT M-1000 with 16 nm of primary particle size and 9.5wt% content of carbon surface volatile in this study. The dispersion of M-1000 carbon black in the presence of polymeric dispersant(PS-3) is fabricated by using mechanical mill process, and then the carbon black particles are dispersed into multi-functional group acrylic resin(39S) with reactive monomer (TMPTA) and photo-initiator (CGI-242 and I369). The optical density value and surface resistivity value of high performance black photo-resists are measured by optical density meter and high resistivity meter, and then take photolithography test at last. The result of the experiment shows that when the resin black matrix with thickness of 0.7μm contains 9.45wt% M-1000 solid content, the optical density value could reach to 3.05, and the surface resistivity value is 1011.5Ω/□. Finally, the 5μm resolution of pattern could be fabricated through the photolithography evaluation.
Key word : Color filter, Black matrix, Photo-resist, Color filter, Surface resistivity.

目 錄
中文摘要------------------------------------------------------------------------------- I

英文摘要------------------------------------------------------------------------------- II

致謝------------------------------------------------------------------------------------- IV

目錄------------------------------------------------------------------------------------- V

表目錄---------------------------------------------------------------------------------- IX

圖目錄---------------------------------------------------------------------------------- XI

第一章 緒論-------------------------------------------------------------------------- 1
1-1 前言---------------------------------------------------------------------------- 1
1-2 文獻回顧---------------------------------------------------------------------- 2
1-3 研究動機與目的------------------------------------------------------------- 4
1-4 研究方法---------------------------------------------------------------------- 5
1-5 本論文架構------------------------------------------------------------------- 7
第二章 理論與基礎----------------------------------------------------------------- 8
2-1 黑色矩陣的簡介------------------------------------------------------------- 8
2-1-1 黑色矩陣在廣視角技術(IPS)的應用-------------------------------- 12
2-1-2 黑色矩陣在COA技術的應用---------------------------------------- 13
2-2 碳黑---------------------------------------------------------------------------- 14
2-2-1 碳黑的種類-------------------------------------------------------------- 14
2-2-2 碳黑的特性-------------------------------------------------------------- 15
2-2-3 碳黑的電學和光學性質----------------------------------------------- 18
2-3 碳黑的分散------------------------------------------------------------------- 19
2-3-1 分散劑-------------------------------------------------------------------- 20
2-4 紫外光可硬化樹脂---------------------------------------------------------- 22
2-4-1 紫外光硬化樹脂簡介-------------------------------------------------- 22
2-4-2 紫外光硬化樹脂的組成----------------------------------------------- 22
2-4-3 影響紫外光硬化的因素----------------------------------------------- 26
2-5 紫外光可硬化樹脂應用於黑色矩陣------------------------------------- 27
第三章 實驗方法與實驗材料儀器----------------------------------------------- 29
3-1 本章摘要---------------------------------------------------------------------- 29
3-2 實驗方法---------------------------------------------------------------------- 30
3-2-1 碳黑M-900及碳黑M-1000物性分析步驟及分析方法---------- 30
3-2-2 碳黑分散液的製備步驟----------------------------------------------- 31
3-2-3 碳黑分散液的分析方法----------------------------------------------- 33
3-2-4 黑色光阻製備的步驟-------------------------------------------------- 36
3-2-5 黑色光阻特性分析方法----------------------------------------------- 38
3-2-6 樹脂型黑色矩陣微影成效分析步驟及分析方法----------------- 39
3-3 實驗材料與儀器設備------------------------------------------------------- 41
3-3-1 實驗藥品----------------------------------------------------------------- 41
3-3-2 實驗儀器與設備-------------------------------------------------------- 48
第四章 結果與討論----------------------------------------------------------------- 50
4-1本章摘要------------------------------------------------------------------------ 50
4-2碳黑M-900與碳黑M-1000表面揮發份的物性分析------------------- 51
4-3 M-1000碳黑分散液的製備過程------------------------------------------- 55
4-3-1 碳黑與分散劑添加的比例分析-------------------------------------- 56
4-3-2分散液中碳黑含量分析------------------------------------------------ 59
4-3-3 研磨時間對碳黑分散液粒徑的關係-------------------------------- 61
4-3-4 碳黑分散液粒徑對紫外光-可見光光譜的影響------------------- 65
4-3-5 M-1000碳黑分散液表面形貌分析----------------------------------- 67
4-3-6 碳黑粒子研磨前後的BET比表面積變化-------------------------- 71
4-4黑色光阻之光電特性分析--------------------------------------------------- 74
4-4-1 黑色光阻碳黑含量對光學密度及表面形貌的影響-------------- 75
4-4-2 光阻膜厚和OD值之間的關係--------------------------------------- 82
4-4-3 碳黑含量對光阻表面電阻值的影響-------------------------------- 88
4-4-4碳黑粒徑對光阻表面電阻抗的變化--------------------------------- 90
4-5 黑色光阻微影特性分析---------------------------------------------------- 92
4-6 最適化條件探討------------------------------------------------------------- 99
第五章 綜合結論-------------------------------------------------------------------- 102
5-1 綜合結論---------------------------------------------------------------------- 102
5-2 未來展望---------------------------------------------------------------------- 104
參考文獻------------------------------------------------------------------------------- 105

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