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研究生:藍義勝
論文名稱:全像蝕刻技術設計並製作光子晶體之研究
論文名稱(外文):Design and fabrication of photonic crystals by using holographic lithography
指導教授:謝美莉
學位類別:碩士
校院名稱:國立臺灣師範大學
系所名稱:光電科技研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2007
畢業學年度:96
語文別:中文
論文頁數:59
中文關鍵詞:全像術光子晶體
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本論文主要探討如何利用全像蝕刻(Holographic lithography)技術來設計並製作二維及三維光子晶體(photonic crystal)之結構。首先利用電腦模擬計算三道及四道平面光波相交干涉的光強度分佈,並探討光束間之夾角、光波波長、入射光強度比及材料折射率等系統參數對二維或三維光子晶體晶格週期及結構的影響。根據理論分析的結果,我們建立全像干涉系統,以實驗驗證理論的模擬與分析,實際製作出光子晶體的結構;在二維光子晶體方面,我們利用三道光束對稱入射,製作出蜂巢結構的二維光子晶體,並將此結構應用在綠光發光二極體上,且成功地增加約一倍的發光效率;在三維光子晶體方面,我們利用四道光束相交干涉,在光阻上製作出面心立方結構的三維光子晶體,其實驗結果之晶格週期約為8μm及1.5μm左右。
中文摘要 I
英文摘要 II
總 目 錄 III
圖 目 錄 V
表 目 錄 VII
第一章 緒論 1
1-1 前言 1
1-2 研究動機與目的 2
1-3 論文架構 4
第二章 全像蝕刻技術之理論模擬及設計 5
2-1 理論計算及定義 5
2-2  Bravais晶格結構之光學參數設計及設計流程 7
2-1-1 五種二維Bravais晶格設計流程 7
2-1-2 十四種三維Bravais晶格設計流程 13
2-3 二維及三維光子晶體之理論分析 23
2-3-1 光束波長、夾角、光強度及折射率與二維光子晶體之關係 23
2-3-2 光束波長、夾角、光強度及折射率與三維光子晶體之關係 27
第三章 二維光子晶體結構之製作 31
3-1 全像蝕刻系統 31
3-1-1 光阻特性及曝光顯影之參數 35
3-2 不同的光強度比之光阻顯影結果 36
3-3 應用於發光二極體之蝕刻結果 39
第四章 三維光子晶體結構之製作 46
4-1 全像系統之設計 46
4-2 實驗結果 50
第五章 結論 54
參考文獻 56
致謝 59
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