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研究生:劉占琢
研究生(外文):Chan-Cho Liu
論文名稱:虛擬量測建模伺服器之設計與實作
論文名稱(外文):Virtual Metrology Model Creation Server Design and Implementation
指導教授:鄭芳田鄭芳田引用關係
指導教授(外文):Fan-Tien Cheng
學位類別:碩士
校院名稱:國立成功大學
系所名稱:製造工程研究所碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:95
中文關鍵詞:建模伺服器虛擬量測建模伺服器虛擬量測虛擬量測建模架構
外文關鍵詞:Virtual Metrology Model Creation ServerVirtual Metrology Model Creation FrameworkMCCMCSModel Creation ClientVirtual Metrology
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虛擬量測技術使用生產機台之製程資料與量測機台之量測資料來產生預測模型並預測產品品質,即在無實際量測之情況下監控製程品質。本論文設計一套能半自動建置虛擬量測模型之建模伺服器,虛擬量測建模伺服器係用於建置某類型之製程裝置(機台)的首套虛擬量測模型,此組虛擬量測模型包含:DQIX (Process Data Quality Index;製程資料品質指標)模型、DQIy (Metrology Data Quality Index;量測資料品質指標)模型、虛擬量測推估模型、RI (Reliance Index;信心指標)模型、GSI (Global Similarity Index;整體相似度指標)模型。為了讓建模程序能夠標準化以及讓使用者以更方便快速之方式建置新的虛擬量測模型,本論文提出的虛擬量測建模伺服器能自動向AVM伺服器取得所需的製程與量測資料,並透過模組建置程序完成首套的虛擬量測模型,最後虛擬量測建模伺服器自動將此類型製程裝置的首套虛擬量測模型上傳至VMM伺服器以進行虛擬量測模型移植與自動換模(Refresh)的步驟。
Virtual metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool and without physical metrology operation. This research proposes a model-creation (MC) server for VM systems to semi-automatically construct the first set of VM models (of a certain equipment type), including a DQIX (Process Data Quality Index) model, a DQIy (Metrology Data Quality Index) model, a VM conjecture model, a RI (Reliance Index) model, and a GSI (Global Similarity Index) model. In order to standardize the model-creation procedure and provide the users a more convenient method to construct the first set of VM models, the proposed MC server can handle complex intelligent algorithms during its process procedures. The proposed MC server can get information about the process and metrology state from a specific AVM server and create the first set of VM models by the model-creation procedure. Moreover, the proposed MC server can also upload the first set of VM models to the VMM (Virtual Metrology Management) server automatically, which can fan out the first set of VM models to other AVM (Automatic Virtual Metrology) servers of the same process apparatus (equipment) type. As a result, each individual fan-out-acceptor’s AVM server can perform automatic model refreshing processes so as to gain and maintain the accuracy of its VM models.
中文摘要
英文摘要
誌謝

目錄 i
圖目錄 iii
表目錄 v
第一章 緒論 1
1.1 研究背景 1
1.2 研究動機 3
1.3 研究目的 4
1.4 論文架構 5
第二章 文獻探討與理論基礎 7
2.1 相關文獻探討 7
2.2 相關理論基礎 26
2.2.1 統一塑模語言 26
第三章 系統需求分析 30
3.1 系統架構發展流程 30
3.2 MCS需求分析 31
第四章 物件導向分析與設計 35
4.1 MCS物件導向分析(OOA)之使用案例圖(Use Case) 35
4.1.1 MCS Use Cases - Actor敘述 36
4.1.2 MCS Use Cases - Use Case說明 38
4.2 MCS物件導向分析之循序圖(Sequence Diagram) 49
4.2.1 Sequence Diagram 1: Data Collection 49
4.2.2 Sequence Diagram 2: Create Indicators 50
4.2.3 Sequence Diagram 3: Clean Data 52
4.2.4 Sequence Diagram 4: Build &Verify DQI model 54
4.2.5 Sequence Diagram 5: Build & Verify VM Models 56
4.2.6 Sequence Diagram 6: Verify Model Accuracy 59
4.3 MCS物件導向分析之類別圖(Class Diagram) 60
第五章 MCS架構設計 64
5.1 VMMS 架構設計 64
5.2 MCS架構設計 66
5.3 MCS系統流程 70
第六章 MCS系統之實作與應用 75
6.1 開發環境 75
6.2 系統實作 76
第七章 結論 89
7.1 研究成果與論文總結 89
7.2 未來研究方向 91
參考文獻 94
[1]2003 International Technology Roadmap for Semiconductors (ITRS), December 2003. http://public.itrs.net/
[2]Y.-C. Chang and F.-T. Cheng, “Application Development of Virtual Metrology in Semiconductor Industry,” in Pro. of the 31st Annual Conference of the IEEE Industrial Electronics (IECON 2005), Raleigh, North Carolina, USA, pp. 124-129, November 2005.
