|
[1] D.Kahng and S.M.Sze, “A floating gate and its application to memory devices,” Bell Syst. Tech. J., vol. 46, p. 1288, 1967. [2] Ivan V.Panov, Developments Of Non Volatile Memory. IEEE 2006. [3] C.T.Swift, G.L.Chindalore, K.Harber, T.S.Harp, A.Hoefler, C.M.Hong, P.A.Ingersoll, C.B.Li, E.J.Prinz, and J.A.Yaterr, “An embedded 90nm SONOS nonvolatile memory utilizing hot electron programming and uniform tunnel erase,” in IEDM Tech. Dig.,2002,pp. 927-930 [4] S.Habermehl, R.D.Nasby, M.Rightley, and P.R.Mahl, “Endurance of SONOS NVM stacks prepared with nitrided Si(100)/SiO interfaces,”IEEE Non-Volatile Semiconductor Memory Workshop, vol. 66, Monterey, CA, 1998. [5] Assaf Shappir, Eli Lusky, Guy Cohen, Ilan Bloom, Meir Janai and Boaz Eiltan, The Two-Bit NROM Reliability. IEEE 2004. [6] B. Eitan, P. Pavan, I.Bloom, E.Aloni, A.Frommer, and D Finzi, “NROM: A novel Localized trapping 2 bit nonvolatile memory cell,” presented at the IEEE Non-Volatile Semiconductor Memory Workshop, vol. 66, Monterey, CA, 1998.
|