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研究生:馬宗廷
研究生(外文):Ma, Chung-Ting
論文名稱:以產品為基礎之適應性干擾估測器用於半導體製程之批次控制
論文名稱(外文):Product-based adaptive disturbance estimation for run-to-run control of semiconductor processes
指導教授:李安謙
指導教授(外文):Lee, An-Chen
學位類別:碩士
校院名稱:國立交通大學
系所名稱:機械工程系所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2009
畢業學年度:97
語文別:中文
論文頁數:92
中文關鍵詞:批次控制混貨
外文關鍵詞:Run-to-Run controlmix-product
相關次數:
  • 被引用被引用:2
  • 點閱點閱:184
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
近年來,批次控制技術已被充分發展並且應用於半導體製造過程中,維持製程水準並改善產品良率。現今半導體廠內單一機台上必定有多種不同產品同時進行同一道製程工作,在這種少量多樣化的製程環境中,可能因為產品過久未於機台上生產而找不到最佳的輸入值,導致產品輸出未能在期望的規格範圍之內使得產線的良率降低。
本論文對上述少量多樣化的生產情形提出一控制策略,在混貨機制下各產品的干擾值分布,可以大略推斷干擾項與各產品和機台的組合有關,可將其干擾值拆解成一截距項與一漂移量,將截距項的變異歸於各產品間變異所產生,而漂移量歸於機台與產品間交互作用所貢獻,利用PBADE控制架構,不斷的更新該模型並計算出下一片製程之輸入值,使輸出值靠近所期望的目標值,達到控制單一機台多產品之混貨製程的目的。
In the last few years, Run-to-Run (RtR) control techniques have been developed and used to semiconductor manufacturing processes to maintain process targets and improve product quality. There are many different products entering one tool to proceed the same process in Fab nowadays. In this high-mix situation, it is hard to find out the optimal recipe for some products, which did not process in the tool for a long time. This situation leads to the outputs of the products locating outside of the desired specification and decrease the yield.
There is a control strategy for the high-mix process situation in the thesis. In this situation, this thesis considers that the disturbances are related to the combination of the products and the tool. This study separates the disturbances into one intercept and one value of drift. It is assumed that the different intercepts are related to the variation of the products, and the sizes of drift are related to the interaction between the tool and the product. This thesis designs a PBADE controller, continuously updates the model and calculates the recipe for the next run, approaching the output to the target and achieving the goal for controlling mixed product process of one tool and multi-product.
摘  要 ii
ABSTRACT iii
誌 謝 iv
目 錄 v
圖 目 錄 viii
表 目 錄 x
第一章 緒論 1
1.1 研究目的與動機 1
1.2 文獻回顧 2
1.3 研究方法 3
1.4 內容大綱 4
第二章 Run-to-Run控制器介紹 5
2.1 簡介 5
2.2 EWMA控制器 5
2.2.1 EWMA控制器應用於混貨製程 6
2.3 JADE控制器 8
2.3.1 JADE控制器簡介 8
2.4 DOUBLE EWMA控制器 10
第三章 PBADE簡介 12
3.1 簡介 12
3.2 簡述PBADE控制方法 12
3.3 簡易規律的雙產品製程 13
3.3.1 建立混貨製程模型 14
3.3.1.1 製程干擾為IMA(1,1) with drift 16
3.3.1.2 製程干擾為deterministic trend 18
3.3.1.3 製程干擾為random walk with drift 19
3.4 含有其他產品的雙產品製程 21
3.4.1 建立混貨製程模型 21
3.4.1.1 製程干擾為IMA(1,1) with drift 22
3.4.1.2 製程干擾為deterministic trend 25
3.4.1.3 製程干擾為random walk with drift 26
3.5 含有其他產品的複雜雙產品製程 28
3.5.1 建立混貨製程模型 28
3.5.1.1 製程干擾為IMA(1,1) with drift 29
3.5.1.2 製程干擾為deterministic trend 33
3.5.1.3 製程干擾為random walk with drift 34
第四章 PBADE之模擬與分析 39
4.1 簡介 39
4.2 模擬與分析 39
4.2.1 排程ㄧ 39
4.2.1.1 製程干擾為IMA(1,1) with drift 40
4.2.1.2 製程干擾為deterministic trend 41
4.2.1.3 製程干擾為random walk with drift 42
4.2.2 排程二 44
4.2.2.1 製程干擾為IMA(1,1) with drift 44
4.2.2.2 製程干擾為deterministic trend 45
4.2.2.3 製程干擾為random walk with drift 47
4.2.3 隨機混貨製程 48
4.3 模擬結論 50
第五章 製程歷史資料驗證比較 52
5.1 微影製程 52
5.2 化學機械研磨製程 57
第六章 結論與未來展望 61
6.1 結論 61
6.2 未來展望 61
參考文獻 62
附錄 65
附錄A 65
附錄B 70
附錄C 72
附錄D 74
附錄E 78
附錄F 80
附錄G 82
附錄H 87
附錄I 90
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