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研究生:姚杰良
研究生(外文):Jie-liang Yao
論文名稱:PDMS與SU-8應用於奈米壓印製作奈米結構之研究
論文名稱(外文):Study on Fabrication of PDMS and SU-8 nano-structures by Nanoimprint Lithography
指導教授:趙健祥
指導教授(外文):Chien-Hsiang Chao
學位類別:碩士
校院名稱:國立中山大學
系所名稱:機械與機電工程學系研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2009
畢業學年度:97
語文別:中文
論文頁數:82
中文關鍵詞:奈米壓印PDMSSU-8
外文關鍵詞:Nanoimprint lithographyPDMSSU-8
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由於科技的進步,產品的微小化逐漸成為一種趨勢,因此製程所要求的特徵也越來越小,目前發展出一種新興的製程技術--奈米壓印技術,具有製程簡單、成本低廉、又兼具量產的優勢,並且可以輕易的製作出奈米級的微結構,是相當被看好的新製程技術。本研究為使用FIB在石英玻璃上作出線寬為100nm以下之柵型結構,之後用PDMS翻模與石英模仁結合奈米壓印技術,分別壓印出100nm線寬以下的光柵結構。由於PDMS成型方便快速,但應用小尺寸上的壓印研究卻不多,所以探討PDMS在奈米壓印小尺寸上的研究是非常重要的,以實驗探討求的PDMS最佳的成型參數,以及使用PDMS模仁進行壓印壓力的實驗探討,求得其最佳的成型壓印,再以最佳的成型參數及壓印壓力,求的最佳的實驗結果。實驗結果成功的壓印出線寬為40nm的柵型結構。
Miniaturization has become a product trend due to technological advancements, thus giving rise to nanoimprint lithography printing. Miniaturization is also a trend regarding process features. nanoimprint lithography has great potential for its simple process, low cost, mass-production capacity, and ease to produce nanoscale microstructure. After making a fence structure of line width less than 100nm on quartz glass with FIB, this study printed the fence structure of line width less than 100nm with the nanoimprint lithography using PDMS mold and quartz soft mold. Though PDMS molding is fast and convenient, it is uncommon with regard to small-size press. This study investigated the application of PDMS molds to nanoimprint lithography in order to verify the optimal parameters of PDMS molding and the results of nanoimprint lithography with PDMS soft modes. After obtaining the optimal molding press, the optimal molding parameters and press pressure were applied to find the optimal experimental results. Results show that the combination can successfully print a fence structure with a line width of 40nm.
目錄
中文摘要 Ⅰ
英文摘要 Ⅱ
誌謝 Ⅲ
目錄 Ⅳ
圖目錄 ,Ⅵ
表目錄 Ⅸ


第一章 緒論 1
1-3 前言 1
1-2 研究動機及目的 2
1-3 全文架構 3

第二章 文獻回顧 1
2-1 奈米壓印原理 4
2-1-1奈米壓印的種類 4
2-2 飲微影製程技術 9
2-3影響奈米壓印參數 14

第三章實驗儀器與材料及實驗方法和步驟 15
3-1 實驗儀器 15
3-1-1場發射型掃描式電子顯微鏡(JEOL-6330 SEM) 15
3-1-2環境掃描式電子顯微鏡(ESEM) 15
3-1-3掃描探針式電子顯微鏡 16
3-2 實驗材料 16
3-2-1模仁材料 16
3-2-2脫模劑 17
3-2-3光阻材料 17
3-3 實驗方法 19
3-4 實驗規畫 19
3-4-2石英模仁製作 20
3-4-2石英模仁的清洗烘乾及脫模劑的成長 20
3-4-3調配PDMS 20
3-4-4 PDMS上成長脫模劑 20
3-4-5清洗玻璃基材 20
3-4-6光阻塗佈 21
3-4-7軟烤 21
3-4-8壓印 21
3-4-9曝光硬化 21
3-4-10硬烤 21
3-4-11脫模 22
3-4-12壓印結構檢測 22

第四章實驗結果及探討 23
4-1 PDMS模仁成形參數探討 23
4-1-1抽真空,再灌模的方式 23
4-1-2抽真空,灌模再抽真空方式 25
4-2 PDMS模仁壓印壓力探討(溫度固定,壓印溫度為85°C) 27
4-2-1以3kg/cm2進行壓印 27
4-2-2以3.5kg/cm2進行壓印 28
4-3 PDMS模仁最佳化的壓印結果 34
4-4 線寬100nm以下石英模仁壓印高分子材料(SU-8)實驗 48
4-5 結果討論 61

