|
References 1. Harish C. Barshilia, K.S. Rajam Surface and Coatings Technology 2. S.P. Wen, R.L. Zong. Acta Mater 55, 345 (2007). 3. Misra A, Hirth JP, Hoagland RG. Acta Mater 53 (2005). 4. Misra A, X. Zhang. Acta Mater 53, 221 (2007) 5. Michael D. Uchic, Dennis M. Dimiduk, Science 13 (2004). 6. W.C. Oliver, G.M. Pharr, J. Mater. Res. 7 (1992). 7. S.A. Barnett M.H. Francombe, J.L. Vossen (Eds.), Physics of Thin 8. Misra A, Kung H, Adv Eng Mater, 3 (2001). 9. Phillips MA, Clemens BM, Nix WD. Acta Mater 51, 3157 (2003) 10. Clemens BM, Kung H, Barnett SA. MRS Bull 24 (1999) 11. A.L. Greer, R.E. Somekh, in: R.W. Cahn, P. Haasen, E.J. Kramer (Eds.), Materials Science and Technology – A Comprehensive Treatment, 15, VCH Publishers, New York, 1993, p.331. 12. 蕭博文, 崑山科大機械工程碩士論文, Investigation of the microstructure and wear properties of TiN/CrN multilayer films. 13. M.V. Swain, J. Mencik, Thin Solid Film 253, 204 (1994). 14. K.J. Ma A. Bloyce, R.A. Andrievski, G.V. Kalinnikov, Surf. Coat. Technol. 94-95 (1997). 15. J.B. Pethica, R. Hutchings, W.C. Oliver, Phil. Mag. A 48 (1983). 16. Misra A, Hirth JP, Hoagland RG, Acta Mater 52, 2387 (2004). 17. Misra A, Hirth JP, Kung H. Phil Mag A 82, (2002). 18. S. S. Brenner, J. Appl. Phys. 27, 1484 (1956). 19. S. S. Brenner, J. Appl. Phys. 28, 1023 (1957). 20. M. A. Haque, M. T. A. Saif, Sensors Actuators A 97-98, 239 (2002) 21. H. D. Espinosa, B. C. Prorok, M. Fischer, J. Mech. Phys. 22. H. D. Espinosa, B. C. Prorok, B. Peng, J. Mater. Res. 52 667 (2004). 23. M. D. Uchic, D. M. Dimiduk, J. N. Florando, W. D. Nix, in Materials research society Symposium Proceedings, E. P. George et al. 753 (2003). 24. W.C. Oliver, G. M. Pharr, Materials Research Society 7, 1564(1992). 25. 丁志華, 管正平, 黃新言, 戴寶通, 奈米通訊 9, 4. 26. Lehoczky SL. Phys Rev Lett 41,1814 (1978). 27. Lehoczky SL. J Appl Phys 49,5979 (1978). 28. Edited by K.K. Schuegraf, Noyes, Park Ridge, “Handbook of Thin-Film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications”, N.J. (1988). 29. J. A. Thornton, ”Physical Vapor Deposition” in ”Semiconductor Materials and process Technologies”, G. E. McGuire, Ed., Noyes, Park Ridge, NJ (1984). 30. B. A. Movchan, and A. V. Demchishin, Physics of Metals and Metallography 28, 83 (1969). 31. Peter M. Anderson, John F. Bingert, Amit Misra, Acta mater 51:6059 (2003). 32. B. D. Cullity, S. R. Stock “Elements of x-ray diffractiom” , NJ (2001).
|