臺灣博碩士論文加值系統

碳元素以不同的型態存在地球上，其中類鑽碳薄膜具有sp2與sp3鍵結，藉由改變類鑽碳中sp2與sp3鍵結比例，可使類鑽碳薄膜同時具有鑽石及石墨之材料特性。實驗中，改變工作壓力及甲烷濃度來沈積不同sp2與sp3鍵結比例之類鑽碳薄膜，使具有優良的電導率性質，以增加電磁屏蔽性能。利用微波電漿束化學氣相沈積(Microwave plasma jet chemical vapor deposition，MPJCVD)系統沈積類鑽碳薄膜於石英基材上，並探討類鑽碳薄膜在不同工作壓力及甲烷濃度參數改變下，其結構性質對電磁屏蔽效應之影響。進而固定工作壓力及甲烷濃度並添加不同氮氣濃度，觀察氮氣添加對電磁屏蔽效應影響。
實驗結果可證實，工作壓力提升至80 torr時，使類鑽碳薄膜表面形貌轉變成脊狀奈米鑽石，降低類鑽碳薄膜中sp3含量至47 %，且提升表面粗糙度至100 nm。類鑽碳之結構變化可提升疏水性至137度，並降低片電阻值至7.11(ohm/squar)，提升類鑽碳薄膜之電磁屏蔽性能至18 dB(吸收及反射係數分別為4 dB、14 dB)。並且當工作壓力為80 torr且氮氣濃度增加0.2 %時，電磁屏蔽性能會降至17 dB，但氮氣濃度的加入可提升類鑽碳薄膜之吸收係數至12.5 dB，並降低反射係數至4.5 dB。

Different forms of carbon widely exist in the Earth and one of them is Diamond like carbon (DLC) film, which is organized by sp2 and sp3 bonds. By changing the ratio of sp2 to sp3 in DLC film, DLC film can simultaneously have the material characteristics of diamond and graphite. In this study, in order to make DLC film have excellent conductivity to increase the performance of electromagnetic shield, working pressure and Methane concentration are changed to depose DLC film, which has different ratios of sp2 to sp3. Microwave plasma jet chemical vapor deposition (MPJCVD) system is used to depose DLC film on the quartz substrate and the influence of the structure properties of DLC film in different working pressures and Methane concentration on electromagnetic shield effectiveness is discussed. In addition, working pressure and Methane concentration are fixed and different Nitrogen concentration is added to observe the influence of the addition of Nitrogen on electromagnetic shield effectiveness.
The result of this study verifies that the working pressure, which rises to 80 torr, can make the surface morphology of DLC film turn into ridge-like nanodiamond, decrease sp3 content in DLC film structure to 47 %, and increase the rough degree of DLC film surface to 100nm. The changes of DLC film structure can increase hydrophobicity to 137°, decrease sheet resistance to 7.11 (ohm/squar), and rise electromagnetic shield effectiveness of DLC film to 18 dB (absorption coefficient is 4 dB and reflection coefficient is 14 dB). Moreover, when working pressure is 80 torr and Nitrogen concentration rises to 0.2 %, the performance of electromagnetic shield effectiveness will decrease to 17 dB; however, the addition of Nitrogen concentration can increase absorption coefficient of DLC film to 12.5 dB and decrease reflection coefficient to 4.5 dB.

摘 要 i
1BAbstract ii
誌謝 iv
目 錄 v
表目錄 vii
圖目錄 viii
第一章 緒 論 1
1.1 前言 1
1.2 研究動機 1
第二章 文獻回顧與基本理論 3
2.1 微波電漿 3
2.1.1 電漿原理 3
2.1.2 微波電漿產生與性質 3
2.2 碳的種類與結構 4
2.2.1 鑽石結構與光學特性 5
2.2.2 石墨結構與光學特性 7
2.2.3 類鑽碳結構與光學特性 8
2.3 鑽石、石墨和類鑽碳材料基本性質 8
2.4 人工鑽石歷史 11
2.5 類鑽碳膜成長機制 11
2.6 CVD電漿診斷技術 17
2.6.1 電漿 17
2.6.2 電漿診斷技術 19
2.7 電磁波產生之原理 21
2.8 電磁屏蔽理論 21
2.8.1 反射損失 23
2.8.2 吸收損失 24
2.8.3 多重反射損失 26
2.9 電磁波吸收原理 26
2.10 吸收電磁波方式 28
2.10.1 導電損失 29
2.10.2 導磁損失 29
第三章 實驗流程與步驟 30
3.1 實驗流程 30
3.2 微波電漿束化學氣相沈積系統 31
3.3 實驗步驟與製程參數 33
3.3.1 實驗材料 33
3.3.2 實驗步驟 33
3.3.3 成長類鑽碳薄膜 34
3.4 微波電漿束化學氣相沈積系統 35
3.4.1 掃描式電子顯微鏡(FESEM ) 35
3.4.2 拉曼光譜(Raman Spectrum) 35
3.4.3 化學分析電子光譜儀(ESCA) 36
3.4.4 原子力顯微鏡(Atomic Force Microscopy, AFM) 37
3.4.5 光放射光譜儀(OES) 38
3.4.6 分光光譜儀(UV-NIR) 39
3.4.7 四點探針(4-point probe) 40
3.4.8 網路分析儀 41
3.4.9 同軸導波管 41
3.4.10 電磁波測試之標準試片樣式 42
第四章 結果與討論 43
4.1 不同工作壓力及甲烷濃度下成長類鑽碳膜 43
4.1.1 工作壓力對成長類鑽碳膜之影響 44
4.1.2 甲烷濃度對成長類鑽碳膜之影響 45
4.2 製程參數對類鑽碳薄膜結構性質之影響 45
4.2.1 Raman及ESCA分析類鑽碳薄膜之結構性質 46
4.2.2 AFM及接觸角分析類鑽碳薄膜之結構性質 49
4.3 類鑽碳薄膜結構特性對電磁波性質之影響 53
4.3.1 類鑽碳薄膜之光學性質分析 53
4.3.2 類鑽碳薄膜之四點探針量測分析 56
4.3.3 類鑽碳薄膜之電磁屏蔽效應量測 57
4.4 氮氣添加對成長類鑽碳薄膜之影響 62
4.4.1 氮氣添加對成長類鑽碳膜之表面形貌影響 62
4.4.2 Raman及ESCA分析類鑽碳薄膜之結構性質 63
4.4.3 接觸角分析類鑽碳薄膜之結構性質 65
4.5 添加氮氣成長類鑽碳薄膜對電磁波性質之影響 66
4.5.1 類鑽碳薄膜之光學性質分析 66
4.5.2 類鑽碳薄膜之電磁屏蔽效應量測 67
第五章 結論 71
參考文獻 72

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