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研究生:謝尚融
研究生(外文):shang-Jung-Hsieh
論文名稱:次波長結構光碟片對光封存效應之研究
論文名稱(外文):Study of Light Trapping Effect for Subwavelength-Structured Optical Disc
指導教授:施錫富
學位類別:碩士
校院名稱:國立中興大學
系所名稱:機械工程學系所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:72
中文關鍵詞:次波長結構抗反射非晶矽薄膜光碟片
外文關鍵詞:subwavelength structureantireflectionamorphous siliconthin filmoptical disc
相關次數:
  • 被引用被引用:3
  • 點閱點閱:179
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本論文比較光碟片上具有不同次波長結構(subwavelength-structured)參數對抗反射與光封存之影響,並應用於太陽能基板上,利用繞射角度大於全反射之臨界角,使吸收長度增加而吸收效率得以被提升。
藉由向量繞射理論之模擬,分析次波長結構表面對應於不同責務週期與深度對抗反射之影響外,並同時也探討當次波長結構應用於非晶矽薄膜時對於反射減少之趨勢。實驗結果可知在基板表面同時具有抗反射膜與次波長結構將可使得波段500nm至1000nm的平均反射效率由9.6%下降至4.5%;進而沉積非晶矽薄膜在一般無結構基板上,其類似於薄膜太陽能電池(thin-film solar cells)中的作用層,而在波段650nm至1000nm之平均吸收效率僅55.3%,若僅製作抗反射膜於表面可使平均吸收率增加至62.6%,或者同時使用抗反射膜與次波長結構後可以使得平均吸收效率達到73.8%,再進而增製金屬全反射層可以令平均吸收效率達到84.3%。最後鍍製透明導電層於結構表面與非晶矽薄膜間,也可使得平均吸收效率達到85%以上。
This study is to compare the subwavelength-structured effects of optical discs on antireflection and light trapping, and apply them to solar cell applications. By increasing the diffraction angle to the critical angle of total internal reflection, the absorption length can be extended and the absorption rate can be enhanced.
Through the simulation of the vector diffraction theory, we analyzed the effects of the subwavelength-structured surfaces corresponding to different duty cycle and depth for antireflection. The trend of decreasing reflection was discussed while the subwavelength-structured surface was applied to the amorphous silicon (a-Si) thin film. The experimental results show that the antireflection coating and subwavelength structure on a substrate can decrease the average reflection from 9.6% to 4.5% in the wavelength range of 500nm to 1000nm. By depositing the a-Si thin film on the unstructured substrate, which acts as a silicon active layer in the thin-film solar cells, the average absorption is 55.3% in the wavelength range of 650nm to 1000nm. It increases to 62.2% if only the antireflection film is coated on its surface, to 73.8% if the subwavelength-structured surface is used, and to 84.3% if the metal reflector is deposited. Finally, the average absorption is above 85% if the transparent conducting film is also deposited between the subwavelength-structured surface and a-Si thin film.
摘要 I
Abstract II
致謝 III
目錄 IV
圖目錄 VII
表目錄 X
第一章 緒論 1
1-1背景與研究目的 1
1-2 文獻探討 2
1-2-1 抗反射 2
1-2-2 表面粗化 4
1-3 論文架構 5
第二章 相關理論介紹 6
2-1 全反射理論 6
2-2光柵理論 6
2-2-1 光柵簡介 6
2-2-2 次波長光柵理論 8
2-3 抗反射理論 14
2-3-1 等效導納法 16
2-3-2 1/4波長單層抗反射層 19
2-3-3 1/4波長雙層抗反射層 20
2-3-4 非1/4波長膜系 21
2-4 濺鍍原理介紹 22
2-5 原子力顯微鏡介紹 26
第三章 模擬與分析 28
3-1 前言 28
3-2 抗反射模擬 28
3-2-1 基板上鍍製雙層抗反射膜 28
3-2-2 基板表面做次波長結構 29
3-2-3 基板上同時作抗反射與次波長結構 32
3-3 光封存效率模擬 33
3-3-1 結構對a-Si薄膜的反射影響 34
3-3-2 繞射效率 36
3-4 抗反射膜與結構於a-Si薄膜之影響 38
第四章 製作與量測 40
4-1 前言 40
4-2 碟片製作 40
4-2-1 刻板技術 40
4-2-2 母版製程 41
4-2-3 碟片特性 43
4-3 抗反射製作與量測 44
4-3-1 抗反射膜製作與量測 44
4-3-2 具結構碟片量測 45
4-3-3 抗反射討論 52
4-4 Si薄膜製作與量測 54
4-4-1 a-Si薄膜討論 56
4-5 光封存量測 57
4-6 具有導電層之光封存量測 59
第五章 結論與未來展望 62
5-1 結論 62
5-2 未來展望 63
參考文獻 64
中英對照表 67
作者簡歷 72
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