臺灣博碩士論文加值系統

本論文主要是研究以高分子非對稱布拉格耦合器（ABC）製作光學濾波器並探討其特性。在此研究中，將以全像術干涉技術和微模轉印技術在高分子上製作光柵結構。接著高分子波長濾波器將由兩階段微模技術來製作，主要的模仁將先在負光阻上形成，然後再將其模型轉移到PDMS模仁上；在這步驟之後，將以PDMS高分子濾波器的模型(pattern)轉印至高分子上，來完成高分子ABC製作。
接下來，我們改變兩平行波導的非對稱性(兩波導分別有不同寬度)，並得到兩平行波導有效折射率至少相差多少，才可能避免反射光與傳輸光譜之重疊，研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM) 作表面形貌量測，其光學傳輸特性可由Tunable Laser頻譜分析儀等方法觀察與紀錄實驗之結果，並利BPM-CAD軟體模擬分析研究探討高分子非對稱布拉格耦合器的理論模擬與實際誤差。

This thesis describes a procedure to fabricate a polymer asymmetric Bragg couplers and Research it’s properties. In this study,the grating structure on a polymer is fabricated first by using holographic interferometry and micro-molding processes. The polymeric wavelength filters are produced by a two-step molding process where the master mold is first formed on a negative tone photoresist and subsequently transferred to a PDMS mold; following this step, the PDMS silicon rubber mold was used as a stamp to transfer the pattern of the polymeric wavelength filters onto a UV cure epoxy,to complete the polymer optical waveguide devices.
Next, We change the asymmetry of the two parallel waveguides,to make the two decoupled waveguides quite dissimilar to avoid the spectrum overlapping.The profiles of the devices were observed using SEM and AFM system. The optical transmission characteristics were measured in terms of Tunable Laser spectrum analyzer. BPM-CAD (Beam propagation method) analysis was used to simulate and the theory results only have small different compared with the experiment results.

中文摘要...................................................i
英文摘要..................................................ii
致謝.....................................................iii
目錄......................................................iv
圖目錄....................................................vi
表目錄..................................................viii
第一章 緒論...............................................1
1.1 前言...................................................1
1.2 研究動機與目的.........................................3
1.3 論文架構...............................................4
第二章 研究背景理論探討...................................5
2.1 光波導的光傳播理論.....................................5
2.1.1 耦合器理論...........................................8
2.2 光波導元件介紹.........................................9
2.3 繞射光柵概述..........................................11
2.3.1 光柵的結構..........................................11
2.3.2 全像光柵的分類......................................12
2.3.3 光柵結構製程技術....................................13
2.4 全像術干涉微影技術....................................14
2.4.1 全像干涉微影之布拉格光柵理論........................16
2.4.2 光學全像干涉系統架構與干涉角度計算..................19
2.5 高分子加工技術之軟式微影技術..........................21
2.5.1 微接觸印刷(MICROCONTACT PRINTING, ΜCP).............21
2.5.2 毛細管微成形 (MICROMOLDING IN CAPILLARIES, MIMIC)...22
2.5.3 微轉印成形(MICROTRANSFER MOLDING, ΜTM).............23
2.5.4 複製成形(REPLICA MOLDING, REM)......................23
第三章 高分子非對稱布拉格耦合器的製作....................24
3.1 實驗流程..............................................24
3.2 高分子布拉格光柵元件製作說明..........................25
3.2.1 布拉格光柵黃光微影製程..............................25
3.2.2 布拉格繞射光柵轉印製程..............................29
3.3 布拉格繞射光柵製程結果探討............................31
3.4 高分子非對稱布拉格耦合元件研製........................33
3.4.1 非對稱布拉格耦合元件之厚膜光阻黃光微影製程..........34
3.4.2 高分子非對稱布拉格耦合元件轉印製程..................37
3.5 OG高分子非對稱布拉格耦合元件製程結果探討..............40
3.6 高分子非對稱布拉格耦合元件之導光層與包覆層製作........41
3.6.1高分子非對稱布拉格耦合元件之導光層製作...............42
3.6.2高分子非對稱布拉格耦合元件之包覆層製作...............44
第四章 高分子非對稱布拉格耦合元件之模擬與量測............46
4.1 高分子非對稱布拉格耦合元件特性模擬....................46
4.2 高分子非對稱布拉格耦合元件光學頻譜量測................47
4.2.1非對稱布拉格耦合元件量測架構說明.....................47
4.2.2高分子非對稱布拉格耦合元件之模態場量測...............48
第五章 結論..............................................53
參考文獻..................................................54

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