臺灣博碩士論文加值系統

本論文以陽極氧化鋁模板(Anodic Aluminum Oxide，AAO)的製作比較為主軸，之後並應用此模板製作微結構及成長釕奈米柱，共分成三部分。論文第一部分將比較用電子槍蒸鍍(E-gun)、濺鍍(sputter)方式製作的鍍鋁晶圓、和市售鏡面純鋁片進行陽極處理時，適合的參數設定。實驗結果顯示，以E-gun、sputter方式製作之試片、膜厚2μm為例，草酸兩次陽極處理反應時間宜控制在各30分鐘以內；而鋁片厚度與所鍍鋁膜相比，約在百倍的差距，所以可以將草酸陽極處理反應時
間拉長至1小時以上，以獲得較規則的結構。
論文的第二部分，先以COMSOL Multiphysics軟體模擬微結構在菲涅爾透鏡表面對光學抗反射率之影響，再將第一部分的結果為依據，改變製程步驟來達成我們所模擬的微結構，並製作在與菲涅爾透鏡模具相同性質的基板上。之後利用聚二甲基矽氧烷(polydimethylsiloxane, PDMS)測試，證實可以把微結構翻模出來，故
可供後續製作微結構於菲涅爾透鏡表面的參考。
第三部分則是用AAO模板製作釕奈米柱，我們以低成本的自耦變壓器作為交
流電鍍時的電源供應器，並成功生長出長度約1μm的釕奈米柱。

This study is to manufacture anodic aluminum oxide (AAO) with different substrate, and then to apply this AAO to fabricate microstructure and Ru nanorod, which is separated to three parts. Therefore the paper''s first part will compare with three substrates of using electron gun evaporation (E-gun) and sputter to manufacture the aluminum film on silicon wafers, mirror-surfaced pure aluminum sheet. After anodic treatment, find out the suitable fabricating parameters. The experiment results showed that the time should be controlled within 30 minutes by using the samples manufactured by E-gun and sputter to proceed the ethanedioic acid anodic treatment reaction; the thickness of aluminum sheet is about one hundred times more then aluminum-films, so it may elongate the ethanedioic acid anodic treatment reaction time to over 1 hour to obtain the regular structure.
The paper’s second part is using the COMSOL Multiphysics software to simulate the effect of anti-reflection of the microstructure on the surface of Fresnel lens. Then the first part of result as the basis, changing the processed to achieves the microstructure which we simulated. Using the substrate the same prosperities with Fresnel lens mold to manufacture the microstructure. Afterward using the gathering polydimethylsiloxane (PDMS) to test actually, it may copy the microstructure on the mold.
The third part is that fabricating Ru nanorod by AAO structure. We used the alternating electroplating by low cost''s auto-converter power supply, and successfully grew Ru nanorod with length approximately 1μm.

中文摘要 I
ABSTRACT II
致謝 III
目錄 IV
圖目錄 VII
表目錄 IX
第一章 緒論 1
1-1 前言 1
1-2 研究動機與目的 1
1-3 論文架構 2
第二章 文獻回顧 3
2-1 多孔陽極氧化鋁(ANODIC ALUMINUM OXIDE，AAO) 3
2-1-1 AAO結構簡介 4
2-1-2 AAO的形成機制 8
2-1-3 增加AAO的孔洞規則性 11
2-2 菲涅爾透鏡(FRESEL LENS) 16
2-2-1 發展歷史 16
2-2-2 傳統菲涅爾透鏡設計原理及特色 16
2-2-3 菲涅爾透鏡應用實例：聚光型太陽能電池 18
2-3 有限元素分析法(FINITE ELEMENT MODELING LABORATORY) 20
2-3-1 有限元素分析法簡介[41] 20
2-3-2 有限元素法模擬流程 21
2-4 奈米柱(NANOROD)的成長 24
2-4-1 電鍍基本原理[42] 24
2-4-2 直流電鍍(Direct Current Electro-Deposition) [43] 25
2-4-3 直流脈衝電鍍(DC Pulsed Electro-Deposition) 25
2-4-4 交流電鍍(Alternating Current Electro-Deposition)[45] 26
2-5 AAO基板製備 27
2-5-1 物理氣相沈積(physical vapor deposition) 27
2-5-2 電子槍蒸鍍(electron-gun evaporation)系統[47] 27
2-5-3 濺鍍系統(Sputter) 28
2-6 量測儀器介紹 29
2-6-1 掃瞄式電子顯微鏡(Scanning Electron Microscopy, SEM) 29
2-6-2 X光繞射儀(X-ray Diffraction, XRD) 29
2-6-3環境掃描式電子顯微鏡(Environmental SEM, ESEM) 30
第三章 實驗設計 32
3-1多孔氧化鋁在不同基板的製備 34
3-1-1 實驗環境設備 34
3-1-2 實驗步驟 36
3-1-3 試片製備 36
3-1-4 變數設定 38
3-2 微結構製程 40
3-2-1 以Comsol Multiphysics軟體模擬微結構 40
3-2-2 以AAO製程製作微結構 41
3-2-3 以鍍鋁無氧銅片製作微結構 41
3-3 RU奈米柱製程 42
3-3-1 實驗環境設備 42
3-3-2 變數設定 43
3-4 檢測機台與參數設置 44
3-4-1 場發射型掃描式電子顯微鏡(附能量分散分析儀EDS) 44
3-4-2 環境掃描式電子顯微鏡 44
3-4-3 Ｘ光繞射儀 45
第四章 結果與討論 46
4-1 不同基板之陽極處理比較 46
4-1-1 試片原始表面結構 46
4-1-2 第一組參數實驗結果 48
4-1-3 1.8wt%鉻酸和6wt%磷酸的混合溶液蝕刻時間的影響 54
4-1-4 陽極處理時間的影響 55
4-1-5 表面平整度對陽極處理孔洞規則性的影響 57
4-1-6 以定電流進行鋁片第二次陽極處理 58
4-2微結構模擬與製備 59
4-2-1 Comsol Multiphysics軟體模擬微結構 59
4-2-2 以sputter鍍鋁wafer製作微結構 59
4-2-3 以鍍鋁無氧銅片製作微結構及PDMS翻膜 61
4-3成長釕(RU)奈米柱 64
4-3-1 以直流定電壓/直流定電流方式成長釕奈米柱 64
4-3-2 以交流電鍍成長釕奈米柱 65
4-3-3 EDS成分分析 66
4-3-4 XRD圖譜分析 67
第五章 結論與未來展望 68
5-1 結論 68
5-2 未來展望 69
參考文獻 70

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