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研究生:張傑翔
研究生(外文):Chieh-Hsiang Chang
論文名稱:以高電壓離子源生成摻氟類鑽碳膜之摩擦係數及相關特性研究
論文名稱(外文):RESEARCH OF TRIBOLOGY AND PROPERTIES OF DLC DOPING FLUORINE BY HV-I/S CVD
指導教授:施幸祥
指導教授(外文):Hsing-Hsiang Shih
學位類別:碩士
校院名稱:大同大學
系所名稱:化學工程學系(所)
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2008
畢業學年度:96
語文別:中文
論文頁數:105
中文關鍵詞:類鑽碳膜摩擦係數
外文關鍵詞:Diamond Like Carbon filmTribology
相關次數:
  • 被引用被引用:3
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  • 下載下載:40
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類鑽碳DLC(Diamond Like Carbon)是一種具有高硬度、低摩擦係數、高化學穩定性之特性的薄膜,在工業上有著重要的應用。在DLC中掺雜其它元素:如添加金屬或氣體,可以提高其附著力、降低摩擦係數等相關特性,使得DLC更具不同特色與應用性。
本實驗是運用-高電壓離子源之氣相沈積法HV-I/S CVD(High Voltage Ion Source Chemical Vapor Deposition),在DLC鍍膜製程中,分別摻入N2、CF4二種氣體,沈積生成含氮及含氟之類鑽碳薄膜。使用顯微拉曼光譜儀(Micro-Raman spectroscopy):分析sp3、sp2之含量與變化、原子力顯微鏡(Atomic Force Microscopy):探究薄膜表面之粗糙型態、維克氏硬度機(Vickers micro-hardness):得知膜層提昇基材之硬度,將上述資料做詳細的彙整與分析,最後再以磨耗試驗機(Tribometer ball on disk):測量出摩擦係數與磨耗壽命,以驗證類鑽碳薄膜的磨潤性質。得到具有低摩擦係數之一種新穎有用途的薄膜。
DLC(Diamond Like Carbon) film is a kind of film with characteristics of high hardness, low friction and high chemical stability. There is important application on industry. Mixing other elements in DLC film, for example, metal or gas, can enhance the adhesive force and reduce the friction, etc. that make DLC film have different characteristics and good applicability.
This research uses the methode of HV-I/S CVD (High Voltage Ion Source Chemical Vapor Deposition) to codeposit the fluorine element and nitrogen element separately and produce DLC film by introducing the CF4 and N2 gases respectively. Using Micro-Raman spectroscopy to analyse the content of SP³、SP² and the change. To investigate the roughness of the surface of the film by using Atomic Force Microscopy. The Vickers micro-hardness is used for measure the hardness of film to realize the hardness promotion of the substrate. Finally, the Tribometer ball on disk is used to measure the friction and its life time, for finding the tribology properties of DLC. A new useful DLC film with low friction has been obtained.
致謝Ⅰ
ABSTRACTⅡ
摘要Ⅲ
目錄Ⅳ
表目錄Ⅶ
圖目錄Ⅷ
第一章 序論1
1.1 前言1
1.2 研究動機2
第二章 理論基礎3
2.1 類鑽碳膜3
2.1.1 類鑽碳膜的分類3
2.1.2 類鑽碳膜的成長機制5
2.1.3 類鑽碳膜厚11
2.2 鍍膜製程與原理13
2.2.1 物理氣相沈積13
2.2.2 化學氣相沈積15
2.2.3 高電壓離子源17
第三章 實驗程序21
3.1 實驗流程圖21
3.2 鍍膜參數計劃22
3.2.1 鍍膜參數表22
3.2.2 鍍膜製程參數22
3.3 試片選用及前處理23
3.3.1 試片選用23
3.3.2 試片前處理23
3.4 鍍膜程序24
3.4.1 鍍膜前配置24
3.4.2 鍍膜步驟24
3.5 薄膜之量測與分析28
3.5.1 硬度量測28
3.5.2 拉曼光譜分析28
3.5.3 原子力顯微鏡觀察31
3.5.4 磨耗試驗機測試34
第四章 結果與討論39
4.1 薄膜硬度39
4.1.1 底材效應39
4.1.2 硬度分析39
4.2 膜層強度43
4.2.1 拉曼光譜探討43
4.2.2 拉曼光譜分析46
4.3 表面粗糙型態59
4.3.1 原子力顯微鏡的選用59
4.3.2 原子力顯微鏡下的觀察與分析59
4.4 磨耗試驗79
4.4.1 磨潤特性79
4.4.2 摩擦係數試驗與分析79
4.4.3 磨耗壽命試驗與分析96
4.5 綜合分析99
第五章 結論101
第六章 參考文獻102
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