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研究生:黃育廷
研究生(外文):Yu-Ting Huang
論文名稱:製備鐵矽化物奈米結構及其光學性質之研究
論文名稱(外文):Fabrication and optical properties of iron silicide nanostructures
指導教授:許薰丰
學位類別:碩士
校院名稱:國立中興大學
系所名稱:材料科學與工程學系
學門:工程學門
學類:綜合工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:74
中文關鍵詞:鐵矽化物奈米結構光學性質
外文關鍵詞:iron silicidenanostructuresoptical properties
相關次數:
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具有半導體性質的鐵矽化物(β-FeSi2)在近十年獲得了很大的注意,因為有研究顯示,它具有0.8 eV的直接能隙,可以發出波長約1.54 μm的光,可應用於合成矽基材料的紅外線發光元件(IR-Light emitting device, IR-LED)或紅外線感測器(IR Sensor)。
本研究利用反應式磊晶法在矽基材上生長奈米尺寸的鐵矽化物,並探討不同結構的鐵矽化物對其光學性質的影響。研究結果顯示,於基材溫度400℃時為β-FeSi2及γ-FeSi2共存,基材溫度500、600、700℃時為β-FeSi2、γ-FeSi2及α-FeSi2共存,PL的量測中在波長為1614 nm及1655 nm處有波峰出現。
此外,利用奈米球微影技術,在矽基材上製備二維規則排列之圖案化氮化矽模板,藉由此模板成長鐵矽化物奈米點陣列,並探討不同結構的鐵矽化物奈米點陣列對其光學性質的影響。研究結果顯示,於基材溫度500、600℃時為β-FeSi2,基材溫度700℃時為α-FeSi2,PL的量測中在波長為1615 nm及1654 nm處有波峰出現,峰值的半高寬相較於先前所提之文獻所量測出的值小,表示利用此種製程方法所生成之β-FeSi2的奈米結構,推測由於尺寸效應可以得到較佳之光學性質。
Semiconducting β-FeSi2 has attracted great attention in the recent decade because it has a direct band-gap of about 0.8 eV, and it can emit a light of 1.54 μm. With this property, silicon based IR-LED (Light emitting device) and IR-Sensor can be synthesized.
In this study, the iron silicide nanostructures were formed on the silicon substrate by the reactive deposition epitaxy, and their optical properties were studied. The results show as follows. β-FeSi2 and γ-FeSi2, grown on Si substrates by the RDE at 400 ℃, were observed. At 500, 600 and 700 ℃, β-FeSi2, γ-Fesi2 and α-FeSi2 were formed. The PL spectra can be considered to consist of both intrinsic emission of β-FeSi2 nanoparticles at 1614 nm and extrinsic ones due to radiative surface on β-FeSi2 nanoparticles at 1655 nm.
In addition, the iron silicide nanodot arrays were fabricated by using silicon nitride template with 2-D opening arrays in nanoscale. The effects of iron silicide structure of nanodot arrays on the optical properties were studied. The results show as follows. β-FeSi2 was formed in the openings of silicon nitride template by the RDE at 500 and 600 ℃. At 700 ℃, β-FeSi2 transformed to α-FeSi2. From PL analysis, the intrinsic and extrinsic emission of β-FeSi2 can also be observed when the samples were prepared by the deposition at 500 and 600 ℃. Small FWHM of PL peaks were obtained due to the size effect of β-FeSi2 nanoparticles.
誌謝 I
摘要 II
ABSTRACT III
表目錄 VI
圖目錄 VII
第一章 前言 1
第二章 文獻回顧 4
2-1 奈米球微影術 4
2-1-1 奈米球自組裝微影術 4
2-1-2 奈米球自組裝陣列形成機制 5
2-1-3 奈米球點陣列 7
2-1-4 金屬奈米點陣列 8
2-2 常見奈米球排列製作技術 8
2-2-1 自然滴製法 8
2-2-2 旋轉塗佈法 9
2-3 鐵矽化物 9
2-3-1 金屬矽化物的發展 9
2-3-2 鐵矽化物的發展 10
2-3-3 塊材β-FeSi2和薄膜及析出物β-FeSi2之不同的發光行為 11
2-4 研究動機與目的 12
第三章 實驗步驟 13
3-1 基材準備與清洗 13
3-1-1 成長鐵矽化物之基材準備與清洗 13
3-1-2 成長鐵矽化物奈米點陣列之基材準備與試片清洗 14
3-2 奈米球自組裝裝置準備 14
3-3 奈米球膠體溶液配置 15
3-3 自組裝奈米球陣列 16
3-4 離子蝕刻Ⅰ 16
3-5 奈米球舉離 16
3-6 離子蝕刻Ⅱ 17
3-7 鐵金屬薄膜蒸鍍 17
3-7-1 鍍膜參數 17
3-8 實驗與分析儀器 18
3-8-1 原子力顯微鏡(Atomic Force Microscope, AFM) 18
3-8-2 場發射掃瞄式電子顯微鏡(Field Emission Scanning Electron Microscope, FE-SEM) 18
3-8-3 分析式穿透式電子顯微鏡(Analytical Transmission Electron Microscope, AEM) 18
3-8-4穿透式電子顯微鏡(Transmission Electron Microscope, TEM) 19
3-8-5 光激螢光光譜量測系統(Photoluminescence, PL) 19
第四章 結果與討論 20
4-1 反應式磊晶成長鐵矽化物奈米結構 20
4-1-1 鐵矽化物之結構分析 20
4-1-2 鐵矽化物之光學性質 22
4-2 利用奈米球微影成長鐵矽化物奈米點陣列 24
4-2-1 二維規則排列之圖案化氮化矽模板 24
4-2-1-1 奈米球排列之影響因素 24
4-2-1-2 離子蝕刻 25
4-2-1-3 二維規則排列之氮化矽窗口結構分析 27
4-2-2 二維規則排列之鐵矽化物奈米點陣列 27
4-2-2-1 鐵矽化物奈米點陣列之結構分析 27
4-2-2-2 鐵矽化物奈米點陣列之光學性質 29
第五章 結論 31
參考文獻 71
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