臺灣博碩士論文加值系統

本研究提出利用全像術干涉技術先將繞射光柵設計製作於D型光纖上，利用濺鍍製程鍍上一層導電層之金屬薄膜方法。
再利用LIGA-like製程中的電鍍模造技術製作D型光纖金屬光柵，經過不同的製程，光柵深度將變淺。研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果。
通過對實驗結果的分析,這種方法不僅可以獲得厚度理想的金屬保護層,同時可以提高光纖光柵的靈敏度。

This study is to proposes by using electroplating process technology and holographic diffraction gratings interference technology to design the grating structure on polymer material, and then sputtering process using a conductive layer to coat the metal thin film on the grating structure.
LIGA-like process was need by electroplating molding process to fabricate D-Shape fiber metal grating,, Through a different process, the grating depth of D-Shape fiber become shallow . Atomic force microscopy studies (AFM), scanning electron microscopy (SEM) and optical measurements were used to observe and record the results of experiments.
Through the analysis of experimental results, it show that this method not only can obtain the metal protective layer, also can increase the sensitivity of fiber grating.

目錄
摘 要...........................................i
Abstract........................................ii
致謝............................................iii
目錄............................................iv
圖目錄..........................................vi
第一章 緒論....................................1
1.1 前言........................................1
1.2 金屬光纖光柵發展與研究動機..................2
1.3 論文架構....................................3
第二章 文獻探討.................................4
2.1 微機電系統技術簡介..........................4
2-2 無電鍍法....................................6
2-2-1 無電鍍法的特性............................6
2-2-2 無電鍍法的原理............................6
2-2-3 無電鍍鎳鍍液的組成及其功能................7
2-2-4 無電鍍鎳鍍膜特性..........................8
2-3 金屬底層無電鍍鎳之防蝕效果..................8
2-3無電鍍鎳之發展與應用現況.....................9
2.4 電鍍技術....................................10
2.5 繞射光柵緒論................................11
2.5.1繞射光柵元件...............................11
2.6 光纖之結構..................................12
2.6.1 光纖之全反射原理..........................13
2.6.2 光纖之數值孔徑原理........................15
2.6.3 光纖之相關運用............................17
2.7光纖光柵之基本介紹...........................18
2.7.1 光柵之繞射原理............................19
2.7.2 光柵之製作方法............................20
2.7.3 光纖光柵之種類與濾波原理..................20
2.7.4 光纖光柵之運用...........................22
2.8光學全像干涉微影技術.........................23
2.8.1布拉格光柵製作理論.........................25
2.8.2 布拉格繞射光柵之光學干涉系統架構..........25
第三章 D型光纖元件之製程........................29
3.1 UV高分子固定光纖與製作研磨元件..............29
3.1.1光纖特性與規格說明.........................29
3.1.2 UV高分子特性探討..........................30
3.1.3 固定光纖與研磨元件製作流程................32
3.2 D型光纖之單邊研磨流程.......................42
3.2.1 D型光纖研磨設備...........................42
3.2.2 D型光纖研磨流程...........................43
3.2.3 D型光纖研磨表面狀況之探討.................44
3.2.4 D型光纖研磨之深度計算與光點測試...........45
3.3 D型光纖布拉格表面光柵之黃光微影製程.........50
第四章D型光纖布拉格表面光柵之金屬薄膜製程.......54
4.1 電鍍模造技術................................55
4.1.1 電鍍液調配條件............................55
4.2 金屬光柵實驗結果討論........................57
第五章 結果與探討...............................61
5.1 D型光纖布拉格金屬光柵之製作結果與特性探討...61
5.2 D型光纖布拉格表面光柵製作結果...............61
5.3 D型光纖布拉格表面光柵模擬與量測探討.........63
第六章 結論.....................................67
参考文獻........................................68
Extended Abstract
簡 歷

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