第五章結論及未來期許 67
5- 1結論 67
5- 2 未來展望 68

參考文獻 69
Chou Stephen Y.; Peter R.krauss; Preston J. Rrnstrom, (1995), “Imprint of sub-25 nm vias and trenches in polymers”, Appl. Phys. Lett., Vol.67, pp.3114-3116.
何侑倫, (2004), ”奈米轉印技術現況與未來”,微系統暨奈米科技協會會刊12期, pp.29-38.
陳釧鋒, (2004), ”奈米轉印製程與設備發展現況介紹”, 機械工業雜誌255期,pp.151-162.
Tan H.; A. Gilbertson; S.Y. Chou, (1998),“Roller nanoimprint lithography,” Journal of Vacuum Science and Technology, B., Vol.16, No.6, pp.3926-3928.
Austin M D; Haixiong Ge; Wei Wu; Mingtao Li; Zhaoning Yu; D. Wasserman; S. A. Lyon; Stephen Y. Chou, (2004), “Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography”, Applied Physics Letters, Vol.84, No.26, pp.5299-5301.
粘金重, (2005), ”模具圖形與接觸摩擦對奈米壓印模穴充模之影響評估報告”,工業技術研究院, 系統中心, A341XS2E11,
粘金重, (2006), ”奈米壓印模穴充模分析與監測”, 國立清華大學博士論文, 2006
徐偉軒, (2006), ”提高奈米壓印均勻性之模具構造研究”,清華大學動力機械工程學系論文, 2006
楊文彬, (2004), ”電磁驅動奈米平行定位平台之研究(期末報告)”, 工業技術研究院電子所, A331XS2XI0,
袁琪葦, (2005), ”奈米壓印對位系統之研製:影像檢測技術與雷射干涉儀於多層壓印機台之應用”台灣大學工程科學及海洋工程系論文, 2005
丁力安, (2006), ”奈米壓印對位光學系統之研製”,台灣大學工程科學及海洋工程系論文,
翁儷瑜, (2004)”熱感應分子應用在奈米製造研究”,清華大學原子科學系論文,
王志逢, (2006), ”新穎低表面能高分子研究及其在奈米壓印系統與超疏水表面之應用和學理探討”,交通大學應用化學系論文,
姜智堯, (2006), ” 微奈米壓印於高分子阻劑成形性之研究”, 國立高雄應用科技大學碩士論文,
蘇濬賢, (2005), ”微機電系統化的模仁及其配套熱壓成形技術的開發”,國立交通大學論文,
陳建光, (2005), ”高分子材料在電子束照射與奈米轉印上的行為與應用”,國立交通大學論文,
邱士峰, (2005), ”低表面能材料於超疏水表面製備與奈米壓印微影技術之應用”,國立中央大學論文,
Helmut Schifta, (2008), ”Nanoimprint lithography: An old story in modern times? A review” , Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland,
C. J. Martin, R. L. Engelstad, E. G. Lovell, D. J. Resnick, and E. J. Weisbrod, (2002), ” Prediction of fabrication distortions in step and flash imprint lithography templates” J. Vac. Sci. Technol. B 20, 2891
M. Worgull, M. Heckele, J. F. Hétu, and K. K. Kabanemi, (2006), “Modeling and optimization of the hot embossing process for micro- and nanocomponent fabrication”, Microsystem Technologies, pp. 947-952
M. Colburn, B. J. Choi, S. V. Sreenivasan, R. T. Bonnecaze, and C. G. Willson, (2004), “Ramifications of lubrication theory on imprint lithography”Microelectron. Eng. 75, 321
Gerard M. Schmid, Michael D. Stewart, Jeffrey Wetzel, (2006),” Implementation of an imprint damascene process for interconnect fabrication” J. Vac. Sci. Technol. B 24, 1283, pp1283-1291
Wei Lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C. Grant Willson, (2007), “Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics”, Proc. SPIE 6517, 6517
Eugene Hecht, (2001), Optics, Addison Wesley,
吳志榮, (2006), "聚焦離子束加工玻璃次微米三維結構的探討", 中山大學碩士論文.
Colburn M, Johnson S, Stewart M, Damle S, Bailey T, Choi B, (1999), “Step and flash imprint lithography: a new approach to high-resolution patterning”. Proc.SPIE, 3676, 379.
Xia Y., Whitesides G. M., Chem Angew., (1998), Int. Vol.37, pp.550-575.
林建宏, (2006), ”超音波奈米轉印技術”, 國立清華大學博士論文.
Hideo Namatsua, (2007), ” Chemical nanoimprint lithography for step-and-repeat Si patterning”, American Vacuum Society. DOI: 10.1116/1.2806970
M. Morra, E. Occhillo, R. Marola, F. Garbassi, P. Humphery, D. Johnson,(1990), Journal of Colliod
and Interface Science. 137,1,
David C Duffy, Olivier J A Schueller, Scott T Brittain; George M Whitesides, (1999) ,Microtech, Microeng.9,P.211.
