[1] Tadatsugu Minami, Semicond. Sci. Technol. , 20, S35(2005)
[2] K. Ellmer, A. Klein, B. Rech,『Transparent conductive Zinc Oxide』Springer(2007)
[3]Pradipta K Nayak, Jihoon Yang, Jinwoo Kim, Seungjun Chung, Jaewook Jeong, Changhee Lee and Yongtaek Hong, J. Phys. D: Appl. Phys. , 42 0351022009
[4]Kenji Normura, Hiromichi Ohta, Akihiro Takagi , Toshio Kamiya, Masahiro Horano & Hideo Hosono, Nature, Vol. 432, 488-492 (2004)
[5] Materials Science in Semiconductor Processing, 2, 247, (1999)
[6] D. C. Reynolds, C. W. Litton, and T. C. Collins, Phys. Rev, 140, B1726(1965)
[7] B. H. Choi and H. B. Im, Thin Solid Films, vol. 193/194, pp. 712(1990)
[8] E. Burstein, Phys. Rev. , 93, 632-633(1954)
[9] M. Chen, Z. L. Pei, X. Wang , C. Sun and L. S. Wen, J. Vac. Sci. Technol. A, 19, 963-970, ( 2001)
[10] D. Song, A. G. Aberle and J. Xia, Applied Surface Science, 195, 291–296(2002)
[11] I. Hamberg, Phys. Rev. B, 30, 3240(1984)
[12] Haug, Hartmut/ Koch, Stephan W,『Quantum Theory of the Optical and Electronic Properties of Semiconductors』, ISBN:9789812838834
[13] B. Szyszka, Thin Solid Films, 351, 164-169 (1999)
[14] 楊明輝, 『透明導電膜』, 藝軒圖書(2006)
[15] Alex Zunger, Appl. Phys. Lett. , 83, 1(2003)
[16] H. Abdullah, M.N. Norazia, S.Shaari, M.Z. Nuawi, N.S. Mohamed Dan, American J. of Engineering and Applied Sciences, 171-179,(2010)
[17]呂助增,『真空技術與應用』,國家實驗研究院 儀器科技研究中心,2001
[18] 林麗娟 ,X光繞射原理及其應用 ,工業材料86期 ,民國83年2月[19] 汪建民 ,材料分析, 中國材料科學學會, 2006
[20] 陳哲雄,林俊勳,林紋瑞,吳靖宙 ,原子力顯微鏡成像原理與中文簡易操作手冊, 成功大學醫學工程所生醫感測實驗室
[21] B. Chapman, “Glow Discharge Processes”, John Wiley & Sons. Inc. N.Y.,(1980)
[22] B. D. Cullity and S. R. Stock, “Elements of X-Ray Diffraction” third edition.
[23]X.Q. Meng, W. Zhen, J.P.Guo, X.J. Fan, Appl. Phys. A, 70, 421–424 (2000)
[24]邱昭文, 高雄大學應用物理系, 於國家同步輻射研究中心(NSRRC)量測(2010)
[25]楊孟璇, 國立中山大學物理學系研究所, 九十八年碩士論文