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研究生:陳嬿伊
研究生(外文):Yen-Yi Chen
論文名稱:不同鉻中間層影響熱燈絲化學氣相沉積法成長鑽石薄膜於含鈷碳化鎢基材之研究
論文名稱(外文):Tribological and Mechanical Properties of HFCVD Diamond-Coated WC-Co substrates with different Cr Interlayer
指導教授:周昭昌
指導教授(外文):Chau-Chang Chou
學位類別:碩士
校院名稱:國立臺灣海洋大學
系所名稱:機械與機電工程學系
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:78
中文關鍵詞:鉻中間層化學氣相沉積法物理氣相沉積法附著力碳化鎢表面粗糙度
外文關鍵詞:Cr interlayerchemical vapor depositionphysical vapor depositionHFCVD
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本研究乃利用CH4/H2混合氣體作為反應物,以熱燈絲化學氣相沉積法於含鈷量6%之碳化鎢基材上沉積鑽石薄膜。由於碳化鎢基材上鈷元素的存在,會妨礙鑽石在基材上成長,並導致鑽石膜與基材之間附著性降低。以往是以酸洗的方式將鈷去除,但酸洗會導致基材脆化,在本研究中將加入鉻中間層以屏障鈷的擴散,並藉以提高鑽石膜與基材的結合性。
鉻中間層的製作分為兩種,分別由高溫爐滲鉻與脈衝直流磁控濺鍍的方式製作。除了不同方法製作之鉻中間層外,各中間層的厚度與表面粗糙度對於成長鑽石薄膜之影響,亦是探討的對象。
研究之成長條件為反應氣體CH4/H2的比例為2%,基材與加熱鎢絲距離為6mm,調整熱絲溫度使基板溫度為650~700℃。前處理方式則是將試片浸泡在4~12nm粒徑之鑽石懸浮液中,以超音波震盪使顆粒撞擊基材表面,在基材表面產生大量刮痕來提高鑽石的成長密度。
本研究藉由改變兩種中間層的參數,分別探討各種條件對鑽石薄膜品質之影響。實驗結果利用了SEM觀察薄膜之表面形貌與截面特徵,以EDS分析材質成份。鑽石薄膜之鍵結型態和結晶結構,則分別以拉曼光譜與XRD分析之。最後再以洛氏硬度試驗機之壓痕實驗評估鑽石膜之附著性
This study used CH4/H2 mixture as reactants in a hot filament
chemical vapour deposition (HFCVD) process while coating diamond
thin film on a cemented tungsten carbide (WC-Co) substrate with 6 wt.%
cobalt content. As the presence of Co binder in WC substrates retards the
diamond nucleation on substrate’s surface and reduces the adherence
between this film and substrate, a supersonic-assisted etching procedure
by means of a 1:1 HNO3/H2O solution was applied. However, this etching
treatment also make the substrates fagile. Chromium interlayer was
coated on WC as interlayers to prevent the diffusion of cobalt instead.
The adhesion of dimond films and substrates could be enhanced as well.
Two chromium interlayers were coated on WC-Co substrates for
improving performance of diamond surface coatings by using pack
chromization and reactive radio frequency (RF) magnetron sputtering
processes. The effects between surface roughness and diamond films is
also investigated.
The deposition parameters of this study are: 2% CH4/H2 gas mixture
rate , and substrates temperature of 650~700℃. The supersonic
pretreatment is conducted by 4~12nm diamond suspension acetone.
This study discuss how different coating parameters can affect the
quality of the dimond films deposited on these two interlayers. Diamond
thin film’s topography and the feature of its cross-section were observed
by scanning electron microscopy (SEM) and, in the mean time, film’s
thickness was scaled quantitatively. The pattern of carbon’s chemical
bond was analyzed by Raman spectroscopy at room temperature and the
crystal structure, determined by X-ray diffraction (XRD). The adhesion of
iii
diamond films was evaluated by Rockwell indentation in the end.
