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研究生:張宏仁
研究生(外文):Hung-Jen Chang
論文名稱:利用雙靶磁控濺鍍共摻雜氮和鋁之P-type氧化鋅之研究
論文名稱(外文):Characterization and preparation of p-type ZnO films by N and Al co-doping using magnetron sputtering
指導教授:劉全璞
指導教授(外文):Chuan-Pu Liu
學位類別:碩士
校院名稱:國立成功大學
系所名稱:材料科學及工程學系碩博士班
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2009
畢業學年度:97
語文別:中文
論文頁數:67
中文關鍵詞:氧化鋅p型共摻雜
外文關鍵詞:co-dopingp-typeZnO
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本論文研究利用雙靶磁控濺鍍系統共摻雜氮與鋁,利用射頻濺鍍槍與直流濺鍍槍分別濺鍍99.99%氧化鋅靶材和99.99%鋁靶材。且利用N2氣體作為氮的來源。並改變基板的溫度從300℃到500℃探討氧化鋅電性變化。藉由霍爾量測分析氧化鋅的電阻率( resistivity)、遷移率(mobility)及載子濃度(carrier concentration),以及使用化學能譜分析儀確認氮與鋁的共摻雜,並利用拉曼與光激螢光光譜量測其光學特性。實驗結果顯示,500℃的成長溫度下氧化鋅呈現p-type,電阻率為和載子濃度分別為25.3Ωcm和1.29×1018cm-3。
P-type ZnO films were fabricated at different temperatures from 300℃ to 500℃ by N and Al co-doping method with magnetron sputtering using a 99.99% ZnO target and a 99.99% Al target by RF and DC magnetron gun, respectively. Nitrogen source was produced from 99.999% N2 gas. Hall measurement was employed to determine the resistivity, mobility and carrier concentration. X-ray photoelectron spectroscopy analysis confirmed the presence of nitrogen and aluminum in the codoped films. Raman and Photoluminescence were used to characterize the optical properties. According to the Hall measurement results, the p-type ZnO film grown at 500℃ has a resistivity of 25.3Ωcm and hole concentration of 1.29×1018cm-3.
摘要............................................I
Abstract.......................................II
誌謝..........................................III
目錄...........................................IV
圖目錄.........................................VI
表目錄.......................................VIII
第一章 前言.....................................1
第二章 文獻回顧與理論基礎.......................3
2-1 氧化鋅晶體結構與特性........................3
2-2 P-type氧化鋅摻雜............................5
2-3 濺鍍原理....................................8
2-4 霍爾量測...................................10
2-5 XRD........................................11
2-6 化學分析用電子能譜(ESCA)...................13
2-7 光致螢光光譜(Photoluminescence,PL) .......15
2-8Ramam效應...................................16
第三章 實驗方法與步驟..........................26
3-1 實驗流程...................................26
3.2 實驗設備...................................27
第四章 結果與討論..............................33
4-1 氧化鋅在Ar + N2氣氛下共濺鍍................34
4-2 氧化鋅在20% H2/Ar + N2氣氛下共濺鍍.........37
4-4 化學成分分析...............................44
4-5 Raman光譜分析..............................50
4-5 PL光譜分析.................................56
第五章 結論....................................60
參考文獻.......................................62
自序...........................................67
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