臺灣博碩士論文加值系統

本研究提出D 型光纖的研磨技術，並結合黃光微影 (Photolithography) 製程、光學全像術干涉微影(Holographic Interference Lithography)技術、離子式蝕刻機、超音波震洗機、電鍍機，製作出金屬D 型金屬布拉格光纖光柵濾波元件。

首先以多模光纖製作成研磨試片後，進行試片單邊研磨(Side-Polished)，其精確的研磨拋光直到光纖纖芯為止。下一步進行黃光微影製程與光學全像干涉微影技術，來製作繞射光柵濾波元件；利用旋轉塗佈正光阻，將短週期布拉格表面光柵曝光於玻璃基板上，並且以此繞射光柵元件利用離子式蝕刻機蝕刻方式加深光柵深度直達光纖上。

最後我們將以超音波震洗機震洗D型光纖光柵使用化學鍍製程鍍上薄鎳導電層，再以電鍍機於表面電鍍上ㄧ層鎳金屬材質，達到保護所製造D型光纖光柵之效用，其光柵週期與深度可由原子力顯微鏡(AFM)觀察，及光學傳輸特性可由ASE寬頻光源與光纖極化器利用光頻譜分析儀(OSA)等測量與紀錄實驗之結果。

This research is to study a D-shape-fiber polishing technology and combine with Photolithography process, optical Holographic Interference Lithography technology, plasma etching machine, ultrasound shock washing machine, and electroplating machine to produce the D-shape Fiber Bragg Grating side-polished the metal filter components.

First of all, we made the multi-mode fiber up to the fiber core. Next, photolithography process and optical holographic interference lithography were used. This step is to produce diffraction grating on D-shape-fiber ; by using spin to coat the positive photoresist, we short-period Bragg gratings was fabricate on the D-shape-fiber, and then the Reactive ion etching machine was done need to enhance the depth of the grating.

Finally, we used the ultrasonic washing machine to wash the D-shape -fiber, and used the electropless nickel to plate the conductive thin nickel
on the fiber, then we used the electroplating technology to nickel material on the fiber surface to coat .The grating period and the depth were on service by the atomic force microscope (AFM), and the optical transmission characteristics was measured by the ASE and the optical spectrum analyzer (OSA) was used to measure and record the results of experiment.

摘要......................................................i
SUMMARY..................................................ii
誌謝....................................................iii
目錄.....................................................iv
圖目錄.................................................viii
表目錄.................................................xiii
第一章 緒論..............................................1
1.1 前言................................................1
1.2 金屬光纖光柵發展與研究動機..........................2
1.3 論文架構............................................2
第二章 文獻探討...........................................3
2.1 微機電系統技術簡介..................................3
2.2 光纖之結構..........................................5
2.2.1 光纖之全反射原理..................................5
2.2.2 光纖之數值孔徑原理................................7
2.2.3 光纖的分類.......................................10
2.2.4 光纖之相關運用...................................12
2.3 光纖光柵之基本介紹.................................13
2.3.1 光柵之繞射原理...................................13
2.3.2 光柵之製作方法...................................14
2.3.3 光纖光柵之種類與濾波原理.........................15
2.4 光學全像干涉微影技術...............................17
2.5 反應性離子蝕刻(REACTIVE ION ETCHING 簡稱RIE).......19
2.5.1 反應性離子蝕刻原理...............................20
2.6 無電鍍法的原理.....................................20
2.6.1無電鍍鎳鍍液的組成及其功能........................21
2.6.2 無電鍍法的特性...................................22
2.6.3 無電鍍鎳鍍浴的類型...............................22
2.6.4 金屬底層無電鍍鎳之防蝕效果.......................23
2.6.5 無電鍍鎳鍍膜特性.................................23
2.7無電鍍鎳之發展與應用現況............................24
2.8 電鍍技術...........................................24
第三章 D型光纖元件之製程...............................27
3.1 UV高分子固定光纖與製作研磨元件....................28
3.1.1 光纖特性與規格說明...............................28
3.1.2 UV高分子特性探討................................29
3.1.3 固定光纖與研磨元件製作流程.......................30
3.2 D型光纖之單邊研磨流程.............................41
3.2.1 D型光纖研磨設備..................................41
3.2.2 D型光纖研磨流程..................................42
3.2.3 D型光纖研磨表面狀況之探討........................43
3.2.4 D型光纖研磨之深度計算與光點測試..................45
3.3 可調式D型光纖布拉格表面光柵之製程.................49
3.3.1 布拉格繞射光柵理論...............................49
3.3.2 布拉格繞射光柵之光學干涉系統架構.................49
3.4 D型光纖布拉格表面光柵之黃光微影製程................55
3.5 反應離子蝕刻氮化矽D型光纖光柵......................58
第四章 D型光纖布拉格表面光柵之金屬薄膜製程...............63
4.1化學鍍液的配製......................................63
4.2微電鍍液的配製......................................64
4.2.1微電鍍製程參數....................................65
4.3 金屬光柵實驗結果討論...............................68
第五章 結論..............................................73
5.1 D型金屬布拉格光纖光柵之製作結果與特性探討..........73
5.1.2 D型光纖布拉格表面光柵製作結果....................73
參考文獻.................................................79
Extended Abstract
簡歷

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