摘要 i
Abstract ii
目錄 iv
表目錄 vi
圖目錄 vii
1.1 前言 1
1.2 人工鑽石合成史 2
1.3 研究動機與目的 3
第二章 理論基礎與文獻回顧 6
2.1 碳的型態與相變化 6
2.1.1 碳膜的分類 6
2.1.2 碳的相變化U 6
2.2 鑽石低壓氣相合成的歷史 7
2.3 化學氣相沉積法U 8
2.4 熱燈絲法(Hot Filament Method CVD)原理說明 9
2.4.1氫原子的功用 9
2.5 中間層的引入 10
第三章 研究方法與過程 16
3.1 實驗流程 16
3.2 實驗系統 16
3.2.1 滲鉻裝置 16
3.2.2 脈衝直流磁控濺鍍系統 16
3.2.3 熱燈絲化學氣相沉積(HFCVD) 16
3.3 基材前處理 17
3.4 鎢絲前處理 18
3.5 鑽石薄膜沉積 18
3.6 分析儀器 18
3.6.1 掃描式電子顯微鏡分析(Scanning Electron microscopy,SEM) 18
3.6.2 拉曼光譜分析(Raman spectroscopy) 19
3.6.3 X射線繞射儀(XRD) 19
3.6.4 壓痕試驗(HRC) 20
第四章 實驗結果與討論 28
4.1 鍍鉻的中間層製作 28
4.2 具PVD Cr中間層之碳化鎢基材酸洗與否對成長鑽石薄膜造成影響 29
4.3 具滲鉻中間層之碳化鎢基材酸洗與否對成長鑽石薄膜的影響 29
4.4 滲鉻中間層的滲鉻時間對成長鑽石薄膜的影響 29
4.5具滲鉻中間層之碳化鎢基材溫度對成長鑽石薄膜的影響 29
4.5.1 掃描式電子顯微鏡分析結果 30
4.5.2 壓痕試驗分析結果 30
4.5.3 X射線繞射儀分析結果 30
4.5.4 拉曼光譜分析結果 30
4.6具滲鉻中間層之碳化鎢基材表面研磨對成長鑽石薄膜的影響 30
4.6.1 掃描式電子顯微鏡分析結果 30
4.6.2 壓痕試驗分析結果 31
4.6.3 X射線繞射儀分析結果 31
4.6.4 拉曼光譜分析結果 31
4.7 基材滲鉻中間層之HRC測試及研磨後之分析 31
第五章 結論 61
參考文獻 62
[1] Z. L. S.-Tong Lee, and Xin Jiang, "CVD diamond films: nucleation and growth, " Materials Science and Engineering,, vol. 25, pp. 123-154, 1999.
[2] M. N. Yoder, Synthetic Diamond: Emerging CVD Science and Technology, Springer New York ,1993.
[3] J. C. Angus and, "Diamond and diamond-like films, " Thin Solid Films, vol. 216, pp.126-133, 1992.
[4] M. Franklach and K. Spear, "Growth mechanism of vapor-deposition diamond, " Journal of Materials Research, vol. 3, pp.133-140, 1988.
[5] 謝浚豪, 劉丙寅, and 范正宏, "鑽石薄膜成長技術簡介-化學氣相沉積法與BEN技術概述, " 機械工業雜誌, 245期 pp. 130-137, 2003
[6] A. L. Lavoisier, Memoire Academie des Sciences, pp.564-613, 1882.
[7] F. P. Bundy, H. T. Hall, and R. H. Wentorf, "Man-made Diamond, " Nature, vol.176, pp.51-55, 1955
[8] K. E. Spear, "Diamond-Ceramic Coating of the Future," Journal of the American Ceramics Society, vol.72, pp.171-191, 1989.
[9] R. C. DeVries, "Synthesis of Diamond under Metastable Conditions," Annual Review of Materials Science, vol.17, pp.161-187, 1987.
[10] J. C. Angus, HExperimental Analysis of Nano and Engineering Materials and StructuresH, Springer , Netherlands, 1988.
[11] B. V. Spitsyn, L. L. Bouilov, and B. V. Derjaguin, "Vapor growth of diamond on diamond and other surfaces " Journal of Crystal Growth, vol.52, pp.219-226, 1981.
[12] S. Matsumoto, Y. Sato, M. Tsutsumi, and N. Setake, "Growth of Diamond Particles from Methane-Hydrogen Gas," Journal of Materials Science, vol.17, pp.3106-3112, 1982.
