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研究生:鍾傑仲
研究生(外文):Chieh-chung Chung
論文名稱:多光束干涉表面力分析儀之研製
論文名稱(外文):Design and Fabrication of Surface Force Apparatus with Multiple Beam Interferometry
指導教授:陳元方陳元方引用關係
指導教授(外文):Terry Yuan-Fang Chen
學位類別:碩士
校院名稱:國立成功大學
系所名稱:機械工程學系碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:81
中文關鍵詞:多光束干涉JKR接觸理論Hertz接觸理論側向施力機構正向施力機構對稱式三層公式
外文關鍵詞:Symmetrical three-layer formulanormal force mechanismJKR contact theoryHertz contact theoryshear force mechanismMultiple Beam Interferometry
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在奈米尺度下,材料將會展現出顯著不同的特性和現象。欲了解並有效掌控在奈米尺度下的材料特性,建立及運用精確的量測技術與系統,即成為不可或缺的一環。

表面力分析儀除了可用於微奈米級薄膜厚度與折射率的量測外,還可用於薄膜間的力學性質分析,例如:表面黏附力、摩擦力等,所以表面力分析儀可做為研究奈米科技的重要工具之ㄧ。

本文主要目的是以對稱式三層原理之多光束干涉系統為基礎,建構出表面力分析量測系統,包含自行設計之正向及側向施力機構。表面力分析儀可進行正向施力下雲母接觸變形之量測,其結果將與Hertz、JKR接觸理論相比較;並針對側向施力下,量測雲母片間之固態摩擦行為,並進一步求出摩擦係數與相關文獻比較,驗證發展之表面力分析儀的準確性。
The material shows remarkable different characteristic and phenomenon in nano-scale. It is necessary to use accurate measuring technology and build a system to understand and control the material characteristic.
The surface force apparatus not only used in the measurement of thin film thickness and refractive index but also in the analysis of mechanics between thin films, for example: surface absorbability, adhesion, friction force. Therefore the surface force apparatus can be used as one of the important tools to study nano science and technology.
In this thesis, the main purpose is to build a surface force apparatus according to multiple beam interferometry based on symmetrical three-layer formula, including self-designed exerting normal and shear force mechanism. The surface force apparatus can measure the deformation of mica under a normal force and the friction behavior of mica under a shear force, then comparing the results with Hertz、JKR contact theory and the coefficient of friction with published paper respectively to verify the accuracy of the surface force apparatus.
摘要 I
Abstract II
誌謝 III
目錄 IV
表目錄 VII
圖目錄 VIII
符號說明 XI
第一章 緒論 ...............................1
1-1 研究背景與目的 ...............................1
1-2 文獻回顧 ...............................3
1-3 本文架構 ...............................6
第二章 基本理論 ...............................7
2-1 多光束干涉法原理 ..............................7
2-2 對稱式三層干涉原理[8] .......................9
2-2-1 修正未考慮色散與相位改變的干涉公式 ..........17
2-3 接觸理論 ......................................23
2-4 摩擦理論 ......................................28
2-4-1 滑動摩擦定律 .............................28
第三章 量測與分析方法 .............................30
3-1 應用對稱式三層公式決定薄膜厚度與折射率[21]......30
3-1-1 處理程序流程 .............................31
3-2 黏附力之量測 .............................34
3-2-1 固態表面接觸下單位面積所含表面能量之決定 .....34
3-2-2 分析實驗接觸條紋圖之接觸半徑..................35
3-2-3 自動二値化原理 .............................39
3-3 摩擦力之量測 .............................40
3-3-1接觸面積之決定 .............................41
第四章 實驗裝置與方法 .............................43
4-1 實驗系統介紹 .............................43
4-1-1 光源照射系統 .............................44
4-1-2 表面力分析儀 .............................44
4-1-2-1 感應式位移計校正 ....................46
4-1-2-2 正向施力機構之設計與校正 ...................54
4-1-2-3 側向施力機構之設計與校正 ...........57
4-1-3 影像擷取系統 .............................60
4-2 實驗程序 ......................................61
4-2-1 雲母片製作[8] .............................61
4-2-2 干涉系統之製作 .............................64
4-2-3 干涉系統校正 .............................65
第五章 實驗結果與討論 .............................67
5-1 正向施力下之雲母接觸變形量測 ....................67
5-2 侧向施力下之雲母摩擦係數比較 ....................71
第六章 結論與建議 ......................................76
參考文獻 ...............................................77
參考文獻


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