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研究生:劉景文
研究生(外文):Liu, Ching-Wen
論文名稱:微米及奈米複合式結構應用在光學膜片之研究
論文名稱(外文):Micro and Nano hybrid structure applied in optical films
指導教授:蔡宏營
指導教授(外文):Tsai, Hung-Yin
口試委員:陳政寰林宏彛林景崎蔡宏營
口試日期:2011-7-8
學位類別:碩士
校院名稱:國立清華大學
系所名稱:動力機械工程學系
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2011
畢業學年度:99
語文別:英文
論文頁數:88
中文關鍵詞:光學膜奈米結構微米結構複合式結構奈米壓印陽極氧化鋁
外文關鍵詞:optical filmnano-structuremicro-structurehybrid structurenano-imprintanodic aluminum oxide
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  • 被引用被引用:0
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  • 下載下載:13
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本研究提出以簡單的微奈米製程製作出微米以及奈米等級尺寸的複合式結構,並且利用奈米壓印技術製作在透明的高分子材料上,同時探討其光學之特性。
首先利用曝光、顯影以及蝕刻製作出微米等級尺寸的結構;再利用陽極氧化鋁製程製作出奈米等級尺寸的結構。在本研究中,利用草酸為電解液可以得到直徑為50奈米的孔洞結構;利用磷酸為電解液可以得到直徑為100奈米的孔洞結構。本研究發現利用草酸為電解液時,必須做二次處理才可以得到完整的孔洞結構。此外,利用草酸為電解液以及利用磷酸為電解液的實驗中,為了得到更整齊的孔洞結構,都進行二次處理。
完成的結構被當作模具並且利用奈米壓印成功地把結構轉移到透明的高分子材料上。壓印完成的透明高分子材料可應用為螢幕背光模組的擴散膜等光學膜。此光學膜經光學檢測後發現,比起沒有奈米結構的[空]片,其穿透率明顯地提高。
In this research, a micro and nano hybrid structure was realized by using simple micro and nano processing methods. Micro-structures generated by using exposure, development and etching processing; nano-sturctures were generated by using AAO processing.
Two different nano-structures were fabricated using this process, 50 nm nano-pores by using oxalic acid as electrolyte and 100 nm nano-pores by using phosphoric acid as electrolyte. Furthermore, for oxalic acid, second anodization was required to obtain nano-pores, also for both oxalic acid and phosphoric acid second anodization was used to obtain more ordered nano-pores.
The fabricated structures were used as molds in a nano-imprint lithography process where the structures were successfully transferred to a transparent polymer film. This transparent film can be applied to optical films such as the diffuser in a back lighting module.
The imprinted samples were tested for transmittance and compared with a “blank” sample, which has no nano-structures. Obvious increment in transmittance can be observed compared with the “blank” sample.
Abstract
中文摘要
Contents
Figure directory
Graph directory
1. Foreword
2. Literature Review
2.1. Optical diffusers
2.2. Anti-reflection
2.3. Anodic aluminum oxide
2.4. Nano-imprint lithography
3. Experimental equipment and procedure
3.1. Outline of experimental procedure
3.2. Fabrication of silicon mold
3.3. Fabrication of AAO layer on silicon mold
3.4. Nano-imprint lithography
3.5. Inspection instruments
4. Results and Discussion
4.1. Silicon mold
4.2. AAO
4.3. Nano-imprint
4.4. Optical inspections
4.5. Optical simulation
5. Conclusion and future prospects
5.1. Conclusion
5.2. Future prospects
Reference

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