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研究生:李政哲
論文名稱:利用雙閘極氧化銦鎵鋅薄膜電晶體實現主動式觸控偵測電路之研究
論文名稱(外文):Study on active touch sensing circuit implemented by dual gate IGZO TFTs
指導教授:戴亞翔
學位類別:碩士
校院名稱:國立交通大學
系所名稱:顯示科技研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2011
畢業學年度:99
語文別:英文
論文頁數:48
中文關鍵詞:氧化銦鎵鋅薄膜電晶體雙閘極觸控偵測電路時間常數多點觸碰
外文關鍵詞:IGZO TFTdual gatetouch sensing circuitRC time constantmulti-touch
相關次數:
  • 被引用被引用:1
  • 點閱點閱:336
  • 評分評分:
  • 下載下載:53
  • 收藏至我的研究室書目清單書目收藏:1
利用所提出的雙閘極氧化銦鎵鋅薄膜電晶體(IGZO TFT)於主動式矩陣觸碰感測電路與RC低通濾波器。由於雙閘極氧化銦鎵鋅薄膜電晶體可藉由其上閘極與下閘極所控制,所提出的電路只需要一個薄膜電晶體即可,如此可擴展感測畫素的開口率。藉由觸摸事件所導致RC時間常數的增加,一個明顯的瞬態導通電流出現,可作為感測訊號。這個信號可以很容易地被讀出,從而減少外圍 IC的成本。此外該傳感器消耗較少的待命功率,因為當它沒有被觸及時,沒有信號電流發生。在這樣的設計下,使得以往的觸摸感應技術的缺點有相當大的改進。因此,我們相信所提出的感測電路可能是一個很好的方法來實現主動式矩陣觸摸面板。
The dual gate IGZO TFT is proposed to be used in an active matrix touch sensing circuit
with a RC low-pass filter. Since the dual gate IGZO TFT can be controlled by both its top and
bottom gates, only one TFT is needed in the proposed circuit, which enlarges the open ratio of
sensing pixel. By a touch event which increases the RC time-constant, a significant transient
ON current is generated to be the sensing signal. This signal can be easily read out and thus
reduce the cost of peripheral ICs. In addition, this sensor consumes less standby power
because no signal current occurs if it is not touched. In such design, it makes considerable
improvement over the drawbacks of previous touch sensing technology. Thus, we believe the
proposed sensing circuit could be an excellent way to implement active matrix touch panels.
Chinese Abstract...I
English Abstract...II
Acknowledgements...III
Contents...........IV
Table Captions.....VI
Figure Captions....VII
Chapter1 Introduction
1.1 Background.....1
1.2 Motivation.....3
1.3 Thesis Organization.....4
Chapter2 Touch Sensing Pixel Circuit
2.1 Direct Touch Sensor Design.....12
2.1.1 Sensing Circuit.....12
2.1.2 Multi-touch Function.....12
2.1.3 Experimental Results.....13
2.2 Indirect Touch Sensor Design.....13
2.2.1 Sensing Circuit Tryout.....13
2.2.2 The Pulse Overlapping Method.....14
2.2.3 Experimental Results.....15
2.3 Summary.....15
Chapter3 Stability of the Sensing Pixel Circuit
3.1 Stability Analysis Criteria.....26
3.1.1 Analysis Base.....26
3.1.2 Working Range Evaluation.....27
3.2 Environmental Interference.....28
3.2.1 Temperature Effect.....28
3.2.2 Illumination Effect.....29
3.3 Electrical Stress Stability.....30
3.3.1 DC stress.....30
3.3.2 AC stress.....31
3.4 Summary.....31
Chapter4 Conclusions & Future Works.....45
References.....46

[1] Bong Hyun You, Byoung Jun Lee, Jae Hoon Lee, “LCD embedded hybrid touch screen panel”, SID Symposium Digest of Technical Papers, Vol. 40, Issue 1, pp. 439-442, 2009
[2] Cheol Se Kim, Byung Koo Kang, Ji Hyun Jung, “Active matrix touch sensor perceiving liquid crystal capacitance with amorphous silicon thin film transistors”, Japanese Journal of Applied Physics, Vol. 49, Issue 3, pp. 03CC03, 2010
[3] Kyoung Seok Son, Ji Sim Jung, Kwang Hee Lee, “Characteristics of double-gate GaInZnO thin-film transistor”, IEEE Electron Devices Letter, Vol. 31, no. 3, pp. 219-221, 2010
[4] Kyoung Seok Son, Ji Sim Jung, Kwang Hee Lee, “Highly stable double-gate GaInZnO thin-film transistor”, IEEE Electron Devices Letter, Vol. 31, no. 8, pp. 812-814, 2010
[5] Jae Kyeong Jeong, Hui Won Yang, Jong Han Jeong, “Origin of threshold voltage instability in indium gallium zinc oxide thin film transistors”, Appl. Phys. Letter, Vol. 93, pp.123508, 2008
[6] Jaeseob Lee, Jin Seong Park, Young Shin Pyo, “The influence of the gate dielectrics on threshold voltage instability in amorphous indium gallium zinc oxide thin film transistors”, Appl. Phys. Letter, Vol. 95, pp.123502, 2009
[7] Donghun Kang, Hyuck Lim, Changjung Kim, “Amorphous gallium indium zinc oxide thin film transistors: sensitive to oxygen molecules”, Appl. Phys. Letter, Vol. 90, pp.192101, 2007.
