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研究生:張育瑋
研究生(外文):Yu-Wei Chang
論文名稱:奈米級高分子布拉格光柵之波導元件製作
論文名稱(外文):Fabrication of Polymer Nano-Bragg Grating Waveguide Devices
指導教授:張文俊張文俊引用關係
指導教授(外文):Wen-Chung Chang
學位類別:碩士
校院名稱:南台科技大學
系所名稱:電子工程系
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:45
中文關鍵詞:軟式翻模光微影技術全像干涉
外文關鍵詞:Soft molding、Photolithography、Holographic interference
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本篇論文結合了軟式翻模(Soft molding)及光微影技術(Photolithography)技術提出一種全新的製程,為了製作布拉格光柵(Bragg grating),利用翻印(Stamping)傳輸技術配合全像干涉(Holographic interference)技術將光柵轉印到PDMS軟式薄膜,接著由PDMS軟式薄膜透過軟式翻模技術及微影在OG高分子材料上製作成奈米級高分子布拉格式光柵之波導元件,透過此項技術可降低損耗、製程成本及簡單化處理的優點。
In this paper, we proposed a novel process, which incorporates with the soft molding and photolithography techniques. For the Bragg grating fabrication, the stamping transfer technique, incorporated with holographic interference technology, was used to transfer the grating to the PDMS soft film. And then, we use the PDMS polymer mold to fabricate Nano-Bragg polymer grating waveguide on the OG polymer by using of the soft molding and photolithography techniques. This technique has the advantages such as simple treatment, low loss and fabrication cost.
摘要 iv
英文摘要 v
誌謝 vi
目次 vii
表目錄 ix
圖目錄 x
第一章 導論 1
1.1 光纖通訊的發展 1
1.2 波導元件發展與研究動機 1
1.3 論文架構 2
第二章 光波導理論及軟式微影技術 3
2.1 光波導理論 3
2.2 光波導元件的介紹 4
2.3 軟式微影技術 7
2.3.1微接觸印刷(Microcontact Printing,μCP) 7
2.3.2毛細管微成形(Micromolding in Capillaries,MIMIC) 9
2.3.3微轉印成型(Microtransfer Molding,TM) 9
2.3.4複製成型(Replica Molding,REM) 9
2.4 PDMS 9
2.4.1 PDMS材料特性 9
2.4.2 PDMS製程條件 10
第三章 OG高分子光柵製作 12
3.1全像術干涉微影技術 12
3.2布拉格光柵製作理論 14
3.3布拉格光柵光學干涉架構 15
3.4高分子布拉格光柵製程 17
3.4.1布拉格光柵黃光微影製程 19
3.4.2布拉格光柵之轉印翻模 24
3.5翻模製程結果 26
第四章 高分子布拉格光柵反射波導 27
4.1高分子布拉格光柵反射波導元件結構 27
4.2 SU-8厚膜光阻特性討論 27
4.3高分子奈米布拉格光柵反射波導SU-8厚膜光阻製程 28
4.4布拉格光柵反射波導模仁製程 31
4.5 OG高分子柵輔式波導模仁實驗結果討論 36
4.5.1 SU-8厚膜光阻與OG高分子繞射光柵基板特性討論 36
4.5.2光纖光柵基本原理 36
4.5.3高分子布拉格光柵反射波導之測量 38
第五章 結論 43
參考文獻 44
[1]Jae-Wook Kang, Jang-Joo Kim, Jinkyu Kim, Xiangdan Li, and Myong-Hoon Lee, “Low-loss and thermally sTable TE-mode selective polymer waveguide using photosensitive fluoriatedpolyimide,” IEEE Photon. Technol., vol. 14, pp. 1297-1299, 2002.
[2]A. Neyer, T. Knoche, and L. Müller, “Fabrication of low loss polymer waveguides using injection moulding technology,” Electron Lett., vol. 29, pp. 399-401, 1993.
[3]LaBianca, N., Gelorme, J., Le e, K., Sullican, E., and Shaw, J., ”High aspect ratio optical resist chemistry for MEMS applications,” Proc. 4th Int. Symp. On Magnetic Materials, Processes, and Devices, The Electrochem. Soc., Vol. 95-18, pp. 368-396, (1995).
[4]Lorenz, H., Despont, M., Fahrni, M., LaBianca, N., Vettiger, P., and Renaud, P., “SU-8: a low-cost negative resist for MEMS,” J., Micromech. Microeng. 7, pp.121-124 (1997).
[5]Zhang, J., Tan, K. L., Hong, G. D., Yang, L. J., Gong, H.”Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS,” J. Micromech. Microeng. 11,pp.20-26 (2001)
[6]Zinner H, Sensors and Actuators A, 1995, 46-47, 1
[7]M. Abraham, W. Ehrfeld, V. Hessel, et al.; Microel. Eng.; 1998, 41/42: 47
[8]E.W. Becker, W. Ehrfeld, P. Hagmann, et al.; Microelectron. Eng., 1986, 4: 3
[9]W. Ehrfeld, H. Lehr; Radiat. Phys. Chem. 1995, 45: 349-365
[10]H. Lorenz, M. Despont, P. Vettiger, et al.; Microsystem Technologies; 1998, 4: 143
[11]H. Nishihara, Masamitus Haruna and Toshiaki Suhara, Optical Integrated Circuites, McGraw-Hill Company, Inc.,2001.
[12]黃建誠, “感光高分子之積體光學波導之研製”, 國立虎尾科技大學光電與材料科技研究所, 2004/6.
[13]Anadi Mukherjee, Ben Joy Eapen, and Swapan K. Baral, “Very low loss channel waveguides in polymethylmethacrylate “, Appl. Phys. Lett. 65, 3179 (1994)
[14]Chang-Yen, D.A.; Eich, R.K.; Gale, B.K.;”A Monolithic PDMS Waveguide System Fabricated Using Soft-Lithography Techniques”, Lightwave Technology, Journal of Volume 23, Issue 6, June 2005 Page(s):2088 – 2093
[15]T. C. Sum, A. A. Bettiol, J. A. van Kan, F. Watt, E. Y. B. Pun, and K. K. Tung, “Proton beam writing of low-loss polymer optical waveguides”, Appl. Phys. Lett. 83, 1707 (2003)
[16]D. B. Ostrowsky and A. Jacques, “Formation of Optical Waceduides in Photoresist Films”, Appl. Phys. Lett. 18, 556 (1971)
[17]Yueh-Lin Loo, Robert L. Willett, Kirk W. Baldwin, and John A. Rogers, “Additive, nanoscale patterning of metal films with a stamp and a surface chemistry mediated transfer process: Applications in plastic electronics”, Appl. Phys. Lett. 81, 562 (2002)
[18]Daniel B. Wolfe, J. Christopher Love, Byron D. Gates, George M. Whitesides, Richard S. Conroy, and Mara Prentiss, “Fabrication of planar optical waveguides by electrical microcontact printing”, Appl. Phys. Lett. 84, 1623 (2004)
[19]Xia, Y., et al. 1997. “Replica molding using polymeric materials: A practical step toward nanomanufacturing”, Adv. Mater. 9: 147-149.
[20]Kim, E., Y. Xia, and G.M. Whitesides. 1995.“Polymer microstructures formed by moulding in capillaries”, Nature 376: 581-584.
[21]Zhao, X.-M., et al. 1996. “Fabrication of single-mode polymeric waveguides using micromolding in capillaries”, Adv. Mater. 8: 420-24.
[22]Xia, Y., and G.M. Whitesides. 1997. “Extending microcontact printing as a microlithographic technique”, Langmuir 13: 2059-67.
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