臺灣博碩士論文加值系統

本研究利用電漿增強化學氣相沉積系統，以連續製程方式沉積有機矽基薄膜與無機氧化矽薄膜在可撓式塑膠基板上製作氣體阻障層，藉由改變有機矽基薄膜厚度來提升無機氧化矽薄膜品質，研究結果顯示，當有機矽基薄膜厚度為50 nm且無機氧化矽薄膜之厚度500 nm時，相較於單層氧化矽薄膜，其薄膜內應力可以從875 MPa下降至80 MPa，且藉由百格附著度測試可以發現，其薄膜附著度從0B上升至5B等級，而水氣滲透率（Water Vapor Transmission Rate）則由0.57 g/m2/day下降至0.30 g/m2/day，薄膜之有效透氣率從0.358 μm-g/m2/day下降至0.18 μm-g/m2/day，因此，從上述實驗結果可以發現，藉由沉積適當厚度之有機矽基薄膜的確能有效地降低無機氧化矽薄膜與可撓式塑膠基板間的殘留應力，進而提升薄膜附著度及阻水氣的能力。
接著為了進行多對有機/無機薄膜沉積，以進一步提升氣體阻障特性，研究中則選擇擁有最佳的薄膜有效滲透率0.179 μm-g/m2/day之氧化矽薄膜（~200 nm），利用有機矽基（50 nm）/無機氧化矽（200 nm）薄膜厚度製作出一至六對具有有機/無機多層薄膜之結構，達到高阻水氧及高穿透率特性之氣體阻障層。實驗結果顯示，所沉積之多層鍍膜具有高達90%之可見光穿透率，且水氣滲透率已低於商用水氣滲透儀（MOCON）之量測極限（<1×10-3 g/m2/day），並以鈣測試法（Calcium Test）量測此多層鍍膜之水氣滲透率，經由放置14天於40 oC以及30%相對溼度環境下，其中六對有機/無機多層膜結構擁有最低水氣滲透率為4×10-6 g/m2/day。

The study used a plasma enhanced chemical vapor deposition system to continuously deposit organic and inorganic silicon oxide gas barrier layers on a flexible plastic substrate, which the purpose was to change the organic silicon-based thin film thickness to increase the inorganic silicon oxide thin film quality. Research results showed that when the organic silicon-based thin film thickness was 50 nm, and inorganic silicon oxide thin film thickness was 500 nm, the thin film internal stress reduced from 875 MP to 80 Mpa when compared to a mono-layer silicon oxide thin film. Furthermore from the cross-cut adhesion test, it was found that the thin film adhesion increased from 0B to 5B, where the water vapor permeation reduced from 0.57 g/m2/day to 0.30 g/m2/day. The thin film’s effective gas transmission reduced from 0.358 μm-g/m2/day to 0.18 μm-g/m2/day. From the above experimental results, we discovered that the deposition of a suitable thickness of the organic silicon-based thin film can indeed effectively reduce the residual stress between the inorganic silicon oxide thin film and flexible plastic substrate, and further increase thin film adhesion its water vapor barrier capability.
Furthermore, the study conducted multiple pairs of organic /inorganic thin film deposition to further increase gas barrier characteristics. The research selected the silicon oxide thin film (~200 nm) which had the optimal thin film effective permeability 0.179 μm-g/m2/day, and applied an organic silicon-based (50 nm)/inorganic silicon oxide (200 nm) thin film thickness to produce 1 ~ 6 pairs of organic /inorganic multi-layer thin film structures to achieve gas barrier layers with high water and oxygen obstruction and high transparency characteristics. Experimental results showed that the deposited multiple layer film coating reached 90%之visible light transparency, and the water vapor permeation was already lower than the measuring limit (&lt;1×10-3 g/m2/day) of the commercialized water vapor transmission rate tester (MOCON). The films were further tested with the calcium tester to obtain the water vapor transmission rate. After 14 days at 40 oC and a 30% relative humidity environment, the film with 6ix organic /inorganic multi-layer film structure pairs had the lowest water vapor transmission at 4×10-6 g/m2/day.

中文摘要...................................................i
英文摘要..................................................ii
誌謝.....................................................iii
目錄......................................................iv
表目錄....................................................vi
圖目錄...................................................vii

第一章 緒論................................................1
1.1 前言.................................................1
1.2 　文獻回顧.............................................2
1.3 　研究動機.............................................4
第二章 理論基礎...........................................11
2.1 電漿理論............................................11
2.1.1 電漿的成分..........................................11
2.1.2 電漿的產生..........................................12
2.1.3 電漿的形成..........................................12
2.2 薄膜成長原理........................................13
2.3 化學氣相沉積........................................14
2.4 　塑膠基板與玻璃基板簡介..............................15
2.5 　水氣滲透原理及機制..................................17
2.6 　薄膜應力原理及機制..................................19
第三章 實驗方法及步驟.....................................27
3.1 實驗流程............................................27
3.2 　實驗系統............................................27
3.3 薄膜量測分析........................................28
第四章 結果與討論.........................................39
4.1 氧化矽水氣阻障層穩定性分析..........................39
4.1.1 薄膜附著度測試.....................................40
4.1.2 薄膜應力特性分析...................................41
4.1.3 材料及光學特性量測.................................41
4.1.4 水氣滲透率特性.....................................43
4.2 多層有機-無機水氣阻障層研究.........................44
4.2.1 不同氧化矽薄膜厚度水氣透率.........................44
4.2.2 多層結構材料及光學特性量測.........................45
4.2.3 水氣滲透率量測結果.................................45
4.3 鈣測試量測.........................................46
第五章 結論與未來工作.....................................64
參考文獻..................................................66
Extened Abstract
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