臺灣博碩士論文加值系統

本研究以直線式連續濺鍍氧化鋅共摻雜鎵鋁(GAZO)薄膜，探討GAZO薄膜經氫/氮退火與純氫退火是否可以改善其薄膜的微結構與光電特性。
　　經由實驗結果得知，基板未加熱的GAZO薄膜在氣體壓力為35torr及不同氣體環境中退火450℃一小時，薄膜皆呈現(002)優選取向。經純氫退火後，獲得電阻率為5.4×10-4Ω-cm，光穿透率為89%，電阻率比未處理的GAZO薄膜下降60%，光穿透率增加17%。而將氮加入後使用氫/氮退火處理，獲得最低電阻率為5.2×10-4Ω-cm，光穿透率為91%，電阻率比未處理的GAZO薄膜下降62%，光穿透率增加19%。得知氫/氮退火比純氫退火的光電性質獲得較多改善。經由改變氫/氮退火時的氣體壓力來探討對光電性質的影響，隨壓力改變從25~35torr，電阻率從5.3×10-4Ω-cm降低為 5.2×10-4Ω-cm，僅下降0.02%，光穿透率皆為91%。得知改變溫度較改變壓力更加有效。

This work descirbes the electrical and optical properties of gallium and aluminum doped zinc oxide (GAZO) films with unheated substrate during sputtering can be improved by low pressure hydrogen/nitrogen or pure hydrogen annealing or not. The results indicate both low pressure hydrogen/nitrogen and pure hydrogen annealing can improve the electrical and optical properties of GAZO films. The hydrogen/nitrogen annealing can improve more than pure hydrogen annealing. The GAZO films post treated with 35 torr, 450oC, 1 hour annealing can have 5.2×10-4Ω-cm of electrical resistivity and 91% of average optical transmittance in hydrogen/nitrogen atmosphere, 5.4×10-4Ω-cm of electrical resistivity and 89% of average optical transmittance in pure hydrogen atmosphere. The annealing pressure in 25~35 torr is not sensitive to the electrical and optical properties of GAZO films.

總目錄
頁數
中文摘要 I
英文摘要 III
致謝 V
總目錄 VII
圖目錄 XI
表目錄 XIV

第一章緒論 1
1.1前言 1
1.1研究動機 6
1.2相關文獻回顧 8
第二章理論基礎 12
2.1透明導電膜介紹 12
2.1.1透明導電膜歷史 12
2.1.2透明導電膜之光性質 13
2.1.3透明導電膜之電性質 14
2.2氧化鋅材料特性介紹 16
2.3濺鍍原理 17
2.4薄膜成長 18
2.5薄膜表面型態結構 21
2.6柏斯坦-摩斯(Burstein-Moss)效應 22

第三章實驗方法與步驟 24
3.1實驗流程 24
3.2實驗材料 26
3.3濺鍍基板清洗 26
3.4濺鍍GAZO薄膜 27
3.4.1真空濺鍍系統 27
3.4.2連續式濺鍍 29
3.5後製程系統與參數說明 31
3.5.1退火腔體 31
3.5.2真空退火 32
3.6 薄膜特性分析 33
3.6.1 X-ray 繞射分析 33
3.6.2掃描式電子顯微鏡分析 34
3.6.3霍爾電性分析 35
3.6.4光譜分析 36
第四章結果與討論 37
4.1氫氮退火後處理(改變溫度，固定壓力退火時間一小時) 37
4.1.1薄膜結晶性 37
4.1.2薄膜表面形貌 39
4.1.3薄膜電性質 41
4.1.4薄膜光學性質 44
4.1.5光電性質綜合比較 47
4.1.6討論 48
4.2純氫退火後處理(改變溫度，固定壓力退火時間一小時) 52
4.2.1薄膜結晶性 52
4.2.2薄膜表面形貌 54
4.2.3薄膜電性質 56
4.2.4薄膜光學性質 58
4.2.5光電性質綜合比較 61
4.2.6討論 62
4.3氫氮退火後處理(改變壓力，固定溫度退火時間一小時) 65
4.3.1薄膜結晶性 65
4.3.2薄膜表面形貌 67
4.3.3薄膜電性質 69
4.3.4薄膜光學性質 71
4.3.5光電性質綜合比較 74
4.3.6討論 75

第五章結論 78
參考文獻 81

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