[13] S. Matsumoto, "Chemical Vapor Deposition of Diamond in RF Glow Discharge, " Journal of Materials Science, vol2, pp.600-602, 1985.
[14] Y. Hiros and N. Kondoh, "Extended Abstracts 35th Spring Meet.of the Japanese Society of Applied physics and Related Societies" Japan Society of Applied physics, pp.343, 1988.
[15] 宋健民, 超硬材料, 2 ed. 台北: 全華科技圖書股份有限公司, 2000.
[16] R. H. Sandra Ullram, "Temperature pre-treatments of hardmetal substrates to reduce the cobalt content and improve diamond deposition", Diamond and Related Materials vol.15. Issue 4-8, pp.994-999, 2006.
[17] R. Polini, "Chemically vapour deposited diamond coatings on cemented tungsten carbides: Substrate pretreatments, adhesion and cutting performance," Thin Solid Films, vol. 515, pp. 4-13, 2006.
[18] S. I. dos Santos, N. M. Balzaretti, and J. A. H. d. Jornada, "Adhesion between CVD diamond and WC-Co induced by high-pressure and high-temperature," Diamond and Related Materials, vol.15, pp.1457-1461, 2005.
[19] 林啟瑞, "以增加應變能及鑽石超微粉晶種預芽的方式改善CVD鑽石膜品質與附著性之研究, " Jounal of Technology, vol.15, No.2, pp.267-272, 2000.
[20] Riccardo Polini, Fabio Pighetti Mantini, Massimiliano Barletta, Roberta Valle, and F. Casadei, "Hot filament chemical vapour deposition and wear resistance of diamond films on WC-Co substrates coated using PVD-arc deposition technique," Diamond and Related Materials,vol.15, pp.1284-1291, 2006.
[21] M. Gowri, H. Li, T. Kacsich, J.J. Schermer , W.J.P. van Enckevort , and J. J. t. Meulen, "Critical parameters in hot filament chemical vapor deposition of diamond films on tool steel substrates with CrN interlayers," Surface & Coatings Technology, vol. 201, pp. 4601-4608, 2006.
[22] R. F. Davis, Diamond Films and Coatings Development, Properties, and Applications. Park Ridge, New Jersey, 1992.
[23] S. J. Choi and Y. S. Shin, presented at PROC of First International Conference on the Application of Diamond Film and Relate Materials-ADC'91 Auburm, Alabama,U.S.A., 1991.
[24] A. R. Badzian, P. K. Bachmann, T. Hartnett, T. Badzian, and R. Messier, "Diamond Thin Films Prepared by Plasma Chemical Vapor Deposition Processes," Materials Research Society Meeting, vol. XV,p.63, 1987.
[25] D. C. Ingram, "Diamondlike Carbon (DLC): Its Fabrication, Analysis and Modification by Ion Beams," Materials Science Forum, vol. 52 and 53, pp. 475-494, 1989.
[26] S. Aisenberg and F. M. Kimock, "Ion Beam and Ion-Assisted Deposition of Diamond-Like Carbon Films," Materials Science Forum, vol. 52 and 53, pp. 1-40, 1989.
[27] F. Olcaytug and Coworkers, "Amorphous Carbon Films for Sensor Applications," Materials Science Forum, vol.52 and 53, pp. 671-688, 1989.
[28] W. Zhu, A. R. Badzian and R. Messier.Morphological phenomena of CVD diamond(Part I), SPIE vol.1325 Diamond Optics III, pp.187-201, 1990
[29] 謝承聿, 張廷瑜, 蔡宏營, 王良德, and 藍春發, "CVD鑽石添加氮氣效應研究現況," 機械工業, vol. 269, pp.21-29, 2005.
[30] 葉文挺, "類鑽鍍膜參數對介面的影響," 國立台北科技大學材料及資源工程系碩士班論文, 2001.
[31] P. H. Lahr and W. G. Eversole, "Synthesis of diamond," Journal of Chemical and Engineering Data, vol.3, pp.42-47, 1962.