E. Meyer; R.M. Overney; K. Dransfeld; T. Gyalog, (1999) , Nanoscience Phys. Rev. B 60, R11301 - R11304
Pierre Thiebaud, Lars Lauer, Wolfgang Knoll, Andreas Offenhausser, (2002), Biosensor & Bioelectronics P.87,17
Teruo Fujii, (2002), Microelectronic Engineering P.907,61
Ting Han, Steve Madden, Mathew Zhang, Robbie Charters, and Barry Luther-Davies, (2009), “ Low loss high index contrast nanoimprinted polysiloxane waveguides”, Optics Express, Vol. 17, Issue 4, pp. 2623-2630
U. Plachetka, M. Bender, A. Fuchs, B. Vratzov, T. Glinsner, F. Lindner and H. Kurz, (2004), “Wafer scale patterning by soft UV-Nanoimprint Lithography”, Volumes 73-74, , Pages 167-171
Namil Koo, Markus Bender, Ulrich Plachetka, Andreas Fuchs, Thorsten Wahlbrink, Jens Bolten and Heinrich Kurz, (2007), “Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material”, Volume 84, Issues 5-8, Pages 904-908
Ch. Peroz, J-C. Galas, L. Le Gratiet, and Y. Chena, (2006), “Compact dye laser on a chip fabricated by ultraviolet
nanoimprint lithography”, APPLIED PHYSICS LETTERS 89, 243109
M. Tormen, T. Borzenko, G. Schmidt, J. Liu and L.W. Molenkamp, (2000), “Thermocurable polymers as resists for imprint lithography”, ELECTRONICS LETTERS 25th Vol. 36
楊舜傑, (2008), “聚焦離子束於石英玻璃奈米結構加工之探討”, 中山大學碩士論文.
Silberzan P.; Leger L.; Ausserre D.; Benattar J.J, (1991), “ Silanation of silica surfaces. A new method of constructing pure or mixed monolayers”, Langmuir 7, 1647-1651.
Lee Jin-Hyung; Hyun-Woo Lim; Jin-Goo Park; Eun-Kyu Lee; Yangsun Kim,(2004), ”Effect of Polymer Substrate on Nano Scale Hot Embossing”, Mat.Res.Soc.Symp.Proc.Vol.782©2004 Materials Research Society.
謝東融, (2007),” 聚焦離子束製作次微米結構於壓印上的探討”, 中山大學碩士論文
楊寶翔, (2005), ”以奈米壓痕法探討不同溫度下之光阻薄膜的機械性質”, 聖約翰技術學院碩士論文.
陳奕凡,(2008), ” 石英玻璃模仁於奈米壓印之研究”中山大學碩士論文
J.H. Choi, S.W. Lee, K.D. Kim, D.G. Choi, J.H. Jeong, E.S. Lee, (2009), “Nanosilver particles-based conductive patterns developed by direct soft
imprint lithography”, Current Applied Physics 9 S138–S140
G. Kostovski , D.J. Whiteb, A. Mitchell , M.W. Austin , P.R. Stoddartb, (2009), “Nanoimprinted optical fibres: Biotemplated nanostructures for SERS sensing”, Biosensors and Bioelectronics 24 pp.1531–1535
Xiangdong Ye, Hongzhong Liu, Yucheng Ding, Hansong Li, Bingheng Lu, (2009), “Research on the cast molding process for high quality PDMS molds”, Microelectronic Engineering 86 pp.310–313
許博淵, (2001), X-ray Micromachining ,
H.Lorenz, et al., (1998), “Mechanical characterization of a new high-aspect-ratio near UV-photoresist”,Microelectronic Engineering 41/42, pp.371-374.
呂盈締, (2006), ”金屬直接奈米壓印之成型研究,” 國立清華大學碩士論文
Hong-Wen Sun, Jing-Quan Liu, Di Chen, and Pan Gu, (2005), “Optimization and Experimentation of Nanoimprint Lithography Based on FIB Fabricated Stamp,”Microelectronic Engineering, Vol. 82, p. 175–179.
Ranjana Saha and William D. Nix, (2002), “Effects of the Substrate on the Determination of Thin Film Mechanical Properties by Nanoindentation,” Acta Materialia, Vol. 50, p. 23–38.
William D. Nix and Huajian Gao, (1998), “Indentation Size Effects in Crystalline Materials: A Law for Strain Gradient Plasticity,” J. Mech. Phys. Solids, Vol. 46, No.
3, p. 411–425.
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