臺灣博碩士論文加值系統

在這篇論文中，我們探討塊狀共聚物薄膜PS-b-PMMA形成的方法以及利用PS-b-PMMA在矽基板製作奈米微影，並利用熱蒸鍍系統鍍膜，經過圖案轉移後形成鉻奈米點陣列。

實驗結果顯示，在適當的溫度、加熱時間和加熱溫度的條件下我們可以得到最佳化的高分子PS-b-PMMA奈米孔洞。經過氧氣電漿處理可以使金屬的附著性增加，再利用熱蒸鍍的方法我們鍍上一層金屬薄膜當作蝕刻遮罩，經圖案轉移後我們得到金屬鉻奈米點陣列。

在製程之過程中，我們發現冰醋酸加熱PS-b-PMMA奈米孔洞之步驟會形成未知材料之奈米球狀結構，多次重複實驗結果皆指出：且隨著加熱時間上升,薄膜形成鏈狀最終裂解成球狀。

In this thesis, we discuss the method for optimizing the block copolymer thin film. Then, we achieve nanolithography by using the copolymer thin film on silicon wafer. Finally, we fabricate Cr and Al nanodot array on Si wafer.

Our experiment result show that: in proper film thickness, heating temperature and heating time, we can optimize the PS-b-PMMA nanoporous. After oxygen plasma treatment, a very thin film of metal mask was deposited on PS-b-PMMA nanoporous by thermal evaporation system. After pattern transfer, we have the Cr nanodot array as etch mask.

If we heat in acetic acid rinsing process, the PS-b-PMMA nanoporous form spherical structure with unknown material. After several repeat experiments, we found that the PS-b-PMMA thin film will split into chain and finally become spherical structure by increasing heating time.

誌謝辭 II
中文摘要 III
英文摘要 IV
表目次 V
圖目次 VI
第一章 基本介紹和研究動機 10
1.1 太陽電池簡介 10
1.2 矽奈米柱太陽電池之研究動機 15
第二章 文獻回顧 17
2.1 矽奈米柱之介紹 17
2.1.1矽奈米柱的成長方法 17
2.1.2矽奈米柱之應用 24
2.2 PS-PＭＭＡ高分子共聚物之介紹 20
2.2.1 PS-PＭＭＡ高分子共聚物之理論基礎 20
2.2.2 PS-PＭＭＡ薄膜的應用 24
Chapter 3 實驗方法和設計 27
3.1 矽奈米柱製造流程和規劃 27
3.1.1 PS-PＭＭＡ奈米孔洞製備方法 27
3.1.2 金屬鍍膜及圖案轉移 32
3.1.3 利用離子電漿蝕刻製備矽奈米柱 33
3.2 實驗步驟和量測儀器介紹 34
3.2.1 試片清洗 34
3.2.2 旋轉塗佈機(spin coater) 34
3.2.3 反應性離子電漿蝕刻系統(Reactive Ion etching) 35
3.2.4 熱蒸鍍系統(Thermal Evaporation System) 37
3.2.5 原子力顯微鏡(Atomic Force Microscope) 38
3.2.6 掃描式電子顯微鏡(Scanning electron Microscope) 39
3.2.7 橢圓偏光儀(Ellipsometer) 40
3.2.8 紫外可見光光譜儀(UV-VIS) 41
3.2.9 傅立葉轉換紅外光光譜儀(FTIR) 42
Chapter 4 實驗結果與討論 43
4.1 PS-b-PMMA薄膜的製備 43
4.1.1 嫁接層 : PS-r-PMMA的製備 43
4.1.2 厚度對於塊狀共聚物薄膜之影響 44
4.1.3 加熱時間對於塊狀共聚物薄膜之影響 46
4.1.4 加熱溫度對於PS-b-PＭＭＡ奈米孔洞結構之影響 49
4.2 PS-PMMA薄膜厚度量測 51
4.2.1 PS-r-PMMA薄膜厚度量測 51
4.2.2 PS-b-PMMA薄膜厚度量測 53
4.3 金屬鍍膜和圖案轉移 54
4.3.1 氧氣電漿對孔洞結構之影響 54
4.3.2金屬鍍膜和圖案轉移 55
4.4 奈米球狀結構之生成 56
Chapter 5 總結 59
參考文獻 60

參考文獻
第一章
[1.1] Physics and Technology, 2nded, John Wiley & Sons, New York, Chap 9.5.2, 2002

[1.2] 莊嘉琛,太陽能工程—太陽電池篇全華科技,2003年3月

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[1.4] Lu Hu, Gang Chen, “Ananlysis of Optical Absorption in Silicon Nanowire Arrays for Photovoltaic Applications” NANO LETTERS, Volume 7, Number 11, (November 2007)

[1.5]Bozhi Tian, Xiaolin Zheng, Thomas J. Kempa, Ying Fang, Nanfnag Yu, Guihua Yu, Jinlin Huang, Charles M. Lieber, “Coaxial silicon nanowires as solar cells and nanoelectronic power sources” NATURE LETTERS, Vol 449, (October 2007)

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第二章
[2.1] 杜偉新,國立中興大學碩士論文 “ECRCVD成長矽奈米線之研究” 2004年8月

[2.2] Vladimir Sivakova, Frank Heyrothc, “Silicon nanowire growth by electron beam evaporation: Kinetic and energetic contributions to the growth morphology” Journal of Crystal Growth 300 (2007) 288–293

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[2.4] Huang-Shen Lin, Chih-Chiang Kao, Hao-Chung Kuo, Shing-Chung Wang, and Gong-Ru Lin, “ Self-Assembled Ni Nanodot on SiO2 Film—A Novel Reactive Ion Etching Mask for Si Nanopillar Formation on Si Substrate ” IEEE ELECTRON DEVICE LETTERS

[2.5] Vladimir V. Poborchiia, Tetsuya Tadab,“Si pillar photonic crystal slab with linear defects: transmittance and waveguide properties”
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[2.6] http://zh.wikipedia.org/wiki/Wiki

[2.7] 陳宣毅,物理雙月刊（廿四卷二期）“塊狀共聚物薄膜:自聚合的新材料”2002年 4 月

[2.8] Koji ASAKAWA, Toshiro HIRAOKA, “Nanopatterning with Microdomains of Block Copolymers using Reactive-Ion Etching Selectivity” Jpn. J. Appl. Phys. Vol. 41 (2002) pp. 6112–6118

[2.9] K. W. Guarini,a) C. T. Black,“Nanoscale patterning using self-assembled polymers for semiconductor applications” J. Vac. Sci. Technol. B 19,6, Dec 2001

[2.10] P. Mansky, Y. Liu, E. Huang,“Controlling Polymer-Surface Interactions with Random Copolymer Brushes”1458 (1997); 275 Science

[2.11] K. W. Guarini,a) C. T. Black,“Nanoscale patterning using self-assembled polymers for semiconductor applications” J. Vac. Sci. Technol. B 19,6, Dec 2001

[2.12] Vignesh Gowrishankar, Nathaniel Miller,“Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography” Thin Solid Films 513 (2006) 289–294

[2.13] Davood Shahrjerdi, Domingo I. Garcia-Gutierrez, “Fabrication of Ni Nanocrystal Flash Memories Using a Polymeric Self-Assembly Approach ”IEEE ELECTRON DEVICE LETTERS, VOL. 28, NO. 9, SEPTEMBER 2007

[2.14] K. W. Guarini,a) C. T. Black, “Nanoscale patterning using self-assembled polymers for semiconductor applications”J. Vac. Sci. Technol. B 19,6, Dec 2001