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研究生:蔡孟原
研究生(外文):Meng-Yuan Tsai
論文名稱:金屬基類鑽碳膜於微創器械表面抗親血性之研究
論文名稱(外文):Research of surface anti-coagulation on minimally invasive device with metal-based diamond-like carbon film
指導教授:林明宏林明宏引用關係
指導教授(外文):M.H.Lin
學位類別:碩士
校院名稱:國立高雄應用科技大學
系所名稱:機械與精密工程研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2009
畢業學年度:97
語文別:中文
論文頁數:93
中文關鍵詞:類鑽碳射頻磁控沈積法含銅類鑽碳膜
外文關鍵詞:diamond-like carbon filmratio frequency magnetron sputteringdiamond-like carbon film
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摘要
由於類鑽碳擁有類似鑽石的性質,如耐磨耗、化學抗腐蝕及高熱傳導性等等,加上目前鍍膜製程技術較為普遍,被視為極有潛力的材料之一。本研究嘗試以射頻磁控濺鍍(Ratio Frequency Magnetron Sputtering)薄膜生成技術,再以銅靶材與通入反應性氣體甲烷(CH4)共鍍形成含銅類鑽碳膜,藉由調整濺鍍功率來控制銅含量、沉積時間來控制膜厚生成及結構排列、反應氣體比例來控制含銅類鑽碳薄膜含量。目的在於探討銅的加入對於類鑽碳膜的表面型態、結構及親血性質之影響。實驗結果顯示隨著銅含量增加,發現粗糙度提高並且表面尖錐數量增加及細化的現象,且銅在膜中分佈均勻。而且經由XPS繞射分析銅碳鍵結,發現沒有形成銅碳化合物,而在甲烷流量控制在一定比例與濺鍍功率中對於含銅類鑽碳薄膜含量、表面硬度、抗親血性、及抗菌性有一定影響,對於在未來含銅類鑽碳薄膜沉積在微創器械表面研究中也有一定助益。
Abstract
The diamond-like carbon films provide the excellent physical and chemical properties such as anti-abrasion, well-resistance to chemical corrosion and heat conductivity. As stated above, several coating techniques have been applied to prepare the diamond-like carbon films. The “Ratio Frequency Magnetron Sputtering” is one of attractive methods in coating techniques. Thus, in the present research the diamond-like carbon films were synthesized under the copper target within the reactive gas methane (CH4). The copper contents are controlled by adjusting the sputtering power and the film thickness are controlled by deposited time. Furthermore, the contents of the diamond-like carbon films containing copper were controlled by reactive gas ratio. The objective is to investigate the effects of surface properties, microstructures and the anti-blood coagulation of diamond-like carbon film containing the copper films. The results show that the higher the contents of copper, the higher the roughness of films is. In addition, the copper-carbon bonding was analyzed by XPS, no copper-carbon compounds were investigated obviously. Furthermore, the thickness, surface roughness, anticoagulation and antiseptic of diamond-like carbon film containing copper film are related with methane ratio as well as sputtering powers. It is believed that the minimally invasive instrument with diamond-like carbon film containing copper film is helpful for biomedical devices in the future.
總目錄
中文摘要.................................................Ⅰ
英文摘要.................................................Ⅱ
誌謝.....................................................Ⅲ
總目錄...................................................Ⅳ
圖目錄...................................................Ⅶ
表目錄...................................................XI
第一章 緒論.............................................. 1
1.1前言...........................................1
1.2 研究動機.......................................2
第二章 文獻回顧............................................4
2.1 微創醫療緣起....................................4
2.1.1 組織熱損傷定義........................................4
2.1.2 組織抗親血性方式應用...................................4
2.2 類鑽石碳膜之生成機制..............................7
2.2.1 類鑽碳薄膜之組成............................7
2.2.2 類鑽薄膜生成技術與應用.......................11
2.3 電漿............................................20
2.3.1 電漿原理...................................20
2.4 薄膜沉積原理.....................................21
2.5 鍍膜性質之檢測...................................22
2.5.1 掃描式電子顯微鏡............................22
2.5.2 拉曼光譜分析................................24
第三章 實驗方法.............................................27
3.1 實驗流程及規劃..........................................27
3.2 薄膜之製程.............................................29
3.2.1 實驗材料.............................................29
3.2.2 濺鍍系統.............................................29
3.3 薄膜沉積...............................................31
3.4 薄膜特性分析及鑑定......................................33
3.4.1 SEM分析............................................33
3.4.2 AFM分析............................................34
3.4.3 XPS分析............................................34
3.4.4 微硬度分析..........................................35
3.4.5 拉曼光譜分析........................................36
3.4.6 TEM分析............................................37
3.4.7 接觸角分析..........................................38
第四章 結果與討論...........................................39
4.1拉曼光譜分析............................................39
4.1.1功率對含銅類鑽碳膜之影響................................39
4.1.2甲烷流量對含銅類鑽碳膜之影響............................40
4.2 含銅類鑽碳膜之表面型態分析...............................42
4.2.1功率對含銅類鑽碳膜之影響................................42
4.2.2 甲烷流量對含銅類鑽碳膜之影響...........................42
4.2.3 薄膜橫截面觀察........................................54
4.3 接觸角分析.............................................59
4.3.1功率對含銅類鑽碳膜之影響................................59
4.3.2甲烷流量對含銅類鑽碳膜之影響............................60
4.4維克氏硬度分析..........................................63
4.4.1功率對含銅類鑽碳膜之影響...............................63
4.4.2甲烷流量對含銅類鑽碳膜之影響............................63
4.5 表面粗糙度分析.........................................65
4.6 晶相分析..............................................70
4.6.1 XPS繞射分析.........................................70
4.6.2 TEM分析.............................................74
第五章 結論................................................77
參考文獻...................................................77
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