臺灣博碩士論文加值系統

我們使用ASAP光學模擬軟體進行多光束雷射干涉技術之圖案化研究。從本研究結果得知利用不同數目的光束的干涉可產生一維週期性條紋、二維週期性點陣和不規則花紋圖案或三維結構的強度分佈，而多光束干涉最大強度會隨著光束數目增加成正比關係，較大的干涉強度將有助於得到較大的對比度容易造成深孔的優點。三維結構的強度分佈產生變化，是由於多道光束中至少有著一道光束的z軸入射角度不同，而造成干涉面傾斜於z軸上，形成在z軸方向上有干涉現象。另外，由於多光束干涉的每道光在空間與時間上的相互影響，我們無法藉由數目較少的光束干涉雙曝光製作出與單曝光干涉相同的干涉圖案，另外，我們使用時域有限差分法(FDTD)將多光束干涉之圖案應用在矽基板表面之粗化研究，此表面粗化的微孔洞結構能有效的降低太陽面板表面的反射率，進而提升其光電轉換效率。
利用此研究結果，未來可以結合超快雷射蝕刻技術應用在太陽面板、微透鏡和微光學元件的產業上。

We study the patterning of multi-beam interference by using ASAP software. In the simulation results, we can find the one-dimensional periodic lines, two-dimension periodic points, random flower-like pattern, and three-dimension periodic structures with different number of beams interference. The maximum intensity of interference increases with number of beams. The higher intensity of interference will product more deep hole in the sample. The three dimension periodic structures come from the special beam interference that has different angle with Z axis among one of those beams. By the way, we apply the patterning results on the solar cell surface to study the optical properties of solar cell by using finite-difference time-domain (FDTD) method. The conversion efficiency of solar cell increases when the surface roughness with multi-beam interference technique. In the future, we can combine the multi-beam interference and ultra-fast laser ablation to fabricate the micro-components on the solar cell, lens, and fiber...etc.

摘要 / I
誌謝 / III
目錄 / IV
圖目錄 / VII
表目錄 / XI

第一章 緒論 / 1
1-1 前言 / 1
1-2 文獻回顧 / 3
1-1-1表面粗化技術 / 3
1-1-2干涉微影技術 / 6
1-1-3雷射干涉微影應用在表面粗化技術 / 8
1-3 研究目的 / 8

第二章 基礎理論 / 14
2-1 干涉原理 / 14
2-2 干涉理論計算 / 14
-二道光干涉 / 14
-四道光干涉以及四道光具有不同相位差 / 16
-五道光干涉 / 19
-八道光干涉 / 21

第三章 實驗方法 /30
3-1 ASAP簡介 / 30
3-2 實驗架設 / 31

第四章 ASAP模擬干涉結果 / 33
4-1 透鏡的改變對週期及干涉強度直徑大小的影響 / 33
4-2 多道光干涉多道光干涉圖案分析 / 33
4-3 多道光干涉對強度的影響 / 36
4-4 多道光雙曝光之圖形變化 / 37

第五章 FDTD模擬干涉結果 / 51
5-1 多道光干涉對抗反射之影響 / 51
5-2 多道光雙曝光對抗反射之影響 / 52

第六章 結論 / 59

第七章 相關技術的專利分析 / 61
7-1 高科技專利簡介 / 61
7-2 相關專利分析 / 73
7-3 本研究之專利設計 / 76
7-3-1 發明或創作背景 / 76
7-3-2 發明或創作說明 / 78
7-3-3 申請專利範圍 / 80

參考文獻 / 93

附錄一 matlab模擬計算多光束干涉方程式 / 96
附錄二 ASAP模擬多光束干涉方程式 / 97

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