臺灣博碩士論文加值系統

在本篇論文裡，主要的研究是透過微成形鑄造以及黃光微影製程來製造高分子濾波器。首先，全象術干涉技術是使用波長為325nm的氦鎘雷射去產生一個i-line光線，將此光線打在次微米的正光阻膜上時，可以得到一個附有週期結構的母膜。在正光阻劑上濺渡一層20nm的鎳金屬薄膜後可以從鑄件的母模上獲得一個擁有週期圖案的UV高分子材料，最後經由測量顯示出附有高深寬比光柵的波導其波導長度會減少。而另一方面，使用HPDMS能夠製作出深寬比較高的週期結構，在實驗中我們使用HPDMS當作翻模製程以及壓印製程中的模仁以獲得高深寬比的光柵結構，然後再將光阻上的光柵結構轉移至UV高分子材料上。最後透過原子力顯微鏡(Atomic force microscope AFM)量測儀器得知，光柵的深寬比可以高達0.8。

In this thesiss，a procedure for fabricating polymeric wavelength filters using holographic interferometry and molding processes is described. First，holographic interferometry using a He-Cd (325nm) laser was used to create the master of the periode line structure on an i-line sub-micron positive photoresist film.A 20nm nickel thin film was then sputtered on the photoresist. Final line pattern on a UV polymer was form from casting against the master mold. Finally，a SU8 polymer was spun on the polymer grating to form a planar waveguide. The measurement results were consistent with theoretical predictions. On the other hand，an h-PDMS could be used to obtain high aspect ratio gratings. in our experiment，we used an h-PDMS as a master mold to obtain a grating structure with a high aspect ration during the fabrication process，and then the structure was transferred to a UV polymer from h-PDMS. Finally，the aspect ration of grating can be reached up to 0.8 observed by AFM (Atomic force microscope).

中文摘要........................................i
英文摘要........................................ii
致 謝........................................iii
第一章 緒論....................................1
1.1 前言........................................1
1.2 研究動機與目的..............................3
1.3論文架構.....................................4
第二章 研究背景之理論與探討....................5
2.1 微機電系統(Micro Electro-Mechanical System，MEMS)之定
義..........................................5
2.2 MEMS之製造技術..............................7
2.2.1 MEMS 領域中微製造技術分類表...............13
2.3 微機電之應用領域............................14
2.3.1各種微細加工技術比較.......................20
2.4 微射出成型(Micro-Injection Molding).........21
2.4.1微射出成型之技術發展.......................22
2.4.2 微射出成型之模具、模仁....................23
2.4.3 微模具(模仁)材料的探討....................25
2.4.4 微射出與傳統射出的差異....................26
2.5 全像術光柵之分類及特性......................30
2.5.1光柵分類依光與材料發生的交互作用，光柵可分成四類
[1]：.......................................30
2.5.2光柵的特性體積光柵(volume grating)和細薄光柵(thin
grating)的特性探討[3]......................32
2.8 高分子材料探討..............................35
2.8.1 高分子材料特性............................35
2.9 SU8高分子波導特性討論.......................36
2.10 光阻材料之探討.............................37
3.1實驗流程.....................................38
3.1.1 高分子布拉格光柵元件架構說明..............39
3.2全像術干涉技術與全像術的特點.................39
3.2.1全像術.....................................39
3.2.2 架設順序..................................41
3.2.3 全像術的特點..............................41
3.2.4 光學全像干涉系統架構與干涉角度計算........42
3.3 高分子濾波器之製程探討及實驗流程............45
3.3.1 製程探討..................................45
3.3.2 實驗製作流程..............................45
第四章 高分子濾波器元件測量.....................52
4.1 使用SEM和AFM量測光柵個別在正光阻、鎳和UV高分子材料上的結
果。........................................52
4.3 高分子濾波器元件之光譜特性..................54
第六章 結論.....................................73
參考文獻........................................75

圖目錄
圖2-1 (a)振幅光柵 (b)相位光柵...........30
圖2-2 (a)穿透式光柵 (b)反射式光柵........30
圖2-3 體積光柵繞射原理..........................32
圖 2-4 薄膜光柵繞射原理.........................33
圖 2-5 Bragg繞射入射光與多層光柵條紋之干涉作用..33
圖 2-6 Raman-Nath繞射情形示意圖.................34
圖3-1 全像術干涉微影系統架構圖..................40
圖3-2全像術干涉微影實驗系統架構圖...............43
圖3-3兩束平行光波之干涉平面示意圖...............44
圖3-4 高分子濾波器製程..........................51
圖4-1 SEM圖.....................................53
圖 4-2光柵結構及深度圖..........................54
圖 4-3光譜分析儀器..............................54
圖 4-4光譜傳輸圖................................56
圖5-1 光柵翻模製成..............................62
圖5-2 掃描式電子顯微鏡(SEM).....................64
圖5-3 原子力顯微鏡(AFM).........................65
圖5-4 光柵壓印製成..............................69
圖5-4 光柵壓印製成..............................70
圖5-5 掃描式電子顯微鏡(SEM).....................71
圖5-6 原子力顯微鏡(AFM).........................72

表目錄
表 2-1 MEMS 領域中微製造技術分類表..............13
表 2-2各種微細加工技術比較......................20
表 4-1光柵量測結果比較表........................53

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