[32] K. E. Spear and J. P. Dismukes, Synthetic Diamond Emerging CVD Science and Technology. New York, Wiley-Interscience , 1994.
[33] H. Liu and D. S. Dandy, Diamond Chemical Vapor Deposition: Nucleation and Early Growth Stages. New Jersey,U.S.A., William Andrew, 1995.
[34] Y. S. S. Matsumoto, M. Kamo, and N. Setaka, "Vapor Deposition of diamond particles from Methane," Japanese Journal of Applied Physics, vol.21, pp.183-185, 1982.
[35] W. J. Zhang and X. Jiang, "The contribution of H+ ion etching during the initial deposition stage to the orientation grade of diamond films," Thin Solid Films, vol.348, pp. 84-89, 1999.
[36] H. Liu and D. S. Dandy, Diamond Chemical Vapor Deposition: Nucleation and Early Growth Stages, New Jersey,U.S.A., 1995.
[37] M. Nesladek, C. Asinari, J. Spinnewyn elt, “Investiagatin Of The CVD Diamnd Intermediate Layer Steel Interface “, Diamond and Related Materials, vol.3, pp.912-916 , 1994
[38] P.S. Weiser, S. Prawer, R.R. Manory etc, Improved Adhesion of CVD Diamond Films to Steel and WC--Co Substrates, Surface. Coatings Technology. vol.71, pp.167-174, 1995
[39] P.S. Weiser, S. Prawer, “Chemical vapor deposition of diamond onto iron based substrates. The use of barrier layers “ , Diamond and Related Materials, vol.4, vol.71, pp.710-713, 1995
[40] I. Endler, A. Leonhardt, H.-J. Scheibe, and R. Born, “Interlayers for diamond deposition on tool materials” Diamond and Related Materials, vol.5, pp.299-303, 1996
[41] O. Glozman, A. Hoffman, “Adhesion improvement of diamond films on steel subtrates using chromium nitride interlayers “, Diamond and Related Materials, vol.6. pp.796-801, 1997
[42] C.F.M. Borges, E.Pfender, and J. Heberlein, “Influence of nitrided and carbonitrided interlayers on enhanced nucleation of diamond on stainless steel 304”, Diamond and Related Materials, vol.10 , pp.1983-1990, 2001
[43] J.G. Buijnsters, P. Shankar, W. Fleischer etc., “CVD diamond deposition on steel using arc-plated chromium nitride interlayers “, Diamond and Related Materials, vol.11, pp.536-544, 2002
[44] J.G. Buijnsters, P. Shankar, J.J. Schermer, ” The adhesion of hot-filament CVD diamond films on AISI type 316 austenitic stainless steel ” Diamond and Related Materials,vol.13, Issues 4-8, pp.848-857, 2004
[45] S. Schwarz, Y. Musayev, S.M. Rosiwal, C. Schaufler, R.F. Singer, and H. Meerkamm, “ High temperature diffusion chromizing as a successful method for CVD-diamond coating of steel” , Diamond and Related Materials, vol.11, pp.757-762, 2002
[46] S. Schwarz, S.M. Rosiwal, Y. Musayev, and R.F. Singer, “High temperature diffusion chromizing as a successful method for CVD-diamond coating of steel II” Diamond and Related Materials , vol.12,pp.701-706, 2003
[47] Jyh-Wei Lee and Jenq-Gong Duh, “ Evaluation of microstructures and mechanical properties of chromized steels with different carbon contents” , Surface &Coatings Technology, vol.171, pp.525-531, 2004
[48] Riccardo Polini, Fabio Pighetti Mantini, Massimiliano Barletta, Roberta Valle, and Fabrizio Casadei, “Hot filament chemical vapor deposition and wear resistance of diamond films on WC-Co substrates coated using PVD-arc deposition technique” , Diamond and Materials, vol.15, pp.1284-1291, 2005
[49] 古鎮豪, "以CCl4H2於熱燈絲化學氣相沉積系統中成長奈米鑽石薄膜之研究," 國立成功大學化學工程研究所碩士論文, 2002.
[50] A. J. Perry, “Scratch adhesion testing of hard coating “, Thin Solid Films, vol.107, pp.167-180, 1983
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