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研究生:翁嘉盛
研究生(外文):Chia-Sheng Weng
論文名稱:以反應式直流磁控濺鍍法進行氮化鋁於裝飾鍍膜之研究
論文名稱(外文):Investigation of AlNX Decorate-Coatings Using Reactive DC Magnetron Sputtering
指導教授:武東星
指導教授(外文):Dong-Sing Wu
學位類別:碩士
校院名稱:國立中興大學
系所名稱:精密工程學系所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
畢業學年度:96
語文別:中文
論文頁數:79
中文關鍵詞:裝飾鍍膜直流反應磁控濺鍍氮化鋁
外文關鍵詞:Decorate-coatingSputteringAluminum nitride
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塑膠材料被廣泛應用於3C產品之外觀,無論是手機機殼、筆記型電腦外殼等等,但是傳統電鍍技術有耐磨性差及金屬光澤保留短暫等缺點,因此逐漸被取代,而利用真空裝飾性鍍膜可於塑膠材料表面上呈現出有色金屬鏡面光澤薄膜、耐磨性好及光澤保留時間長等優點。
氮化鋁為透明、耐高溫、高介電能力及耐腐蝕等之化合物材料,其用途廣泛。本研究以反應式直流磁控濺鍍方法於聚碳酸酯塑膠基板上鍍製鋁、錫金屬膜當氮化鋁薄膜之反射層,以氬氣為工作氣體,藉以研究不同反應式氣體(氮氣)流量 0~80 sccm 的通入,探討氮化鋁薄膜顏色變化影響因素,並以光譜儀、原子力顯微鏡、電子能譜化學分析儀、薄膜導電分析儀及薄膜厚度量測等儀器,測定薄膜的成份比例、表面粗糙度對於 CIE 標準色度 L* a* b* 值的影響。
氮化鋁薄膜顏色的產生,最主因為薄膜疊層數及氮氣多寡的原故,實驗結果顯示,氮氣流量 0~15 sccm 及 40~80 sccm 的通入,對於氮化鋁薄膜顏色的變化,並無明顯的幫助,推測乃是因為氮氣流量的太少與過多,均不影響顏色的改變,20~35 sccm 為顏色改變範圍,由銀色 (L* : 101~111, a* : 0.9~1.2, b* : 15~16) →藍色 (L* : 46~83, a* : -12~-5, b* : -45~-17) →金黃 (L* : 74~91, a* : 6~9, b* : 33~52) →淺金色 (L* : 90~104, a* : 1~2, b* : 34~ 36) 。實驗中以固定疊層數一層做為最基礎研究,因此使用前述氮氣流量並改變氮化鋁膜疊層數的延伸,將可發展更多顏色之氮化鋁薄膜。
The plastic materials have been applied in 3C (computer, communication and consumer electronics) products widely, such as like the shell of mobile phones, notebook, etc…. However, the technology of the traditional electroplating process has the weakness of the wear-resisting and short-term of metal luster. Therefore it has been replaced progressively by the surface decorate-coatings (SDC) technology which presents the strength as making the luster of colorful metal film as like mirror, well wear-resisting and can keep long-term luster on the surface of plastic materials.
Among the various SDC materials, aluminum nitride (AlNx) is one of the transparent, high-temperature resisting, high dielectric and corrosion-resisting candidates. In this thesis, the aluminum and tin films were first coated on the polycarbonate (PC) substrates as the reflective layers. Then the AlNx thin film was deposited on the reflective layers using DC reactive magnetron sputtering. The color change of AlNx thin films can be well-controlled by the flow rate of the reactive gas (N2).
The number of layers and the N2 flow rate were found to be the key factors in making AlNx colorful. For the N2 flow in the range of 0~15 sccm and 40~80 sccm, there is no change on the AlNx color. This suggests that the N2 flow is too low or too high. When the N2 flow varies from 20 to 35 sccm, the surface color can change from silver, to blue, to golden, and to golden yellow. This indicates that we can develop the AlNx SDC with more colors via changing the number of layers with various N2 flow rates.
致謝...................................................iii
中文摘要................................................iv
英文摘要.................................................v
目次....................................................vi
表目次..................................................ix
圖目次...................................................x
第一章 緒論..............................................1
1-1 前言.................................................1
1-2 文獻回顧.............................................1
1-3 研究動機與方法.......................................3
第二章 基本原理..........................................6
2-1 電漿理論.............................................6
2-1-1 電漿粒子與表面作用.................................8
2-1-2 濺射............................................8
2-2 直流輝光放電........................................10
2-3 射頻濺射............................................13
2-4 磁控濺鍍系統........................................14
2-5 電漿表面處理........................................16
2-5-1 塑膠的性質......................................16
2-5-3 附著力性質......................................18
2-5-3-1 影響附著力因素................................19
2-5-4 附著力測量方法..................................19
2-6 反應式濺鍍..........................................19
2-6-1 反應式磁控濺鍍..................................20
2-7 材料特性............................................23
2-7-1 超薄金屬膜......................................23
2-7-2 氮化鋁特性......................................25
2-8 薄膜形成機制........................................26
2-9 薄膜成色原理........................................29
2-10 顏色量測系統-CIE標準色度圖.........................30
第三章 實驗方法與步驟...................................32
3-1 實驗規劃與流程......................................32
3-2連續式(in - line)磁控濺鍍系統........................34
3-3 薄膜分析儀器........................................37
3-3-1場發射掃瞄式電子顯微鏡...........................37
3-3-2 薄膜厚度量測....................................37
3-3-3 穿透率量測儀....................................38
3-3-4原子力顯微鏡.....................................39
3-3-5 電子能譜化學分析儀..............................40
3-3-6 薄膜導電/不導電分析儀...........................41
3-3-7薄膜測定光譜分析儀................................42
3-3-8 N&K analyzer薄膜量測............................43
第四章 結果與討論.......................................44
4-1 最有效率之沉積參數規劃..............................45
4-2 遲滯現象試驗........................................48
4-3 氮化鋁薄膜鍍製......................................50
4-4 氮氣分壓之薄膜顏色分析(L*a*b*)......................56
4-5 氮氣分壓的光學分析..................................62
4-5-1折射率與消光係數的分析...........................65
4-6 氮氣分壓表面形貌對於L*a*b*值影響....................67
4-7 氮氣分壓對於薄膜成份比例的分析......................70
4-8 鋁反射層與錫反射層沉積氮化鋁顏色之比較..............73
4-8-1錫反射層沉積氮化鋁膜與純金顏色之比較.............73
第五章 結論.............................................74
參考文獻................................................75
附錄....................................................81
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