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研究生:朱志傑
研究生(外文):Jhih-Jie Jhu
論文名稱:反應式共濺鍍鈦-矽-氮薄膜之微結構與機械性質研究
論文名稱(外文):A Study on Microstructure and Mechanical Properties of Ti-Si-N Thin Flims by Reactive Co-sputtering
指導教授:鍾震桂
指導教授(外文):Chen-Kuei Chung
學位類別:碩士
校院名稱:國立成功大學
系所名稱:機械工程學系碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:91
中文關鍵詞:超硬薄膜
外文關鍵詞:Ti-Si-N
相關次數:
  • 被引用被引用:3
  • 點閱點閱:218
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  • 下載下載:34
  • 收藏至我的研究室書目清單書目收藏:0
本實驗利用反應式磁控濺鍍系統成長出鈦-矽-氮(Ti-Si-N)的三元奈米複合薄膜,並利用快速退火爐進行500℃的退火。。其主要在改變鈦功率、矽功率、氮氣流量百分比三種製程參數,對於此薄膜的微結構與機械性質的影響與關係,並比較退火前後機械性質之差異的熱穩定性質。
本實驗在調整鈦靶與矽靶功率,在搭配上不同比例的氮氣與氬氣混合氣體進行薄膜沉積後,以表面粗度儀量(α-step)測薄膜厚度,計算沉積速率;以低掠角X光繞射儀(GIXRD)分析其微結構與結晶相;以掃描式電子顯微鏡(SEM)觀察薄膜表面形貌;以能量散佈光譜儀(EDS)與歐傑電子能譜儀(AES)檢測薄膜化學成份與縱深分布的化學成份,最後以奈米壓痕器(Nanoindenter)檢測薄膜的機械性質。
實驗結果顯示,常溫製程下Ti-Si-N薄膜製作過程隨氮氣比例增加而濺鍍率減少,而薄膜表面形貌十分平整,微結構分析裡由Scherre’s formula計算的晶粒尺寸也在5nm以下,而經機械性質分析後,硬度最高可達47 GPa,代表韌性值的 / 可達0.789 。
熱穩定分析中,經過退火的試片表面會形成氧化反應,而使得表面出現顆粒,其晶粒尺寸約在20~30 nm,且硬度值、韌性値皆下降,而當氧化越嚴重,硬度值受到影響越大。在氮氣流量7 %時,機械性質最穩定且較不易受到氧化,硬度值最高亦可達33 GPa。
In this study, the nanocomposites of Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system and annealed by rapid thermal annealing (RTA) in 500℃. After annealing , the thin films were used to be examined thermal stability. The aim of articles is the effect of microstucture and mechanical properties of Ti-Si-N with different Ti power, Si power and N2 flow rates.
After composited Ti-Si-N thin flims with different power and Ar+ N2 atmosphere, we used α-step to measure the thickness of films and calculated deposition rate. The structure of films are characterized by Grazing Incidence X-ray diffraction (GIXRD). The chemical composition were investigated by energy dispersive spectrometry (EDS) and Auger electron spectroscopy (AES). Surface morphology were investigated by scanning electron microscopy (SEM).Mechanical properties of these films were investigated by nanoindenter.
The experiment result shows that deposited rate decreased with N2 flow rate increased. The films surface roughness was very smooth in each parameter. According to Scherre’s formula, the grain size of films was below 5nm. The hardness maximum value was 47 GPa and / ratio was 0.789.
After annealed, the films e appeared particles in specific parameter on the surface, the particle size were between 20 to 30 nm. However, for mechanical properties, the hardness were decreased due to the oxide. In N2 flow rate 7%, mechanical properties were most stable and oxide passivation , the hardness maximum was still 33 GPa.
中文摘要 I
Abstract II
致謝 III
目錄 V
表目錄 VII
圖目錄 VIII
第一章 緒論 1
1-1 前言 1
1-2 研究動機與目的 3
第二章 文獻回顧與理論基礎 5
2-1 Ti-Si-N超硬薄膜簡介 5
2-2 濺鍍(Sputter)的原理 7
2-3 奈米複合薄膜成形機制 8
2-4 Ti-Si-N硬質薄膜之回顧 11
2-5 奈米薄膜硬化理論 13
2-5-1 彈性模數差異硬化 13
2-5-2 連續應變硬化 14
2-5-3 結構阻障硬化 15
2-5-4 Orowan模型致硬 16
2-5-5 固溶硬化 16
2-5-6 Hall-Petch硬化 17
第三章 實驗步驟與方法 19
3-1 實驗流程 19
3-2 實驗材料 22
3-3 實驗儀器 23
3-3-1 反應式磁控共濺鍍設備 23
3-3-2 快速退火爐 26
3-3-3 超微細表面測定儀 28
3-3-4 低掠角X光繞射 29
3-3-5 場發射掃描式電子顯微鏡 31
3-3-6 能量散光譜議 32
3-3-7 歐傑電子能譜儀 33
3-3-8 奈米壓痕試驗機 35
第四章 實驗結果與討論 41
4-1 初鍍膜基本性質 41
4-1-1 Ti-Si-N薄膜濺鍍速率 41
4-1-2 Ti-Si-N薄膜電阻率 45
4-1-3 微結構與晶粒尺寸 48
4-1-4 表面形貌 55
4-1-5 化學成份 64
4-1-6 機械性質 67
4-2 Ti-Si-N薄膜退火性質 71
4-2-1 退火薄膜微結構 71
4-2-2 退火薄膜表面形貌 73
4-2-3 退火薄膜化學成分 78
4-2-4 退火薄膜機械性質 80
第五章 結論與未來展望 84
5-1 結論 84
5-2 未來展望 86
參考文獻 88
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