[8] Kenji Nomura, Toshio Kamiya, Masahiro Hirano, “Origins of threshold voltage shifts in room temperature deposited and annealed InGaZnO thin film transistors”, Appl. Phys. Letter , Vol. 95, pp.013502, 2009
[9] Ken Hoshino, John Wager, “Operating temperature trends in amorphous InGaZnO thin-film transistors”, IEEE Electron Devices Letter, Vol. 31, no. 8, pp. 818-820, 2010
[10] Kazushige Takechi, Mitsuru Nakata, Toshimasa Eguchi, “Temperature dependent transfer characteristics of amorphous InGaZnO4 thin film transistors”, Japanese Journal of Applied Physics, Vol. 48, Issue 1, pp.011301, 2009
[11] Hiromichi Godo, Daisuke Kawae, Shuhei Yoshitomi, “Temperature dependence of transistor characteristics and electronic structure for amorphous In-Ga-Zn-Oxide thin film transistor”, Japanese Journal of Applied Physics, Vol. 49, Issue 3, pp. 03CB04, 2010
[12] Te Chih Chen, Ting Chang Chang, Chih Tsung Tsai, “Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress”, Appl. Phys. Letter, Vol. 97, pp. 112104, 2010
[13] Dharam Pal Gosain, Tsutomu Tanaka, “Instability of amorphous indium gallium zinc oxide thin film transistors under light illumination”, Japanese Journal of Applied Physics, Vol. 48, pp. 03B018, 2009
[14] Md Delwar Hossain Chowdhury, Piero Migliorato, Jin Jang, “Light induced instabilities in amorphous indium gallium zinc oxide thin film transistors”, Appl. Phys. Letter, Vol. 97, pp.173506, 2010
[15] Himchan Oh, Sung Min Yoon, Min Ki Ryu, “Photon-accelerated negative bias instability involving subgap states creation in amorphous InGaZnO thin film transistor”, Appl. Phys. Letter, Vol. 97, pp.183502, 2010
[16] Arun Suresh, John. Muth, “Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors”, Appl. Phys. Letter, Vol. 92, pp. 033502, 2008
[17] Jeong Min Lee, In Tak Cho, Jong Ho Lee, “Bias stress induced stretched exponential time dependence of threshold voltage shift in InGaZnO thin film transistors ”, Appl. Phys. Letter , Vol. 93, pp. 093504 , 2009
[18] Edward Namkyu, Cho Jung Han Kang, Chang Eun Kim, “Analysis of bias stress instability in amorphous InGaZnO thin-film transistors”, IEEE Device and Materials Reliability Journal, Vol. 11, Issue 1, pp. 112-117, 2011
[19] Sangwon Lee, Kichan Jeon, Jun Hyun Park, “Electrical stress induced instability of amorphous indium-gallium-zinc-oxide thin-film transistors under bipolar AC stress”, Appl. Phys. Letter, Vol. 95, pp. 132101, 2009
[20] Tze Ching Fung, Jerzy Kanicki, Katsumi Abe, “DC/AC electrical instability of R.F. sputter amorphous In-Ga-Zn-O TFTs”, SID Symposium Digest of Technical Papers, Vol. 40, Issue 1, pp. 1117-1120, 2009

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