|
1. 拓墣產業研究“所面板市場新布局暨新興技術的竄起” (2006) 2.川上英昭 “平面顯示器”(2001)p72 3. 陳志強“低溫複晶矽顯示技術”(2004) 4.N. Cohen, “Automated optical inspection for the LTPS TFT-LCD process”, FDP and Semiconductor World. 5.顧鴻壽 “光電液晶平面顯示器-技術基礎及應用”(2005)p318 6. A. Kar, J. Mazumder, “Laser chemical vapor deposition of thin films”, Materials Science and Engineering B41 (1996) 368 7. S.N. Bondi , W.J. Lackey , R.W. Johnson , X. Wang , Z.L. Wang , Laser assisted chemical vapor deposition synthesis of carbon nanotubes and their characterization , Carbon 44 (2006) 1393 8. Duty C, Jean D, Lackey WJ. “ Laser chemical vapor deposition: materials, modeling, and process control ”, Int. Mater. Rev. 46(2001)271 9. P.Chaudhari, “Hillock growth in the films”,j. appl. phys. 45 (1974)4339 10. 羅正忠 “半導體製程技術導論”(2002)450
11.J. Haigh , G. Burkhardt , K. Blake, “Thermal decomposition of tungsten hexacarbonyl in hydrogen, the production of thin tungsten-rich layers, and their modification by plasma treatment”, Journal of Crystal Growth 155(1995)266 12. N. S. Gluck and G. J. Wolga , “Mechanisms of carbon and oxygen incorporation into thin metal films grown by laser photolysis of carbonyls” , J. Appl. Phys. 61(1987)998 13. 林士凱、張慈牧、吳戴仰, “主動式液晶顯示器基礎與應用”(2007) p3-17 14.S. Kondo, “Effects of grain size and preferred orientation on the electromigration lifetime of Al-based layered metallization”, J. Appl. Phys. 78(1995)6534 15. K. K. Lai, H. H. Lamb, “Tungsten chemical vapor deposition using tungsten hexacarbonyl: microstructure of as-deposited and annealed films”, Thin Solid Films 370 (2000) 114 16. Y. Nambu, Y. Morishige, and S. Kishida,“High-speed laser direct writing of tungsten conductors from W(CO)6”, Appl. Phys. Lett. 56(1990)2581 17. J. B. Park , C. J. Kim , P. E. Shin , S. H. Park , H. S. Kang , S. H.
Jeong,“Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair”, Applied Surface Science 253(2006)1029 18. S. A. Mulenko , Y. V. Kudryavtsev, V. P. Mygashko ,“Laser synthesis of semiconductor nanostructures with narrow band gap”, Applied Surface Science 253 (2007) 7973 19. I. J. Luxmoore , I. M. Ross , A. G. Cullis , P. W. Fry , J. Orr , P. D. Buckle , J. H. Jefferson, “Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition”, Thin Solid Films 515(2007)6791 20. F. Watt, A. A. Bettiol, J. A. Van Kan, E. J. Teo and M. B. H. Breese,“Ion beam lithography and nanofabrication: A review”, International Journal of Nanoscience (2005) 269 21. H. H. Gilgen, T. Cacouris, P. S. Shaw, R. R. Krchnavek, and R. M. Osgood,“Direct writing of metal conductors with near-uv light”, Appl. Phys. B 42(1987)55 22. J. B. Park , C. J. Kim , P. E. Shin , S. H. Park , H. S. Kang , S. H. Jeong,“Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair”, Applied Surface Science 253(2006)1029 23. S. Bourgeois, B. Domenichini, F. Sutara, V. Matolin,“Refractory
metal reactivity towards oxide surface: W/TiO2(1 1 0) case”, Vacuum 82 (2008) 146 24. M. Broquier , C. Cre’pin , H. Dubost , J.-P. Galaup, “IR spectra and vibrational dephasing of the CO stretching mode in W(CO)6 doped cryogenic matrices”, Chemical Physics 341 (2007) 207 25. Y. Nambu, Y. Morishige, and S. Kishida,“High-speed direct of tungsten conductors from W(CO)6”, Appl. Phys. Lett. 56(1990) 2581 26. O. Mende , D. Niggemeyer,“Principle and application of a bifunctional laser linking and cutting structure for microelectronic circuits in standard CMOS-technology”, Microelectronics Reliability 40 (2000) 1437 27. M. S. Pathania, H. N. Sheikh and B. L. Kalsotra, “Synthesis and characterization of tungsten carbonyl complexes containing N-methyl substituted urea and thiourea ligands”, Journal of Coordination Chemistry 60(2007)1395 28. Y. -J. Chen, C.- L. Liao and C. Y. Ng , “A molecular beam photoionization mass spectrometric study of Cr(CO)6, Mo(CO) 6, and W(CO) 6”, J. Chem. Phys. 107(12)(1997) 4527
29. P. Liu, F. Arai and T. Fukuda, “Controlled nanowire growth with a nanorobotic manipulator”, Nanotechnology 17(2006)3023 30. G. Auvert,“Laser chemical vapour deposition for microelectronics”, Applied Surface Science 86 (1995) 466 31. Y. Zhang,“Quasi-steady state natural convection in laser chemical vapor deposition with a moving laser beam, Journal of Heat Transfer”,125(2003)429 32.田民波, “薄膜技術與薄膜材料”(2007)p679 33. 白木靖寬、吉田貞史“薄膜工程學”(2006)p2-66~71 34. 陳光華、鄧金祥“新型電子薄膜材料”(2006),p441~444 35. S. Mohanan “Advanced Materials” 02:02:04 36. S. A. Mulenko, A. V. Izvekov, Y. N. Petrov, V. P. Mygashko, V. S. Ovechko,“Laser photodeposition of thin semiconductor films from iron carbonyl vapors”, Applied Surface Science 248(2005)475 37. Y. Zhang,“Effect of natural convection on laser chemical vapor deposition with a stationary laser beam”, International Journal of Heat and Fluid Flow 25 (2004) 683 38. S. I. Han and S. H. Jeong, “Laser-assisted chemical vapor
deposition to directly write three-dimensional microstructures”, J. Laser Appl., 16(2004)154 39. Y. C. Huang, A. C. Chiang, and Y. Y. Lin, “A diamond CO2 laser-driven test accelerator”, Proceeding of the second asian particle accelerator conference(2001)268 40戴亞翔 “TFT-LCD面板的驅動與設計”(2007) 41. R. V. Camp, K. V Doorselaer and I. Clemminck,“Reliability of a focused ion beam repair on digital CMOS circuits”, Microelectron. Reliab., 36(1996)1787 42. 莊達人 “VLSI製造技術”(2006) 43. K. L. Bjorklund, C. Ribbing, H. norde, M. Boman“ Containerless fabrication of tungsten single crystals using laser CVD for field emission applications” Applied Physics A –Materials Science & Processing, 75(2002) 403 44. O. Conde, A. J. Silvestre,“Laser-assisted deposition of thin films from photoexcited vapour phases”Appl.Phys.A79(2004)489 45.Bäuerle D.,“Laser processing and chemistry”,3rd Ed., Springer-Verlag, Berlin(2001)
|