[3]P.-H. Chen, S. Wu, J.-S. Lin, F. Ko, H. Lo, J. Wang, C.-H. Yu, and M.-S. Liang,, “Virtual Metrology: a Solution for Wafer to Wafer Advanced Process Control,” in Proc. 2005 IEEE International Symposium on Semiconductor Manufacturing, San Jose, CA ,USA, pp.155-157, Sept. 2005.
[4]Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, “A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing,” IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 183-194, May 2006.
[5]Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, “Intelligent Prognostics System Design and Implementation,” IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 195-207, May 2006.
[6]Y.-J. Chang, Y. Kang, C.-L. Hsu, C.-T. Chang, and T. Y. Chan, “Virtual Metrology Technique for Semiconductor Manufacturing,” in Proc. 2006 International Joint Conference on Neural Networks (IJCNN’06), pp. 5289-5293, July 2006.
[7]M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, “A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing,” IEEE/ASME Transactions on Mechatronics, vol. 12, no. 3, pp. 308-316, June 2007.
[8]F.-T. Cheng, H.-C. Huang, and C.-A. Kao, “Developing a Dual-Phase Virtual Metrology Scheme,” to appear in IEEE Transactions on Semiconductor Manufacturing, November 2007.
[9]SEMI E133-0306, Provisional Specification for Automated Process Control Systems Interface, U.S.A., 2004.
[10]J. Moyne, E. del Castillo, and A.M. Hurwitz, Run-to-Run Control in Semiconductor Manufacturing. CRC Press, 2001.
[11]D. Parsons, A. Rashid, A. Speck, and A. Telea, “A “Framework” for Object Oriented Frameworks Design,”Proceedings of the Technology of Object-Oriented Languages and Systems, p.141, June 07-10, 1999.
[12]Y.-T. Huang, H.-C. Huang, F.-T. Cheng, T.-S. Liao, and F.-C. Chang, “Automatic Virtual Metrology System Design and Implementation,” to appear in Proc. 2008 IEEE International Conference on Automation Science and Engineering, Washington, D.C., U.S.A., August 2008.
[13]G. Booch, J. Rumbaugh, I. Jacobson, The Unified Modeling Language User Guide, ADDISON-WESLEY, April 2000.
[14]F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, “Evaluating Reliance Level of a Virtual Metrology System,” IEEE Trans. Semiconduct. Manuf., vol. 21, no. 1, pp. 92-103, Feb. 2008.
[15]S. A. DeLurgio, Forecasting Principles and Applications. New York: McGraw-Hill, 1998.
[16]Y.-T. Huang, F.-T. Cheng, and Y.-T. Chen, “Importance of Data Quality in Virtual Metrology,” in Proc. 32th Annual Conf. IEEE Industrial Electronics Soc. (IECON 2006), Paris, France, Nov. 2006, pp. 3727–3732.
[17]J. Moyne, E. del Castillo, and A. M. Hurwitz, Run-to-Run Control in Semiconductor Manufacturing. Boca Raton, FL: CRC, 2001.
[18]S. J. Qin, G. Cherry, R. Good, J. Wang, and C. A. Harrison, “Semiconductor manufacturing process control and monitoring: A fab-wide framework,” J. Process Contr., vol. 16, pp. 179–191, 2006.
[19]Y.-C. Su, T.-H. Lin, F.-T. Cheng, and W.-M. Wu, “Implementation Considerations of Various Virtual Metrology Algorithms,” to appear in Proc. 2008 IEEE International Conference on Automation Science and Engineering, Scottsdale, AZ, USA, pp. 276-281, Sept. 2007.
[20]S.-J. Zhang, Virtual Metrology Management System Design and Implementation, Master Thesis, Institute of Manufacturing Engineering, National Cheng Kung University, 2008.
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